公开(公告)号：US06609540B1

公开(公告)日：2003-08-26

申请号：US09604016

申请日：2000-06-26

申请人： Junichi Torisu ,  Mituyoshi Yamazaki ,  Yasuyuki Hoshino ,  Yuji Sakai ,  Shunzou Nakagawa

发明人： Junichi Torisu ,  Mituyoshi Yamazaki ,  Yasuyuki Hoshino ,  Yuji Sakai ,  Shunzou Nakagawa

IPC分类号： H01S300

CPC分类号： H01S3/223 ,  H01S3/2258 ,  Y10T137/0329 ,  Y10T137/6525 ,  Y10T137/6606 ,  Y10T137/87652

摘要： A supplying method and a supplying apparatus for supplying fluorine gas, in which when a fluorine-occluding substance is used for the fluorine gas-generating means, a necessary amount of fluorine gas can be stably and swiftly supplied to have a uniform concentration to &a chamber of an excimer laser device or the like even at running, to say nothing of the gas exchange time. In a fluorine gas-generating means, fluorine gas is generated at the use point by controlling a fluorine-occluding substance to a predetermined temperature, the fluorine gas is introduced into a mixing container, a diluting gas is introduced into the mixing container to mix it with the fluorine gas to prepare a fluorine mixed gas having a predetermined pressure and a predetermined fluorine gas concentration, and the fluorine mixed gas reserved in the mixing container is supplied to a use side such as chamber, using the pressure difference.

摘要翻译： 一种氟气的供给方法和供给装置，其中当氟气产生装置使用氟吸收物质时，可以稳定且快速地供给所需量的氟气以使其具有均匀的浓度 的准分子激光装置等，即使在运行时也不说气体交换时间。 在氟气产生装置中，通过将氟吸收物质控制到预定温度，在使用点产生氟气，将氟气引入混合容器中，将稀释气体引入混合容器中以混合 用氟气制备具有预定压力和预定氟气浓度的氟混合气体，并且使用该压力差将保留在混合容器中的氟混合气体供应到使用侧，例如室。

公开(公告)号：US06309618B1

公开(公告)日：2001-10-30

申请号：US09429278

申请日：1999-10-28

申请人： Manabu Ohira ,  Junichi Torisu ,  Yasuyuki Hoshino ,  Yuji Sakai ,  Andrei S. Kuznetsov

发明人： Manabu Ohira ,  Junichi Torisu ,  Yasuyuki Hoshino ,  Yuji Sakai ,  Andrei S. Kuznetsov

IPC分类号： C01B700

CPC分类号： B01D53/685 ,  B01D2257/204 ,  C01B7/00 ,  C01B7/07 ,  Y10S588/90 ,  Y10S588/901

摘要： A treating method comprising contacting a fluorine-containing interhalogen compound first with a treating agent for the fluorine component and then with a treating agent for the halogen component, treating agents therefor, and a method for treating exhaust gas containing a fluorine-containing interhalogen compound, comprising filling a treating agent for the fluorine component into the internal cylinder of a treating apparatus having a double cylinder structure consisting of an internal cylinder and an external cylinder, filling a treating agent for the halogen component into the external cylinder, feeding exhaust gas containing a fluorine-containing interhalogen compound into the internal cylinder to travel the internal cylinder and the external cylinder in this order, and then discharging the treated gas from the external cylinder.

摘要翻译： 一种处理方法，其特征在于，含氟化合物首先与氟组分的处理剂接触，然后与卤素组分的处理剂，其处理剂接触，以及含有含氟卤代化合物的废气的处理方法， 包括将氟组分的处理剂填充到具有由内筒和外筒组成的双缸结构的处理装置的内筒中，将卤素组分的处理剂填充到外筒中，将含有 含氟卤代化合物进入内筒，以此顺序将内筒和外筒移动，然后从外筒排出经处理的气体。

公开(公告)号：US06955801B2

公开(公告)日：2005-10-18

申请号：US10362876

申请日：2002-06-27

申请人： Junichi Torisu ,  Hitoshi Atobe ,  Yasuyuki Hoshino

发明人： Junichi Torisu ,  Hitoshi Atobe ,  Yasuyuki Hoshino

IPC分类号： C01B7/20 ,  G01N21/03 ,  G01N21/09 ,  G01N21/35 ,  G01N30/14 ,  H01S3/036 ,  H01S3/225 ,  G01N30/88

CPC分类号： G01N21/3504 ,  C01B7/20 ,  G01N21/0303 ,  G01N21/09 ,  G01N2030/143 ,  H01S3/036 ,  H01S3/225 ,  Y10T436/19

摘要： A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.

