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公开(公告)号：US20180209784A1
公开(公告)日：2018-07-26
申请号：US15329778
申请日：2016-11-04
Applicant: KLA-Tencor Corporation
Inventor： Guoheng Zhao , Maarten van der Burgt , Sheng Liu , Andy Hill , Johan De Greeve , Karel van Gils
CPC classification number: G01B11/2518 , G01B11/0608 , G01B11/24 , G01B11/2513 , G01B11/2522 , G01B2210/56
Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.
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公开(公告)号：US11287248B2
公开(公告)日：2022-03-29
申请号：US16806076
申请日：2020-03-02
Applicant: KLA-Tencor Corporation
Inventor： Guoheng Zhao , Maarten van der Burgt , Sheng Liu , Andy Hill , Johan De Greeve , Karel van Gils
Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.
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公开(公告)号：US20200217651A1
公开(公告)日：2020-07-09
申请号：US16806076
申请日：2020-03-02
Applicant: KLA-Tencor Corporation
Inventor： Guoheng Zhao , Maarten van der Burgt , Sheng Liu , Andy Hill , Johan De Greeve , Karel van Gils
Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.
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