公开(公告)号：US20130255717A1

公开(公告)日：2013-10-03

申请号：US13852850

申请日：2013-03-28

Applicant: KLA-TENCOR CORPORATION

Inventor： Garry Rose ,  Gildardo Delgado

IPC: B08B7/00

CPC classification number: B08B7/0021 ,  H01J37/32862

Abstract: A system and method to clean surfaces and components of mask and wafer inspection systems based on the positive column of a glow discharge plasma are disclosed. The surface may be the surface of an optical component in a vacuum chamber or an interior wall of the vacuum chamber. A cathode and an anode may be used to generate the glow discharge plasma. The negative glow associated with the cathode may be isolated and the positive column associated with the anode may be used to clean the optical component or the interior wall of the vacuum chamber. As such, an in situ cleaning process, where the cleaning is done within the vacuum chamber, may be performed.

Abstract translation: 公开了一种基于辉光放电等离子体的正列来清洁掩模和晶片检查系统的表面和部件的系统和方法。 表面可以是真空室中的光学部件的表面或真空室的内壁。 可以使用阴极和阳极来产生辉光放电等离子体。 与阴极相关联的负辉光可以被隔离，并且与阳极相关联的正极可用于清洁真空室的光学部件或内壁。 因此，可以执行在真空室内进行清洁的原位清洁过程。

公开(公告)号：US20140168758A1

公开(公告)日：2014-06-19

申请号：US13839570

申请日：2013-03-15

Applicant: KLA-Tencor Corporation

Inventor： Garry Rose ,  Guorong Vera Zhuang ,  Gildardo Delgado ,  Qiang Zhang

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  G21K1/062 ,  G21K1/067

Abstract: A mirror for reflecting extreme ultraviolet light (EUV) comprising: a substrate layer; and an upper layer above the substrate layer, that reflects EUV wavelengths and refracts longer wavelengths, said upper layer being dense and hard carbon having an Sp2 to Sp3 carbon bond ratio of 0 to about 3 and a normal incidence EUV mirror comprising an optical coating on an uppermost surface which permits transmission of EUV and protects the surface from environmental degradation, said coating being dense and hard and having an Sp2 carbon bond ratio of 0 to about 3 and a thickness of 0.1 to about 5 nanometers. The invention also includes EUV mirror systems protected by a dense carbon layer and includes a multilayer EUV reflecting system having an out of band absorbing layer.

Abstract translation: 一种用于反射极紫外光（EUV）的反射镜，包括：基底层; 以及反射EUV波长并折射较长波长的上层，所述上层是具有0至约3的Sp2至Sp3碳键比的致密和硬碳，以及包含光学涂层的法向入射EUV镜 允许EUV传播并保护表面免受环境恶化的最上表面，所述涂层致密且硬，并且具有0至约3的Sp 2碳键比和0.1至约5纳米的厚度。 本发明还包括由致密碳层保护的EUV反射镜系统，并且包括具有带外吸收层的多层EUV反射系统。

公开(公告)号：US20140158914A1

公开(公告)日：2014-06-12

申请号：US14101065

申请日：2013-12-09

Applicant: Sandia Corporation ,  KLA-Tencor Corporation

Inventor： Leonard E. Klebanoff ,  Jeromy T. Hollenshead ,  Gildardo Delgado ,  Elena Starodub ,  Karl R. Umstadter ,  Guorong V. Zhuang ,  Garry Rose

IPC: G02B27/00 ,  G01N23/00

CPC classification number: G02B1/18 ,  G02B27/0006

Abstract: An optical component arranged for use in a low pressure environment including: a surface arranged to receive extreme ultra-violet (EUV) light and a coating, on the surface, arranged to block at least one contaminant in the low pressure environment from binding to the surface. A method of mitigating contamination of a surface of an optical component, including: inserting the optical component into a chamber for a semi-conductor inspection system, controlling a temperature and a pressure within the chamber, introducing a blocking material, in a gaseous state, into the chamber, coating a surface of the optical component with the blocking material, and preventing, using the coating, a contaminant in the chamber from binding to the optical component.

Abstract translation: 布置成用于低压环境的光学部件，包括：布置成接收极紫外（EUV）光的表面和表面上的涂层，其布置成阻挡低压环境中的至少一种污染物结合到 表面。 一种减轻光学部件的表面污染的方法，包括：将光学部件插入用于半导体检查系统的室中，控制室内的温度和压力，以气态引入阻塞材料， 进入室中，用阻挡材料涂覆光学部件的表面，并且防止使用涂层将室内的污染物结合到光学部件。

公开(公告)号：US20140007910A1

公开(公告)日：2014-01-09

申请号：US13935960

申请日：2013-07-05

Applicant: KLA-Tencor Corporation

Inventor： Garry Rose ,  Gildardo Delgado ,  H. Steven Larson ,  Daniel R. Hennigan

IPC: B08B5/02

CPC classification number: B08B5/02 ,  G02B27/0006

Abstract: An apparatus for cross-flow purging for optical components in a chamber, including: a housing with first and second axial ends, a side wall extending in an axial direction and connecting the first and second axial ends, and the chamber formed by the first and second axial ends and the side wall; an optical component disposed within the chamber and fixed with respect to the housing via at least one connecting point on the optical component; an inlet port aligned with the side wall, between the first and second axial ends in the axial direction, in a radial direction orthogonal to the axial direction and arranged to inject a purge gas into the chamber and across the optical component in a radial direction orthogonal to the axial direction; and an exhaust port aligned with the side wall in the radial direction and arranged to exhaust the purge gas from the chamber.

Abstract translation: 一种用于腔室中的光学部件的横流吹扫的装置，包括：具有第一和第二轴向端部的壳体，沿轴向方向延伸并连接第一和第二轴向端部的侧壁以及由第一和第二轴向端部形成的腔室 第二轴向端和侧壁; 光学部件，设置在所述腔室内并且经由所述光学部件上的至少一个连接点相对于所述壳体固定; 入口端口，其与所述侧壁对准，在所述第一和第二轴向端部之间沿轴向方向在与所述轴向方向正交的径向方向上，并且布置成将吹扫气体沿径向正交地喷射到所述腔室中并穿过所述光学部件 到轴向; 以及排气口，其在径向方向上与所述侧壁对准并且布置成从所述室排出净化气体。

公开(公告)号：US09662688B2

公开(公告)日：2017-05-30

申请号：US13935960

申请日：2013-07-05

Applicant: KLA-Tencor Corporation

Inventor： Garry Rose ,  Gildardo Delgado ,  H. Steven Larson ,  Daniel R. Hennigan

IPC: B65B31/00 ,  B08B5/02 ,  G02B27/00

CPC classification number: B08B5/02 ,  G02B27/0006

Abstract: An apparatus for cross-flow purging for optical components in a chamber, including: a housing with first and second axial ends, a side wall extending in an axial direction and connecting the first and second axial ends, and the chamber formed by the first and second axial ends and the side wall; an optical component disposed within the chamber and fixed with respect to the housing via at least one connecting point on the optical component; an inlet port aligned with the side wall, between the first and second axial ends in the axial direction, in a radial direction orthogonal to the axial direction and arranged to inject a purge gas into the chamber and across the optical component in a radial direction orthogonal to the axial direction; and an exhaust port aligned with the side wall in the radial direction and arranged to exhaust the purge gas from the chamber.