公开(公告)号：US06426840B1

公开(公告)日：2002-07-30

申请号：US09791346

申请日：2001-02-23

申请人： Jouni P. Partanen ,  Nansheng Tang ,  Xingkun Wu

发明人： Jouni P. Partanen ,  Nansheng Tang ,  Xingkun Wu

IPC分类号： G02B702

CPC分类号： G02B27/40 ,  B23K26/04 ,  B23K26/0617 ,  B23K26/066 ,  B23K26/067 ,  B23K26/073 ,  B23K26/082 ,  B23K26/382 ,  B29C64/00 ,  B29C64/135 ,  B33Y40/00 ,  G02B7/102 ,  G02B19/0014 ,  G02B19/0052 ,  G02B19/0095 ,  G02B26/128 ,  G02B27/09 ,  G02B27/0955

摘要： An illumination system includes optics capable of adjusting the size of a beam of light and adjusting the focus of the beam of light. Spot size control optics adjusts the overall size of the beam of light and separately adjusts the ellipticity of the beam, primarily in one dimension. Light from the spot size control optics passes to focus control optics that control the overall focus of the beam of light and adjust the astigmatism of the beam by altering the focus position of the beam of light in one dimension. The laser system, the spot size control optics and the focus control optics are within an enclosure. Actuators under remote control from outside of the enclosure adjust both of the spot size control optics and focus control optics in the thermal environment of the illumination system.

摘要翻译： 照明系统包括能够调节光束尺寸并调节光束焦点的光学器件。 光点尺寸控制光学器件调整光束的总体尺寸，并分别主要在一个维度上调整光束的椭圆率。 来自光点尺寸控制光学器件的光通过控制光束的聚焦控制光学器件，通过改变光束在一个维度上的焦点位置来调节光束的散光。 激光系统，光斑尺寸控制光学元件和聚焦控制光学元件在外壳内。 遥控器外部的执行器可以调节照明系统的热环境中的光斑尺寸控制光学元件和聚焦控制光学元件。

公开(公告)号：US06406658B1

公开(公告)日：2002-06-18

申请号：US09248352

申请日：1999-02-08

申请人： Chris R. Manners ,  Michelle D. Guertin ,  Hop D. Nguyen ,  Jouni P. Partanen ,  Nansheng Tang ,  Michael A. Everett

发明人： Chris R. Manners ,  Michelle D. Guertin ,  Hop D. Nguyen ,  Jouni P. Partanen ,  Nansheng Tang ,  Michael A. Everett

IPC分类号： B29C3508

CPC分类号： B29C64/40 ,  B29K2995/0073 ,  B33Y10/00 ,  B33Y30/00

摘要： A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making three-dimensional objects on a layer by layer basis by selectively exposing layers of material to prescribed stimulation, using a beam having a first smaller diameter and a beam having a second larger diameter, to form laminae of the object. The power of the smaller beam is typically lower than the power of the larger beam. Object formation is controlled by data representing portions of the layers to be exposed with the larger beam (large spot portions) and those portions to be exposed with the smaller beam (small spot portions). In a preferred embodiment, portions exposed with the larger beam are formed first, for a given layer. Portions are exposed with the small beam next. Thereafter the entire perimeter of the laminae is traced using the small beam. Data manipulation techniques are used to identify which portions may be formed with the large beam to decrease exposure time and which should be formed with the small beam to maintain accuracy of the lamina being formed. More than two beam diameters may be used.

摘要翻译： 通过使用具有第一较小直径的光束和具有第二较大直径的光束来选择性地将材料层暴露于规定的刺激，来快速制作（例如立体光刻）方法和装置，用于逐层地制造三维物体 ，形成物体的薄片。 较小波束的功率通常低于较大波束的功率。 物体形成由表示要用较大光束（大光斑部分）曝光的层的部分的数据和要用较小光束（小光斑部分）曝光的部分的数据控制。 在优选实施例中，对于给定层，首先形成用较大光束暴露的部分。 接下来的部分暴露在小梁上。 此后，使用小梁追踪薄片的整个周边。 使用数据处理技术来识别可以用大光束形成哪些部分以减少曝光时间，并且应该用小光束形成哪些部分以保持形成的薄片的精度。 可以使用两个以上的光束直径。

公开(公告)号：US06646728B1

公开(公告)日：2003-11-11

申请号：US09901163

申请日：2001-07-09

申请人： Nansheng Tang ,  Jouni P. Partanen

发明人： Nansheng Tang ,  Jouni P. Partanen

IPC分类号： G01J100

CPC分类号： G01J1/4257 ,  B23K26/705 ,  B29C64/135 ,  B33Y30/00 ,  B33Y40/00

摘要： The invention relates in general to calibrating a focused beam of energy in a solid freeform fabrication apparatus, and, in particular, to a method of measuring the propagation characteristics of the beam to produce beam propagation data. The beam propagation data can be used to verify that the beam is operating within tolerance, and/or produce a response that can be used to further calibrate the beam. The invention is particularly useful in determining asymmetric conditions in the beam. The beam propagation data is produced in accord with the “M2” standard for characterizing a beam. In one embodiment, the response indicates the beam is unacceptable for use in the apparatus. In another embodiment, the response is provided to calibrate the focal position of the beam. In still another embodiment, the response is provided to an adjustable beam that eliminates the asymmetric condition.

