公开(公告)号：US10921262B2

公开(公告)日：2021-02-16

申请号：US16886255

申请日：2020-05-28

Applicant: KLA-Tencor Corporation

Inventor： Qiang Zhang ,  Grace H. Chen

IPC: G01N21/00 ,  G01N21/95 ,  G06T7/00 ,  G06T7/174 ,  G06T7/11 ,  G01N23/2251 ,  G01N21/956

Abstract: Disclosed are apparatus and methods for inspecting a sample. Locations corresponding to candidate defect events on a sample are provided from an inspector operable to acquire optical images from which such candidate defect events are detected at their corresponding locations across the sample. High-resolution images are acquired from a high-resolution inspector of the candidate defect events at their corresponding locations on the sample. Each of a set of modelled optical images, which have been modeled from a set of the acquired high-resolution images, is correlated with corresponding ones of a set of the acquired optical images, to identify surface noise events, as shown in the set of high-resolution images, as sources for the corresponding candidate events in the set of acquired optical images. Otherwise, a subsurface event is identified as a likely source for a corresponding candidate defect event.

公开(公告)号：US20200292468A1

公开(公告)日：2020-09-17

申请号：US16886255

申请日：2020-05-28

Applicant: KLA-Tencor Corporation

Inventor： Qiang Zhang ,  Grace H. Chen

IPC: G01N21/95 ,  G06T7/00 ,  G06T7/174 ,  G06T7/11 ,  G01N23/2251 ,  G01N21/956

Abstract: Disclosed are apparatus and methods for inspecting a sample. Locations corresponding to candidate defect events on a sample are provided from an inspector operable to acquire optical images from which such candidate defect events are detected at their corresponding locations across the sample. High-resolution images are acquired from a high-resolution inspector of the candidate defect events at their corresponding locations on the sample. Each of a set of modelled optical images, which have been modeled from a set of the acquired high-resolution images, is correlated with corresponding ones of a set of the acquired optical images, to identify surface noise events, as shown in the set of high-resolution images, as sources for the corresponding candidate events in the set of acquired optical images. Otherwise, a subsurface event is identified as a likely source for a corresponding candidate defect event.

公开(公告)号：US10697900B2

公开(公告)日：2020-06-30

申请号：US16394723

申请日：2019-04-25

Applicant: KLA-Tencor Corporation

Inventor： Qiang Zhang ,  Grace H. Chen

IPC: G01N21/00 ,  G01N21/95 ,  G06T7/00 ,  G06T7/174 ,  G06T7/11 ,  G01N23/2251 ,  G01N21/956

Abstract: Disclosed are apparatus and methods for inspecting a semiconductor sample. Locations corresponding to candidate defect events on a semiconductor sample are provided from an optical inspector operable to acquire optical images from which such candidate defect events are detected at their corresponding locations across the sample. High-resolution images are acquired from a high-resolution inspector of the candidate defect events at their corresponding locations on the sample. Each of a set of modelled optical images, which have been modeled from a set of the acquired high-resolution images, is correlated with corresponding ones of a set of the acquired optical images, to identify surface noise events, as shown in the set of high-resolution images, as sources for the corresponding candidate events in the set of acquired optical images. Otherwise, a subsurface event is identified as a likely source for a corresponding candidate defect event.

公开(公告)号：US20190383753A1

公开(公告)日：2019-12-19

申请号：US16394723

申请日：2019-04-25

Applicant: KLA-Tencor Corporation

Inventor： Qiang Zhang ,  Grace H. Chen

IPC: G01N21/95 ,  G06T7/00 ,  G06T7/174 ,  G06T7/11 ,  G01N21/956 ,  G01N23/2251

Abstract: Disclosed are apparatus and methods for inspecting a semiconductor sample. Locations corresponding to candidate defect events on a semiconductor sample are provided from an optical inspector operable to acquire optical images from which such candidate defect events are detected at their corresponding locations across the sample. High-resolution images are acquired from a high-resolution inspector of the candidate defect events at their corresponding locations on the sample. Each of a set of modelled optical images, which have been modeled from a set of the acquired high-resolution images, is correlated with corresponding ones of a set of the acquired optical images, to identify surface noise events, as shown in the set of high-resolution images, as sources for the corresponding candidate events in the set of acquired optical images. Otherwise, a subsurface event is identified as a likely source for a corresponding candidate defect event.

公开(公告)号：US09335206B2

公开(公告)日：2016-05-10

申请号：US14010484

申请日：2013-08-26

Applicant: KLA-Tencor Corporation

Inventor： Qiang Zhang ,  Yanwei Liu ,  Abdurrahman Sezginer

IPC: G01J1/00 ,  G01J1/42 ,  G21K7/00 ,  G02B5/08

CPC classification number: G01J1/00 ,  G01J1/4257 ,  G02B5/0833 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/50 ,  G03F1/52 ,  G03F1/84 ,  G21K7/00

Abstract: Disclosed is test structure for measuring wave-front aberration of an extreme ultraviolet (EUV) inspection system. The test structure includes a substrate formed from a material having substantially no reflectivity for EUV light and a multilayer (ML) stack portion, such as a pillar, formed on the substrate and comprising a plurality of alternating pairs of layers having different refractive indexes so as to reflect EUV light. The pairs have a count equal to or less than 15.

