公开(公告)号：US20110247559A1

公开(公告)日：2011-10-13

申请号：US12853315

申请日：2010-08-10

申请人： Jun-Chin Liu ,  Yen-Yu Pan ,  Chih-Yung Huang ,  Jung-Chen Chien ,  Shun-Yuan Lo

发明人： Jun-Chin Liu ,  Yen-Yu Pan ,  Chih-Yung Huang ,  Jung-Chen Chien ,  Shun-Yuan Lo

IPC分类号： C23C16/505 ,  C23C16/00 ,  F16L41/00

CPC分类号： C23C16/4401 ,  C23C16/45517 ,  C23C16/45565 ,  C23C16/509 ,  Y10T137/85938

摘要： A gas distribution shower module and a film deposition apparatus are provided. The gas distribution shower module includes a first distributor, a second distributor, a third distributor and a fourth distributor. The second distributor is under the first distributor, the third distributor is under the second distributor, the fourth distributor is under the third distributor, and a distance is between the fourth distributor and the third distributor. The third distributor is divided into an inner region and an outer region, and an area ratio of the inner region to the outer region is from 1:1 to 1:5. Furthermore, the third distributor has a plurality of gas holes in the inner region and the outer region, and an area ratio of the gas holes in the inner region to the gas holes in the outer region is from 1:1 to 1:5.

摘要翻译： 提供了气体分配淋浴组件和成膜装置。 气体分配淋浴模块包括第一分配器，第二分配器，第三分配器和第四分配器。 第二家经销商是第一批经销商，第三家分销商是第二家经销商，第四家分销商是第三家经销商，第四家分销商之间距离第四家分销商之间。 第三分配器分为内部区域和外部区域，内部区域与外部区域的面积比为1:1至1:5。 此外，第三分配器在内部区域和外部区域中具有多个气体孔，并且内部区域中的气体孔与外部区域中的气体孔的面积比为1:1至1:5。