摘要翻译： 本发明一般涉及在固体自由形状制造装置中校准聚焦光束，尤其涉及一种测量光束传播特性以产生光束传播数据的方法。 光束传播数据可用于验证光束是否在容差内运行，和/或产生可用于进一步校准光束的响应。 本发明特别可用于确定光束中的不对称条件。 光束传播数据是根据用于表征光束的“M”标准产生的。 在一个实施例中，响应指示该波束对于在该装置中使用是不可接受的。 在另一个实施例中，提供响应以校准光束的焦点位置。 在另一个实施例中，将响应提供给消除不对称状态的可调节光束。

公开(公告)号：US06325961B1

公开(公告)日：2001-12-04

申请号：US09246502

申请日：1999-02-08

申请人： Ross D. Beers ,  Jouni P. Partanen ,  Nansheng Tang

发明人： Ross D. Beers ,  Jouni P. Partanen ,  Nansheng Tang

IPC分类号： B29C3508

摘要： A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain. In a further preferred embodiment, a quantity of prescribed stimulation may be set by consideration of desired solidification depths to be used, beam profile characteristics, material properties, and scanning speed limitations for different data types. In a still further preferred embodiment, a transition between selected consecutive exposure vectors is performed by scanning one or more interposed non-exposure vectors with the beam inhibited from reaching the building material.

摘要翻译： 用于通过选择性地使液体或其它流体状材料经受规定刺激的波束来制造三维物体的快速成型和制造（例如立体光刻）方法和装置。 在优选实施例中，在不需要规定的刺激以暴露材料的至少一些时期期间，控制规定刺激源以减少或抑制规定的刺激的产生。 在另一优选实施例中，控制刺激源以改变产生并被允许到达材料的规定刺激的量。 在另外的优选实施例中，激光输出的控制基于将调节量的电压提供给AOM并结合临时感测激光功率和已知的所需功率来实现的组合。 在另外的优选实施例中，可以通过考虑要使用的期望凝固深度，束轮廓特性，材料特性和不同数据类型的扫描速度限制来设定规定刺激的量。 在另一个优选实施例中，通过扫描一个或多个插入的非曝光向量，阻止所述光束到达建筑材料，来执行所选择的连续曝光向量之间的转变。

公开(公告)号：US6129884A

公开(公告)日：2000-10-10

申请号：US246501

申请日：1999-02-08

申请人： Ross D. Beers ,  Arvind Chari ,  Jouni P. Partanen ,  Nansheng Tang

发明人： Ross D. Beers ,  Arvind Chari ,  Jouni P. Partanen ,  Nansheng Tang

IPC分类号： B29C67/00 ,  B29C35/08 ,  B29C41/02

CPC分类号： B29C67/0066 ,  B29K2995/0073

摘要： A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment, control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain. In a further preferred embodiment, a quantity of prescribed stimulation may be set by consideration of desired solidification depths to be used, beam profile characteristics, material properties, and scanning speed limitations for different data types. In a still further preferred embodiment, a transition between selected consecutive exposure vectors is performed by scanning one or more interposed non-exposure vectors with the beam inhibited from reaching the building material.

摘要翻译： 用于通过选择性地使液体或其它流体状材料经受规定刺激的波束来制造三维物体的快速成型和制造（例如立体光刻）方法和装置。 在优选实施例中，在不需要规定的刺激以暴露材料的至少一些时期期间，控制规定刺激源以减少或抑制规定的刺激的产生。 在另一优选实施例中，控制刺激源以改变产生并被允许到达材料的规定刺激的量。 在另外的优选实施例中，激光输出的控制基于将调节量的电压提供给AOM并结合临时感测激光功率和已知的所需功率来实现的组合。 在另外的优选实施例中，可以通过考虑要使用的期望凝固深度，束轮廓特征，材料特性和不同数据类型的扫描速度限制来设定规定刺激的量。 在另一个优选实施例中，通过扫描一个或多个插入的非曝光向量，阻止所述光束到达建筑材料，来执行所选择的连续曝光向量之间的转变。