公开(公告)号：US09696751B2

公开(公告)日：2017-07-04

申请号：US14401495

申请日：2013-01-29

Applicant: KANEKA CORPORATION

Inventor： Hiroaki Ueda ,  Kozo Kondo ,  Kazuhisa Danno

IPC: G06F1/16 ,  C23C14/34 ,  C23C14/08 ,  G06F3/044 ,  C23C14/10 ,  C23C14/00 ,  C23C14/35 ,  C23C14/56

CPC classification number: G06F1/16 ,  C23C14/0036 ,  C23C14/08 ,  C23C14/083 ,  C23C14/086 ,  C23C14/10 ,  C23C14/34 ,  C23C14/35 ,  C23C14/562 ,  G06F3/044 ,  G06F2203/04103 ,  G06F2203/04112

Abstract: A substrate is provided with a transparent electrode in which the pattern is hardly visible even when the transparent electrode layer has been patterned, and a method for manufacturing thereof is provided. On at least one of the surfaces of a transparent film, a first, second, and third dielectric material layer, and a patterned transparent electrode layer are included, in this order, each preferably having a film thickness and refractive index within a specific range. The first and third dielectric material layers are silicon oxide layers containing SiOx and SiOv as main components, respectively. The second dielectric material layer is a metal oxide layer containing a metal oxide. The transparent electrode layer is a conductive metal oxide layer containing an indium-tin composite oxide as a main component. The refractive indexes of the first (n1), second (n2), and third (n3) dielectric material layers satisfy the relationship n3

公开(公告)号：US20150145816A1

公开(公告)日：2015-05-28

申请号：US14401495

申请日：2013-01-29

Applicant: KANEKA CORPORATION

Inventor： Hiroaki Ueda ,  Kozo Kondo ,  Kazuhisa Danno

IPC: G06F1/16 ,  C23C14/34 ,  C23C14/08 ,  G06F3/044

CPC classification number: G06F1/16 ,  C23C14/0036 ,  C23C14/08 ,  C23C14/083 ,  C23C14/086 ,  C23C14/10 ,  C23C14/34 ,  C23C14/35 ,  C23C14/562 ,  G06F3/044 ,  G06F2203/04103 ,  G06F2203/04112

Abstract: A substrate is provided with a transparent electrode in which the pattern is hardly visible even when the transparent electrode layer has been patterned, and a method for manufacturing thereof is provided. On at least one of the surfaces of a transparent film, a first, second, and third dielectric material layer, and a patterned transparent electrode layer are included, in this order, each preferably having a film thickness and refractive index within a specific range. The first and third dielectric material layers are silicon oxide layers containing SiOx and SiOv as main components, respectively. The second dielectric material layer is a metal oxide layer containing a metal oxide. The transparent electrode layer is a conductive metal oxide layer containing an indium-tin composite oxide as a main component. The refractive indexes of the first (n1), second (n2), and third (n3) dielectric material layers satisfy the relationship n3

Abstract translation: 在基板上设置有透明电极，即使在图案化了透明电极层的情况下，图案几乎不可见，也提供了其制造方法。 在透明膜，第一，第二和第三电介质材料层的至少一个表面以及图案化的透明电极层上，依次包括各自优选具有特定范围内的膜厚度和折射率。 第一和第三介电材料层分别是以SiOx和SiOv为主要成分的氧化硅层。 第二电介质层是含有金属氧化物的金属氧化物层。 透明电极层是以铟锡复合氧化物为主要成分的导电性金属氧化物层。 第一（n1），第二（n2）和第三（n3）介电材料层的折射率满足n3