公开(公告)号：US20230326631A1

公开(公告)日：2023-10-12

申请号：US18022926

申请日：2021-07-16

Applicant: KOA CORPORATION

Inventor： Yoshitaka KUMEDA ,  Tadahiko YOSHIOKA

IPC: H01C1/00 ,  H01C7/13 ,  C22C9/05 ,  C22F1/08 ,  C22F1/02

CPC classification number: H01C1/00 ,  H01C7/13 ,  C22C9/05 ,  C22F1/08 ,  C22F1/02

Abstract: Provided is a current detection resistor, such as a shunt resistor, wherein a. low specific resistance and a small thermal electromotive force with respect to copper are achieved, while maintaining a low TCR. A resistance alloy for use in a current detection shunt resistor includes 4.5 to 5.5 mass % of manganese, 0.05 to 0.30 mass % of silicon, 0.10 to 0.30 mass % of iron, and a balance being copper, and has a specific resistance of 15 to 25 μΩ·m.

公开(公告)号：US20170221614A1

公开(公告)日：2017-08-03

申请号：US15304989

申请日：2015-04-09

Applicant: KOA CORPORATION

Inventor： Kosuke ARAI ,  Tadahiko YOSHIOKA

IPC: H01C17/28 ,  H01C1/16 ,  H01C1/01 ,  H01C1/14

CPC classification number: H01C17/28 ,  H01C1/01 ,  H01C1/14 ,  H01C1/16 ,  H01C17/006 ,  H01C17/24 ,  H01C17/245 ,  Y10T29/49082 ,  Y10T29/49101

Abstract: Provided is a method for producing a resistor, including a step of forming a through-hole in a sheet-like conductive material; a step of fitting a resistive element piece into the through-hole and thus forming joint portions where end surfaces of the resistive element piece are joined to respective side surfaces of the conductive material exposed by the through-hole; and stamping a region including the joint portions from the conductive material, thereby forming a resistor including a resistive element and a pair of electrodes.

公开(公告)号：US20220328217A1

公开(公告)日：2022-10-13

申请号：US17754031

申请日：2020-08-06

Applicant: KOA Corporation

Inventor： Reina KANEKO ,  Yoshitaka KUMEDA ,  Tadahiko YOSHIOKA

IPC: H01C7/13 ,  H01C17/02 ,  H01C17/065

Abstract: The resistive material contains copper and manganese, an oxide film of manganese being formed on a surface of the resistive material.

公开(公告)号：US20230287540A1

公开(公告)日：2023-09-14

申请号：US18019755

申请日：2021-05-20

Applicant: KOA CORPORATION

Inventor： Naoki KANAUCHI ,  Yoshitaka KUMEDA ,  Tadahiko YOSHIOKA

IPC: C22C9/05 ,  H01C7/00

CPC classification number: C22C9/05 ,  H01C7/00

Abstract: Provided is a resistance alloy enabling a decrease in the TCR of a shunt resistor for use in a current detection device capable of detecting large currents. A copper-manganese based resistance alloy for use in a shunt resistor further comprises tin and nickel and has a TCR less than or equal to −36×10−6/K at 100° C. with reference to 25° C.

公开(公告)号：US20230133344A1

公开(公告)日：2023-05-04

申请号：US17915677

申请日：2021-03-22

Applicant: KOA CORPORATION

Inventor： Naoki KANAUCHI ,  Yoshitaka KUMEDA ,  Tadahiko YOSHIOKA

IPC: C22C9/05 ,  C22C1/04 ,  H01C1/14

Abstract: Provided is a copper-manganese-nickel based alloy having characteristics (in particular, specific resistance) close to those of a nickel-chromium based alloy. It is also an objective to provide an alloy having high processability compared to a nickel-chromium based alloy. An alloy for a resistive body includes copper, manganese, and nickel, wherein the manganese is 33 to 38% by mass, and the nickel is 8 to 15% by mass.

公开(公告)号：US20180174721A1

公开(公告)日：2018-06-21

申请号：US15736123

申请日：2016-06-08

Applicant: KOA CORPORATION

Inventor： Kenji KAMEKO ,  Kosuke ARAI ,  Tadahiko YOSHIOKA

IPC: H01C17/28 ,  G01R19/00 ,  H01C1/14

CPC classification number: H01C17/28 ,  G01R1/203 ,  G01R15/00 ,  G01R19/0092 ,  H01C1/14 ,  H01C13/00

Abstract: Provided is a resistor including a first electrode, a second electrode, and a resistive element disposed between the first and second electrodes. Each of the first and second electrodes includes a main electrode portion and a narrow electrode portion with a narrower width than that of the main electrode portion. The resistive element is disposed between the two narrow electrode portions.