ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING APPARATUS

    公开(公告)号:US20180076080A1

    公开(公告)日:2018-03-15

    申请号:US15449255

    申请日:2017-03-03

    IPC分类号: H01L21/683

    CPC分类号: H01L21/6833

    摘要: An electrostatic chuck includes a first electrode provided in a first plane, a second electrode provided in a second plane parallel to the first plane, and an insulator. The second electrode includes a plurality of portions which intersect with an intersection line between a region in which the first electrode is orthogonally projected to the second plane and a third plane vertical to the second plane. The insulator is provided between the first and second electrodes.