摘要翻译： 将氟化合物加热以释放氟气的步骤（1），允许氟气封闭到氟化合物中的步骤（2）和加热氟化合物并降低内部压力的步骤（3） 分别在容器中进行至少一次，然后在步骤（1）中获得高纯度氟气。 此外，将氟化合物的加热步骤（5）和内部压力降低，以及将氟化氢含量降低的氟气阻挡在氟化合物中的步骤（6）在具有氟化层的容器中进行 在其表面上分别至少形成一次，进一步进行步骤（5），然后将含有杂质气体的氟气与氟化合物化合物接触以固定和除去氟气，并通过气相色谱分析杂质 。

公开(公告)号：US20080145304A1

公开(公告)日：2008-06-19

申请号：US11663629

申请日：2005-09-22

申请人： Junichi Torisu ,  Masakazu Oka ,  Andrey Sergeyevich Kuznetsov ,  Yury Alexeyevich Petrov

发明人： Junichi Torisu ,  Masakazu Oka ,  Andrey Sergeyevich Kuznetsov ,  Yury Alexeyevich Petrov

IPC分类号： C01B9/08

CPC分类号： C01G45/06

摘要： A method of manufacturing manganese tetrafluoride comprises reacting a manganese compound and a fluorinating agent at a temperature of 250-350° C. and a pressure of 1.0-10.0 MPs to fluorinate the compound, while constantly or discontinuously crushing or grinding the starting compound and the manganese compound being reacted. According lo the method, since. fluorine is deeply penetrated into the interior of the manganese salt particles, the ratio of conversion to manganese tetrafluoride, MnF4 can he improved.

摘要翻译： 制造四氟化锰的方法包括在250-350℃的温度和1.0-10.0MPs的压力下使锰化合物和氟化剂反应以使化合物氟化，同时不断地或不连续地粉碎或研磨起始化合物，并且 锰化合物反应。 根据这个方法，因为。 氟深入渗透到锰盐颗粒的内部，可以改善四氟化锰与MnF 4的比例。

公开(公告)号：US20080102021A1

公开(公告)日：2008-05-01

申请号：US11663635

申请日：2005-09-22

申请人： Masakazu Oka ,  Tomoyuki Fukuyo ,  Junichi Torisu

发明人： Masakazu Oka ,  Tomoyuki Fukuyo ,  Junichi Torisu

IPC分类号： C01B9/08 ,  B01J19/24

CPC分类号： B01J7/00 ,  B01J19/2495 ,  B01J2219/00085 ,  C01B7/20 ,  C23C16/4405 ,  Y10T137/0329 ,  Y10T137/6525 ,  Y10T137/6606 ,  Y10T137/87652

摘要： A process for producing a fluorine gas of the invention comprises a step (1) of generating a fluorine gas by sectioning the interior of a fluorine gas generation container equipped with a heating means, by the use of a structure having gas permeability, then filling each section with a high-valence metal fluoride and heating the high-valence metal fluoride. The process may comprise a step (2) of allowing the high-valence metal fluoride, from which a fluorine gas has been generated in the step (1), to occlude a fluorine gas. According to the process of the invention, a high-purity fluorine gas that is employable as an etching gas or a cleaning gas in the process for manufacturing semiconductors or liquid crystals can be produced inexpensively on a mass scale.

摘要翻译： 本发明的氟气的制造方法包括：通过使用具有透气性的结构，通过使具有透气性的结构切断含有加热装置的氟气发生容器的内部，生成氟气的工序（1） 具有高价金属氟化物并加热高价金属氟化物。 该方法可以包括在步骤（1）中允许产生氟气的高价金属氟化物阻塞氟气的步骤（2）。 根据本发明的方法，可以廉价地以大规模生产在半导体或液晶的制造方法中可用作蚀刻气体或清洁气体的高纯度氟气。

公开(公告)号：US07572428B2

公开(公告)日：2009-08-11

申请号：US11663635

申请日：2005-09-22

申请人： Masakazu Oka ,  Tomoyuki Fukuyo ,  Junichi Torisu

发明人： Masakazu Oka ,  Tomoyuki Fukuyo ,  Junichi Torisu

IPC分类号： C01B7/20 ,  C01B9/08

CPC分类号： B01J7/00 ,  B01J19/2495 ,  B01J2219/00085 ,  C01B7/20 ,  C23C16/4405 ,  Y10T137/0329 ,  Y10T137/6525 ,  Y10T137/6606 ,  Y10T137/87652

摘要： A process for producing a fluorine gas of the invention comprises a step (1) of generating a fluorine gas by sectioning the interior of a fluorine gas generation container equipped with a heating means, by the use of a structure having gas permeability, then filling each section with a high-valence metal fluoride and heating the high-valence metal fluoride. The process may comprise a step (2) of allowing the high-valence metal fluoride, from which a fluorine gas has been generated in the step (1), to occlude a fluorine gas. According to the process of the invention, a high-purity fluorine gas that is employable as an etching gas or a cleaning gas in the process for manufacturing semiconductors or liquid crystals can be produced inexpensively on a mass scale.

摘要翻译： 本发明的氟气的制造方法包括：通过使用具有透气性的结构，通过使具有透气性的结构切断含有加热装置的氟气发生容器的内部，生成氟气的工序（1） 具有高价金属氟化物并加热高价金属氟化物。 该方法可以包括在步骤（1）中允许产生氟气的高价金属氟化物阻塞氟气的步骤（2）。 根据本发明的方法，可以廉价地以大规模生产在半导体或液晶的制造方法中可用作蚀刻气体或清洁气体的高纯度氟气。