Hydroxyl-containing surfactants with low surface tension and their use thereof
    2.
    发明授权
    Hydroxyl-containing surfactants with low surface tension and their use thereof 失效
    具有低表面张力的含羟基的表面活性剂及其用途

    公开(公告)号:US07598215B2

    公开(公告)日:2009-10-06

    申请号:US11277184

    申请日:2006-03-22

    IPC分类号: C11D1/74 C11D11/00

    摘要: The invention provides hydroxyl-containing surfactants with low surface tension and provides for their use as surfactants in aqueous coating formulations, the surfactants being preparable by reacting one or more epoxides of formula (I) with at least one hydroxy compound of formula (II) and/or at least one, or two or more, amine(s) of formula (III) reacted in preferably either approximately equivalent amounts of hydroxy and/or amino groups with epoxide groups, or with an excess of hydroxy or amine hydrogen atoms, respectively.

    摘要翻译: 本发明提供了具有低表面张力的含羟基的表面活性剂并且提供它们作为水性涂料制剂中的表面活性剂的用途,所述表面活性剂可通过使一种或多种式(I)的环氧化物与至少一种式(II)的羟基化合物和 或者至少一个或两个或更多个式(III)的胺分别以大约等量的羟基和/或氨基与环氧基团反应,或分别与过量的羟基或胺氢原子反应 。

    Hydroxyl-Containing Surfactants with Low Surface Tension and Their Use Thereof
    3.
    发明申请
    Hydroxyl-Containing Surfactants with Low Surface Tension and Their Use Thereof 失效
    具有低表面张力的含羟基的表面活性剂及其用途

    公开(公告)号:US20060217284A1

    公开(公告)日:2006-09-28

    申请号:US11277184

    申请日:2006-03-22

    IPC分类号: C11D17/08

    摘要: The invention provides hydroxyl-containing surfactants with low surface tension and provides for their use as surfactants in aqueous coating formulations, the surfactants being preparable by reacting one or more epoxides of formula (I) with at least one hydroxy compound of formula (II) and/or at least one, or two or more, amine(s) of formula (III) reacted in preferably either approximately equivalent amounts of hydroxy and/or amino groups with epoxide groups, or with an excess of hydroxy or amine hydrogen atoms, respectively.

    摘要翻译: 本发明提供了具有低表面张力的含羟基的表面活性剂并且提供它们作为水性涂料制剂中的表面活性剂的用途,所述表面活性剂可通过使一种或多种式(I)的环氧化物与至少一种式(II)的羟基化合物和 或者至少一个或两个或更多个式(III)的胺分别以大约等量的羟基和/或氨基与环氧基团反应,或分别与过量的羟基或胺氢原子反应 。