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公开(公告)号：US20230341760A1
公开(公告)日：2023-10-26
申请号：US18343390
申请日：2023-06-28
Applicant: KLA Corporation
Inventor： Haifeng Huang , Damon Kvamme , Rui-Fang Shi
CPC classification number: G03F1/44 , G01N21/956 , G03F1/58 , G01N21/33 , G03F1/24 , G01N21/93 , G01N2021/95676
Abstract: A photomask includes a plurality of distinctly patterned regions to provide different respective intensities of extreme ultraviolet (EUV) light in response to illumination with an EUV beam. The photomask may be part of a system that also includes a time-delay-integration (TDI) inspection tool with an EUV light source and a TDI sensor. The EUV light source is to generate the EUV beam. The photomask is to be loaded into the TDI inspection tool. The system further includes a reference intensity detector to be mounted in the TDI inspection tool to measure intensities of EUV light collected from the photomask.
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公开(公告)号：US11624904B2
公开(公告)日：2023-04-11
申请号：US16533366
申请日：2019-08-06
Applicant: KLA Corporation
Inventor： David Jalil Zare , Eduardo Soto , I-Fan Wu , Joseph Walsh , Kent McKernan , Joseph Armstrong , Christopher Davis , Garry Rose , Damon Kvamme , Bernd Burfeindt , Ali Ehsani
Abstract: An enclosure surrounding the optical component can be connected with a vapor source. The vapor source can provide a vapor to the enclosure with a vapor level from 500 ppm to 15000 ppm. The concentration of vapor in the enclosure can increase the lifespan of the optical component in the enclosure.
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公开(公告)号：US11733605B2
公开(公告)日：2023-08-22
申请号：US16900539
申请日：2020-06-12
Applicant: KLA Corporation
Inventor： Haifeng Huang , Damon Kvamme , Rui-Fang Shi
CPC classification number: G03F1/44 , G01N21/33 , G01N21/93 , G01N21/956 , G03F1/24 , G03F1/58 , G01N2021/95676
Abstract: To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. While illuminating respective distinctly patterned regions, respective instances of imaging of the respective distinctly patterned regions are performed using a TDI sensor in the inspection tool. While performing the respective instances of imaging, a reference intensity detector is used to measure reference intensities of EUV light collected from the photomask. Based on the results of the respective instances of imaging and the measured reference intensities of EUV light, linearity of the TDI sensor is determined.
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公开(公告)号：US20210041689A1
公开(公告)日：2021-02-11
申请号：US16533366
申请日：2019-08-06
Applicant: KLA Corporation
Inventor： David Jalil Zare , Eduardo Soto , I-Fan Wu , Joseph Walsh , Kent McKernan , Joseph Armstrong , Christopher Davis , Garry Rose , Damon Kvamme , Bernd Burfeindt , Ali Ehsani
IPC: G02B27/00
Abstract: An enclosure surrounding the optical component can be connected with a vapor source. The vapor source can provide a vapor to the enclosure with a vapor level from 500 ppm to 15000 ppm. The concentration of vapor in the enclosure can increase the lifespan of the optical component in the enclosure.
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