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公开(公告)号：US20140340682A1
公开(公告)日：2014-11-20
申请号：US14277898
申请日：2014-05-15
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/274 , G01N21/9501 , G01N2021/213
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
Abstract translation: 提出了用于匹配一个或多个光学测量系统的测量光谱的方法和系统。 用于确定样本对目标计量系统执行的测量的光谱响应的一个或多个系统参数的值被优化。 对系统参数值进行优化，使得由参考系统生成的测量光谱与目标系统之间的差异最小化，以测量相同的度量目标。 还提出了用于在一个或多个光学测量系统上匹配光谱误差的方法和系统。 可靠的计量系统测量至少一个样本参数的值，以最小化由参考和目标计量系统测量时存在的不同测量条件引入的模型误差。 提出了基于低阶响应面的参数优化方法和系统，以减少改进系统校准参数所需的计算时间。
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Patent Agency Ranking
公开(公告)号：US10605722B2
公开(公告)日：2020-03-31
申请号：US15836160
申请日：2017-12-08
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
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公开(公告)号：US20180100796A1
公开(公告)日：2018-04-12
申请号：US15836160
申请日：2017-12-08
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/274 , G01N21/9501 , G01N2021/213
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
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公开(公告)号：US11378451B2
公开(公告)日：2022-07-05
申请号：US15672120
申请日：2017-08-08
Applicant: KLA-Tencor Corporation
Inventor： Tianhan Wang , Aaron Rosenberg , Dawei Hu , Alexander Kuznetsov , Manh Dang Nguyen , Stilian Pandev , John Lesoine , Qiang Zhao , Liequan Lee , Houssam Chouaib , Ming Di , Torsten R. Kaack , Andrei V. Shchegrov , Zhengquan Tan
Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
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公开(公告)号：US20190041266A1
公开(公告)日：2019-02-07
申请号：US15672120
申请日：2017-08-08
Applicant: KLA-Tencor Corporation
Inventor： Tianhan Wang , Aaron Rosenberg , Dawei Hu , Alexander Kuznetsov , Manh Dang Nguyen , Stilian Pandev , John Lesoine , Qiang Zhao , Liequan Lee , Houssam Chouaib , Ming Di , Torsten R. Kaack , Andrei V. Shchegrov , Zhengquan Tan
Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
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公开(公告)号：US09857291B2
公开(公告)日：2018-01-02
申请号：US14277898
申请日：2014-05-15
Applicant: KLA-Tencor Corporation
Inventor： Hidong Kwak , John Lesoine , Malik Sadiq , Lanhua Wei , Shankar Krishnan , Leonid Poslavsky , Mikhail M. Sushchik
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/274 , G01N21/9501 , G01N2021/213
Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
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