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公开(公告)号：US09784466B2
公开(公告)日：2017-10-10
申请号：US13634882
申请日：2011-10-21
申请人： Jung-Yup Kim , Hyun-Joon Shin
发明人： Jung-Yup Kim , Hyun-Joon Shin
CPC分类号： F24F11/0086 , F24F11/30 , F24F11/33 , F24F11/74 , F24F2110/40
摘要： Disclosed is a smoke control system provided in a high-rise building for separately supplying leakage air flow and supplementary air flow, including: a blowing means for supplying air into a building; a ventilating means having a leakage air flow supplying passage and a supplementary air flow supplying passage connected to the blowing means for introducing air; and an air supply damper connected to the leakage air flow supplying passage and the supplementary air flow supplying passage to supply air into each lobby of a building according to the leakage air flow and supplementary air flow.
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2.发明申请AIR SUPPLY DAMPER FOR SEPARATELY SUPPLYING LEAKAGE AIR FLOW AND SUPPLEMENTARY AIR FLOW, METHOD FOR CONTROLLING THE SAME, AND SMOKE CONTROL SYSTEM UTILIZING THE SAME 有权用于单独供应泄漏空气流和补充空气流的空气供应阻尼器，用于控制其的方法和使用其的烟雾控制系统公开(公告)号：US20130005236A1
公开(公告)日：2013-01-03
申请号：US13634882
申请日：2011-10-21
申请人： Jung-Yup Kim , Hyun-Joon Shin
发明人： Jung-Yup Kim , Hyun-Joon Shin
CPC分类号： F24F11/0086 , F24F11/30 , F24F11/33 , F24F11/74 , F24F2110/40
摘要： Disclosed is a smoke control system provided in a high-rise building for separately supplying leakage air flow and supplementary air flow, including: a blowing means for supplying air into a building; a ventilating means having a leakage air flow supplying passage and a supplementary air flow supplying passage connected to the blowing means for introducing air; and an air supply damper connected to the leakage air flow supplying passage and the supplementary air flow supplying passage to supply air into each lobby of a building according to the leakage air flow and supplementary air flow.
摘要翻译： 公开了一种设置在高层建筑中的烟雾控制系统，用于分别供应泄漏气流和辅助气流，包括：用于将空气供应到建筑物中的吹风装置; 具有泄漏空气流供应通道和辅助空气流供应通道的通风装置连接到用于引入空气的吹送装置; 以及连接到泄漏空气流供应通道和辅助空气流供应通道的供气阻尼器，以根据泄漏空气流和辅助空气流将空气供应到建筑物的每个大厅。
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公开(公告)号：US08242797B2
公开(公告)日：2012-08-14
申请号：US12452730
申请日：2009-02-24
申请人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
发明人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
IPC分类号： G01R31/02
CPC分类号： G01R1/06727 , G01R1/06738
摘要： According to the present invention, allowable displacement can be increased from an excellent stress relaxation effect achieved by applying a hinge structure while adopting advantages of a dual beam cantilever-type probe that can reduce scrub. Since the hinge structure is a structure that does not receive a moment, an effect that is the same as eliminating a moment in a conventional prove can be achieved so that stress can be evenly applied and the allowable displacement of the probe can be increased.
摘要翻译： 根据本发明，可以通过应用铰链结构实现的优异的应力松弛效应来增加允许的位移，同时还采用可以减少擦洗的双梁悬臂式探头的优点。 由于铰链结构是不会受到力矩的结构，因此能够实现与现有技术中的消除力矩相同的效果，能够均匀地施加应力，能够提高探头的容许位移。
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4.发明授权Micro contact probe coated with nanostructure and method for manufacturing the same 有权用纳米结构涂覆的微接触探针及其制造方法公开(公告)号：US08957690B2
公开(公告)日：2015-02-17
申请号：US13119590
申请日：2009-02-19
申请人： Jung-Yup Kim , Hak-Joo Lee , Chang-Soo Han
发明人： Jung-Yup Kim , Hak-Joo Lee , Chang-Soo Han
CPC分类号： G01R3/00 , G01R1/06727 , G01R1/06744 , Y10S977/742 , Y10T29/49155
摘要： The present invention relates to a micro contact probe used for a probe card. An exemplary embodiment of the present invention provides a micro contact probe including a coating layer of a nanostructure such as carbon nanotubes formed on a surface thereof to reduce contact resistance when contacting a semiconductor chip. According to the micro contact probe of which the surface is coated with the nanostructure, contact resistance between the probe and the semiconductor chip is lowered and the high frequency characteristics are improved, such that a more accurate measurement can be obtained.
