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公开(公告)号:US6106374A
公开(公告)日:2000-08-22
申请号:US116792
申请日:1998-07-16
申请人: Karl E. Boggs , Leonard C. Stevens
发明人: Karl E. Boggs , Leonard C. Stevens
摘要: A chemical mechanical polishing apparatus comprises a delivery system for supplying a slurry, wherein the slurry includes suspended particles and at least one acoustic element, connected to the delivery system, the acoustic element generating sound waves for agitating the slurry and maintaining the particles in suspension.
摘要翻译: 化学机械抛光装置包括用于供应浆料的输送系统,其中所述浆料包括悬浮颗粒和连接到输送系统的至少一个声学元件,所述声学元件产生用于搅拌浆料并保持悬浮液的声波。