Abstract translation: 公开了用于测量极紫外（EUV）检测系统的波前像差的测试结构。 测试结构包括由基本上不对EUV光反射的材料形成的基板和形成在基板上的多层（ML）堆叠部分，例如柱状物，并且包括具有不同折射率的多个交替对的层， 反映EUV光。 这些对具有等于或小于15的计数。

公开(公告)号：US20140063490A1

公开(公告)日：2014-03-06

申请号：US14010484

申请日：2013-08-26

Applicant: KLA-Tencor Corporation

Inventor： Qiang Zhang ,  Yanwei Liu ,  Abdurrahman Sezginer

IPC: G01J1/42

CPC classification number: G01J1/00 ,  G01J1/4257 ,  G02B5/0833 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/50 ,  G03F1/52 ,  G03F1/84 ,  G21K7/00

Abstract: Disclosed is test structure for measuring wave-front aberration of an extreme ultraviolet (EUV) inspection system. The test structure includes a substrate formed from a material having substantially no reflectivity for EUV light and a multilayer (ML) stack portion, such as a pillar, formed on the substrate and comprising a plurality of alternating pairs of layers having different refractive indexes so as to reflect EUV light. The pairs have a count equal to or less than 15.

Abstract translation: 公开了用于测量极紫外（EUV）检测系统的波前像差的测试结构。 测试结构包括由基本上不对EUV光反射的材料形成的基板和形成在基板上的多层（ML）堆叠部分，例如柱状物，并且包括具有不同折射率的多个交替对的层， 反映EUV光。 这些对具有等于或小于15的计数。

公开(公告)号：US20180100814A1

公开(公告)日：2018-04-12

申请号：US15593163

申请日：2017-05-11

Applicant: KLA-Tencor Corporation

Inventor： Qiang Zhang ,  Rui-fang Shi

IPC: G01N21/956 ,  G01N21/33

Abstract: Disclosed are methods and apparatus for inspecting an extreme ultraviolet (EUV) reticle using an optical inspection tool. An inspection tool having a pupil filter positioned at an imaging pupil is used to obtain a test image or signal from an output beam that is reflected and scattered from a test portion of an EUV test reticle. The pupil filter is configured to provide phase contrast in the output beam. A reference image or signal is obtained for a reference reticle portion that is designed to be identical to the test reticle portion. The test and reference images or signals are compared and it is determined whether the test reticle portion has any candidate defects based on such comparison. For each of a plurality of test reticle portions of the reticle, the operations for using the inspection tool, obtaining a reference image or signal, comparing, and determining are repeated. A defect report is generated based on any candidate defects that have been determined to be present.

公开(公告)号：US10761031B1

公开(公告)日：2020-09-01

申请号：US16119970

申请日：2018-08-31

Applicant: KLA Tencor Corporation

Inventor： Qiang Zhang ,  Abdurrahman Sezginer

IPC: G01N21/88 ,  G01N21/95

Abstract: Disclosed is a system that includes a light source for generating an illumination beam and an illumination lens system for directing the illumination beam towards a sample. The system further includes a collection lens system for directing towards a detector output light from the sample in response to the illumination beam and a detector for receiving the output light from the sample. The collection lens system includes a fixed-design compensator plate having individually selectable filters with different configurations for correcting system aberration of the system under different operating conditions. The system also includes a controller operable for: (i) generating and directing the illumination beam towards the sample, (ii) selecting operating conditions and a filter for correcting the system aberration under such selected operating conditions, (iii) generating an image based on the output light, and (iv) determining whether the sample passes inspection or characterizing such sample based on the image.

公开(公告)号：US20140168758A1

公开(公告)日：2014-06-19

申请号：US13839570

申请日：2013-03-15

Applicant: KLA-Tencor Corporation

Inventor： Garry Rose ,  Guorong Vera Zhuang ,  Gildardo Delgado ,  Qiang Zhang

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  G21K1/062 ,  G21K1/067

Abstract: A mirror for reflecting extreme ultraviolet light (EUV) comprising: a substrate layer; and an upper layer above the substrate layer, that reflects EUV wavelengths and refracts longer wavelengths, said upper layer being dense and hard carbon having an Sp2 to Sp3 carbon bond ratio of 0 to about 3 and a normal incidence EUV mirror comprising an optical coating on an uppermost surface which permits transmission of EUV and protects the surface from environmental degradation, said coating being dense and hard and having an Sp2 carbon bond ratio of 0 to about 3 and a thickness of 0.1 to about 5 nanometers. The invention also includes EUV mirror systems protected by a dense carbon layer and includes a multilayer EUV reflecting system having an out of band absorbing layer.

Abstract translation: 一种用于反射极紫外光（EUV）的反射镜，包括：基底层; 以及反射EUV波长并折射较长波长的上层，所述上层是具有0至约3的Sp2至Sp3碳键比的致密和硬碳，以及包含光学涂层的法向入射EUV镜 允许EUV传播并保护表面免受环境恶化的最上表面，所述涂层致密且硬，并且具有0至约3的Sp 2碳键比和0.1至约5纳米的厚度。 本发明还包括由致密碳层保护的EUV反射镜系统，并且包括具有带外吸收层的多层EUV反射系统。