公开(公告)号：US20080083427A1

公开(公告)日：2008-04-10

申请号：US11869096

申请日：2007-10-09

申请人： Joy Block ,  Dana Scranton ,  Craig Meuchel

发明人： Joy Block ,  Dana Scranton ,  Craig Meuchel

IPC分类号： C23G1/02 ,  B08B3/08

CPC分类号： C23G5/00 ,  G03F7/423 ,  H01L21/02068 ,  H05K3/26

摘要： A method for removing residue from a workpiece includes preparing a liquid including de-ionized water, sulfuric acid, and optionally hydrofluoric acid. Carbon dioxide gas is provided into the liquid. The liquid is maintained at a desired temperature. The liquid is applied onto a workpiece in a process chamber. The liquid may be formed into a liquid layer on the workpiece having a controlled thickness. Ozone gas may be introduced into the chamber and chemically reacts with residue on the workpiece. In a second separate method the liquid includes de-ionized water, highly dilute hydrofluoric acid and carbon dioxide, with no need for ozone gas.

摘要翻译： 从工件中除去残渣的方法包括制备包括去离子水，硫酸和任选的氢氟酸的液体。 二氧化碳气体被提供到液体中。 将液体保持在所需温度。 将液体施加到处理室中的工件上。 液体可以形成具有受控厚度的工件上的液体层。 臭氧气体可能被引入室内并与工件上的残留物发生化学反应。 在第二种单独的方法中，液体包括去离子水，高度稀释的氢氟酸和二氧化碳，不需要臭氧气体。