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公开(公告)号：US11378451B2
公开(公告)日：2022-07-05
申请号：US15672120
申请日：2017-08-08
发明人： Tianhan Wang , Aaron Rosenberg , Dawei Hu , Alexander Kuznetsov , Manh Dang Nguyen , Stilian Pandev , John Lesoine , Qiang Zhao , Liequan Lee , Houssam Chouaib , Ming Di , Torsten R. Kaack , Andrei V. Shchegrov , Zhengquan Tan
IPC分类号： G01J3/18 , G01J3/28 , G01N21/55 , G01N21/956 , G01N21/21 , G01N21/25 , G01N21/88 , G01N21/84
摘要： A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
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公开(公告)号：US20190041266A1
公开(公告)日：2019-02-07
申请号：US15672120
申请日：2017-08-08
发明人： Tianhan Wang , Aaron Rosenberg , Dawei Hu , Alexander Kuznetsov , Manh Dang Nguyen , Stilian Pandev , John Lesoine , Qiang Zhao , Liequan Lee , Houssam Chouaib , Ming Di , Torsten R. Kaack , Andrei V. Shchegrov , Zhengquan Tan
摘要： A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
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