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Patent Agency Ranking
公开(公告)号：US11668655B2
公开(公告)日：2023-06-06
申请号：US16272528
申请日：2019-02-11
Applicant: KLA-Tencor Corporation
Inventor： Vaibhav Gaind , Grace H. Chen , Amrit Poudel , Mark S. Wang
CPC classification number: G01N21/8851 , G01N21/9501 , G01N2021/8874 , G01N2021/8887
Abstract: A semiconductor-inspection tool scans a semiconductor die using a plurality of optical modes. A plurality of defects on the semiconductor die are identified based on results of the scanning. Respective defects of the plurality of defects correspond to respective pixel sets of the semiconductor-inspection tool. The scanning fails to resolve the respective defects. The results include multi-dimensional data based on pixel intensity for the respective pixel sets, wherein each dimension of the multi-dimensional data corresponds to a distinct mode of the plurality of optical modes. A discriminant function is applied to the results to transform the multi-dimensional data for the respective pixel sets into respective scores. Based at least in part on the respective scores, the respective defects are divided into distinct classes.
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公开(公告)号：US09927371B2
公开(公告)日：2018-03-27
申请号：US14691966
申请日：2015-04-21
Applicant: KLA-Tencor Corporation
Inventor： Mark S. Wang , Chris Kirk , Andrey Kharisov
CPC classification number: G01N21/8851 , G01N21/9501 , G01N2201/068 , G01N2201/10 , G01N2201/121 , G02B21/0028 , G02B21/0032 , G02B21/0072 , G02B21/365 , H01L22/12
Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.
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公开(公告)号：US20150369750A1
公开(公告)日：2015-12-24
申请号：US14691966
申请日：2015-04-21
Applicant: KLA-Tencor Corporation
Inventor： Mark S. Wang , Chris Kirk , Andrey Kharisov
CPC classification number: G01N21/8851 , G01N21/9501 , G01N2201/068 , G01N2201/10 , G01N2201/121 , G02B21/0028 , G02B21/0032 , G02B21/0072 , G02B21/365 , H01L22/12
Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.
Abstract translation: 线扫描晶片检查系统包括共焦狭缝孔径滤光器以去除旁瓣并增强扫描方向上的分辨率。 与狭缝孔径滤波器相关联的位置检测器监测和校正相对于狭缝孔径的照明线图像位置，以将图像位置变化保持在可容许的极限内。 每个检测器测量线路位置，然后使用线路位置信号在反馈回路中调整收集路径中的光学，机械和电子部件。 反馈回路可用于运行时校准过程或检查期间以增强稳定性。
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公开(公告)号：US20200025689A1
公开(公告)日：2020-01-23
申请号：US16272528
申请日：2019-02-11
Applicant: KLA-Tencor Corporation
Inventor： Vaibhav Gaind , Grace H. Chen , Amrit Poudel , Mark S. Wang
Abstract: A semiconductor-inspection tool scans a semiconductor die using a plurality of optical modes. A plurality of defects on the semiconductor die are identified based on results of the scanning. Respective defects of the plurality of defects correspond to respective pixel sets of the semiconductor-inspection tool. The scanning fails to resolve the respective defects. The results include multi-dimensional data based on pixel intensity for the respective pixel sets, wherein each dimension of the multi-dimensional data corresponds to a distinct mode of the plurality of optical modes. A discriminant function is applied to the results to transform the multi-dimensional data for the respective pixel sets into respective scores. Based at least in part on the respective scores, the respective defects are divided into distinct classes.
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公开(公告)号：US09423357B2
公开(公告)日：2016-08-23
申请号：US14288622
申请日：2014-05-28
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang , Charles N. Wang , Yevgeniy Churin , Yong-Mo Moon , Hyoseok Daniel Yang , Mark S. Wang
CPC classification number: G01N21/8806 , G01N21/9501
Abstract: One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.
Abstract translation: 一个实施例涉及一种倾斜照明器。 倾斜照明器包括发射光束的光源，第一反射表面和第二反射表面。 第一反射表面具有凸起的圆柱形形状，具有沿着非供电方向的投影抛物线轮廓，其被配置为反射来自光源的光束并且限定焦线。 第二反射表面具有凹入的圆柱形形状，其具有突出的椭圆形轮廓，其被配置为反射来自第一反射表面的光束并且限定第一和第二焦线。 第一反射面的焦线与第二反射面的第一焦线重合。 第二反射表面的第一和第二焦线可以是相同的线，在这种情况下，椭圆曲率是投影的球形轮廓。 还公开了其它实施例，方面和特征。
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