METHOD OF TREATING A SURFACE LAYER OF A DEVICE CONSISTING OF ALUMINA AND RESPECTIVE DEVICE, PARTICULARLY X-RAY TUBE COMPONENT
    2.
    发明申请
    METHOD OF TREATING A SURFACE LAYER OF A DEVICE CONSISTING OF ALUMINA AND RESPECTIVE DEVICE, PARTICULARLY X-RAY TUBE COMPONENT 审中-公开
    处理包含氧化铝和相关器件的器件的表面层的方法,特别是X射线管组件

    公开(公告)号:US20150139401A1

    公开(公告)日:2015-05-21

    申请号:US14412004

    申请日:2013-07-01

    Abstract: A method for treating a surface layer (3) of a device (1) consisting of alumina and a corresponding device (1) are proposed. The method comprises providing the device (1) with the surface layer (3) to be treated being exposed and heating the surface layer (3) of the device (1) in an oxygen-depleted atmosphere comprising e.g. one of an inert gas, nitrogen, hydrogen, argon and a combination thereof to a temperature higher than 1000° C., preferably higher than 1700° C. for a duration of preferably more than 2 hours. Due to such treatment, a superficial layer region (7) comprised in the surface layer (3) may obtain a significantly reduced electrical resistivity which is assumed to be the result of chemically reducing this superficial layer region (7). Such reduced superficial electrical resistivity may advantageously serve for example in components of electron beam devices such as x-ray tube components for preventing any charge build-up.

    Abstract translation: 提出了一种处理由氧化铝和相应的装置(1)组成的装置(1)的表面层(3)的方法。 该方法包括提供待处理的表面层(3)暴露的装置(1),并在包含例如氧化铝的贫氧气氛中加热装置(1)的表面层(3)。 惰性气体,氮气,氢气,氩气及其组合中的一种,其温度高于1000℃,优选高于1700℃,持续时间优选为2小时以上。 由于这种处理,包含在表面层(3)中的表面层区域(7)可以获得显着降低的电阻率,这被认为是化学还原该表面层区域(7)的结果。 这种降低的表面电阻率可以有利地用于例如电子束装置的部件,例如用于防止任何电荷积聚的X射线管部件。

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