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    POLYMER, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME
    2.
    发明申请
    POLYMER, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME 有权
    聚合物，其制造方法和含有该组合物的耐腐蚀组合物

    公开(公告)号：US20120165499A1

    公开(公告)日：2012-06-28

    申请号：US13330971

    申请日：2011-12-20

    申请人： Jung-Hoon OH ,  Joon Hee Han ,  Tae Gon Kim ,  Hyun Sang Joo

    发明人： Jung-Hoon OH ,  Joon Hee Han ,  Tae Gon Kim ,  Hyun Sang Joo

    IPC分类号： C08G63/66

    CPC分类号： C08G63/668 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/2039

    摘要： Provided is a copolymer containing a repeating unit represented by the following formula (1): wherein R1 represents an alkanediyl group, a heteroalkanediyl group, a cycloalkanediyl group, a heterocycloalkanediyl group, an arylene group, a heteroarylene group, or an alkylarylene group; R2 represents a hydrogen atom, an alkyl group, a heteroalkyl group, a cycloalkyl group, a heterocycloalkyl group, an aryl group, a heteroaryl group, an alkoxy group, or an alkylalkoxy group; R3, R4, R5 and R6 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; n1 represents an integer from 0 to 10; and n2 represents an integer from 0 to 10.The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.

    摘要翻译： 提供含有下式（1）表示的重复单元的共聚物：其中R1表示烷二基，杂烷二基，环烷二基，杂环烷二基，亚芳基，亚杂芳基或烷基亚芳基。 R2表示氢原子，烷基，杂烷基，环烷基，杂环烷基，芳基，杂芳基，烷氧基或烷基烷氧基; R 3，R 4，R 5和R 6各自独立地表示氢原子或碳原子数1〜5的烷基。 n1表示0〜10的整数， n2表示0〜10的整数。当共聚物掺入抗蚀剂组合物中时，可以提供令人满意的抗敏剂图案，其具有高灵敏度，高分辨率，高耐蚀刻性和减少的废气量。