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Patent Agency Ranking
公开(公告)号：US20170146915A1
公开(公告)日：2017-05-25
申请号：US15114175
申请日：2016-05-19
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Amnon Manassen , Yoni Shalibo
Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.
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公开(公告)号：US10520832B2
公开(公告)日：2019-12-31
申请号：US15114175
申请日：2016-05-19
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Amnon Manassen , Yoni Shalibo
Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.
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公开(公告)号：US11314173B2
公开(公告)日：2022-04-26
申请号：US16672483
申请日：2019-11-03
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Amnon Manassen , Yoni Shalibo
Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.
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公开(公告)号：US11281111B2
公开(公告)日：2022-03-22
申请号：US16317603
申请日：2018-12-14
Applicant: KLA-TENCOR CORPORATION
Inventor： Yoni Shalibo , Yuri Paskover , Vladimir Levinski , Amnon Manassen , Shlomo Eisenbach , Gilad Laredo , Ariel Hildesheim
Abstract: Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices. Methods comprise illuminating the target in a Littrow configuration to yield a first measurement signal comprising a −1st diffraction order and a 0th diffraction order and a second measurement signal comprising a +1st distraction order and a 0th diffraction order, wherein the −1st diffraction order of the first measurement signal and the +1st diffraction order of the second measurement signal are diffracted at 180° to a direction of the illumination, performing a first measurement of the first measurement signal and a second measurement of the second measurement signal, and deriving metrology metric(s) therefrom. Optionally, a reflected 0th diffraction order may be split to yield components which interact with the −1st and +1st diffraction orders.
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公开(公告)号：US20210255551A1
公开(公告)日：2021-08-19
申请号：US17241006
申请日：2021-04-26
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Amnon Manassen , Yoni Shalibo
Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.
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