摘要翻译： 本发明涉及用于探针卡的微型接触探针。 本发明的示例性实施例提供了一种微接触探针，其包括在其表面上形成的诸如碳纳米管的纳米结构的涂层，以在接触半导体芯片时降低接触电阻。 根据其表面被纳米结构涂覆的微接触探针，探针与半导体芯片之间的接触电阻降低，并且提高了高频特性，从而可以获得更准确的测量。
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公开(公告)号：US08723541B2
公开(公告)日：2014-05-13
申请号：US12991492
申请日：2009-04-30
申请人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
发明人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
IPC分类号： G01R1/067
CPC分类号： G01R1/06722 , G01R1/06711 , G01R1/06716 , G01R1/06733
摘要： An exemplary embodiment of the present invention provides a vertical micro contact probe that includes a column formed by longitudinally continuously stacking a plurality of basic units and a front end formed at the front end of the column and contacting an electrode pad of a semiconductor chip. The basic unit includes a probe body alternately bending to the left and right and protrusions protruding from the probe body at the left and right sides from the center of the width direction, and contacting the adjacent probe body to support the probe body under compression.
摘要翻译： 本发明的一个示例性实施例提供一种垂直微接触探针，其包括通过纵向连续堆叠多个基本单元而形成的柱和形成在柱的前端的前端，并与半导体芯片的电极焊盘接触。 基本单元包括从宽度方向的中心左右交替地向左右弯曲的探针体和从探针主体突出的突起，并且使相邻的探针体接触以在被压缩的状态下支撑探针体。
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6.发明申请MICRO CONTACT PROBE COATED WITH NANOSTRUCTURE AND METHOD FOR MANUFACTURING THE SAME 有权微型接触探针用纳米结构及其制造方法公开(公告)号：US20110163772A1
公开(公告)日：2011-07-07
申请号：US13119590
申请日：2009-02-19
申请人： Jung-Yup Kim , Hak-Joo Lee , Chang-Soo Han
发明人： Jung-Yup Kim , Hak-Joo Lee , Chang-Soo Han
CPC分类号： G01R3/00 , G01R1/06727 , G01R1/06744 , Y10S977/742 , Y10T29/49155
摘要： The present invention relates to a micro contact probe used for a probe card.An exemplary embodiment of the present invention provides a micro contact probe including a coating layer of a nanostructure such as carbon nanotubes formed on a surface thereof to reduce contact resistance when contacting a semiconductor chip.According to the micro contact probe of which the surface is coated with the nanostructure, contact resistance between the probe and the semiconductor chip is lowered and the high frequency characteristics are improved, such that a more accurate measurement can be obtained.
摘要翻译： 本发明涉及用于探针卡的微型接触探针。 本发明的示例性实施例提供了一种微接触探针，其包括在其表面上形成的诸如碳纳米管的纳米结构的涂层，以在接触半导体芯片时降低接触电阻。 根据其表面被纳米结构涂覆的微接触探针，探针与半导体芯片之间的接触电阻降低，并且提高了高频特性，从而可以获得更准确的测量。
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7.发明申请PERPENDICULAR FINE-CONTACT PROBE HAVING A VARIABLE-STIFFNESS STRUCTURE 有权具有可变刚度结构的PERPENDICULAR FINE-CONTACT PROBE公开(公告)号：US20110057675A1
公开(公告)日：2011-03-10
申请号：US12991492
申请日：2009-04-30
申请人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
发明人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
IPC分类号： G01R1/067
CPC分类号： G01R1/06722 , G01R1/06711 , G01R1/06716 , G01R1/06733
摘要： An exemplary embodiment of the present invention provides a vertical micro contact probe that includes a column formed by longitudinally continuously stacking a plurality of basic units and a front end formed at the front end of the column and contacting an electrode pad of a semiconductor chip. The basic unit includes a probe body alternately bending to the left and right and protrusions protruding from the probe body at the left and right sides from the center of the width direction, and contacting the adjacent probe body to support the probe body under compression.
摘要翻译： 本发明的一个示例性实施例提供一种垂直微接触探针，其包括通过纵向连续堆叠多个基本单元而形成的柱和形成在柱的前端的前端，并与半导体芯片的电极焊盘接触。 基本单元包括从宽度方向的中心左右交替地向左右弯曲的探针体和从探针主体突出的突起，并且使相邻的探针体接触以在被压缩的状态下支撑探针体。
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公开(公告)号：US20100127728A1
公开(公告)日：2010-05-27
申请号：US12452730
申请日：2009-02-24
申请人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
发明人： Jung-Yup Kim , Hak-Joo Lee , Kyung-Shik Kim
IPC分类号： G01R31/02
CPC分类号： G01R1/06727 , G01R1/06738
摘要： According to the present invention, allowable displacement can be increased from an excellent stress relaxation effect achieved by applying a hinge structure while adopting advantages of a dual beam cantilever-type probe that can reduce scrub. Since the hinge structure is a structure that does not receive a moment, an effect that is the same as eliminating a moment in a conventional prove can be achieved so that stress can be evenly applied and the allowable displacement of the probe can be increased.
摘要翻译： 根据本发明，可以通过应用铰链结构实现的优异的应力松弛效应来增加允许的位移，同时还采用可以减少擦洗的双梁悬臂式探头的优点。 由于铰链结构是不会受到力矩的结构，因此能够实现与现有技术中的消除力矩相同的效果，能够均匀地施加应力，能够提高探头的容许位移。
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