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公开(公告)号：US07268856B2
公开(公告)日：2007-09-11
申请号：US11442959
申请日：2006-05-31
CPC分类号： G03F7/70291 , G02B26/0833 , G03F7/70508 , G03F7/70558
摘要： A pattern writing apparatus comprises a DMD for spatially modulating light from a light source and directing modulated light beams to a plurality of irradiation regions, respectively, which are arranged on a substrate two-dimensionally. A pattern is written by controlling the DMD while scanning the plurality of irradiation regions. The plurality of irradiation regions form a plurality of irradiation blocks arranged in a column direction, in each of which irradiation regions are arranged in a row direction. In DMD, writing signal is sequentially inputted to mirror blocks to be used out of a plurality of mirror blocks corresponding to the plurality of irradiation blocks, respectively. When writing a pattern, an operation part determines the number of mirror blocks to be used where scan speed can be maximized, in consideration of required time for input of the writing signal to the DMD and light amount applied on the substrate.
摘要翻译： 图案写入装置包括用于空间调制来自光源的光并将调制光束分别引导到二维照射区域的DMD的DMD。 通过在扫描多个照射区域的同时控制DMD来写入图案。 多个照射区域形成沿列方向布置的多个照射块，其中每个照射区域沿行方向布置。 在DMD中，将写入信号依次输入到与多个照射块对应的多个镜像块中使用的镜像块。 在写入图案时，考虑到输入到DMD的写入信号和施加在基板上的光量所需的时间，操作部分确定可以最大化扫描速度的镜像块的数量。
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公开(公告)号：US07612865B2
公开(公告)日：2009-11-03
申请号：US11896357
申请日：2007-08-31
CPC分类号： G03F7/70791 , G03F7/70291
摘要： Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a sub scan direction in turn while repeating the main scanning, to write a pattern on the photosensitive material. When a preceding irradiation region group and a following irradiation region group pass over an overlapping area, a part of micromirrors corresponding to the overlapping area, out of the micromirror group, are made inactivated. As a result, a cumulative passage time in which the preceding irradiation region group and the following irradiation region group pass each position of the overlapping area is shorter than a passage time where the preceding irradiation region group passes each position of a non-overlapping area.
摘要翻译： 通过对感光材料上的照射区域组进行主扫描，对从感光材料的微反射镜组发射的光进行照射而对感光材料上的条带区域进行光照射，并将光施加到多个条带区域 副扫描方向依次反复进行主扫描，以将图案写在感光材料上。 当先前的照射区域组和随后的照射区域组超过重叠区域时，使与微反射镜组中的重叠区域相对应的微镜的一部分被失活。 结果，前述照射区域组和随后的照射区域组通过重叠区域的每个位置的累积通过时间比前一个照射区域组通过非重叠区域的每个位置的通过时间短。
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公开(公告)号：US20080062398A1
公开(公告)日：2008-03-13
申请号：US11896357
申请日：2007-08-31
CPC分类号： G03F7/70791 , G03F7/70291
摘要： Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a sub scan direction in turn while repeating the main scanning, to write a pattern on the photosensitive material. When a preceding irradiation region group and a following irradiation region group pass over an overlapping area, a part of micromirrors corresponding to the overlapping area, out of the micromirror group, are made inactivated. As a result, a cumulative passage time in which the preceding irradiation region group and the following irradiation region group pass each position of the overlapping area is shorter than a passage time where the preceding irradiation region group passes each position of a non-overlapping area.
摘要翻译： 通过对感光材料上的照射区域组进行主扫描，对从感光材料的微反射镜组发射的光进行照射而对感光材料上的条带区域进行光照射，并将光施加到多个条带区域 副扫描方向依次反复进行主扫描，以将图案写在感光材料上。 当先前的照射区域组和随后的照射区域组超过重叠区域时，使与微反射镜组中的重叠区域相对应的微镜的一部分被失活。 结果，前述照射区域组和随后的照射区域组通过重叠区域的每个位置的累积通过时间比前一个照射区域组通过非重叠区域的每个位置的通过时间短。
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公开(公告)号：US20060269217A1
公开(公告)日：2006-11-30
申请号：US11442959
申请日：2006-05-31
IPC分类号： G02B6/00
CPC分类号： G03F7/70291 , G02B26/0833 , G03F7/70508 , G03F7/70558
摘要： A pattern writing apparatus comprises a DMD for spatially modulating light from a light source and directing modulated light beams to a plurality of irradiation regions, respectively, which are arranged on a substrate two-dimensionally. A pattern is written by controlling the DMD while scanning the plurality of irradiation regions. The plurality of irradiation regions form a plurality of irradiation blocks arranged in a column direction, in each of which irradiation regions are arranged in a row direction. In DMD, writing signal is sequentially inputted to mirror blocks to be used out of a plurality of mirror blocks corresponding to the plurality of irradiation blocks, respectively. When writing a pattern, an operation part determines the number of mirror blocks to be used where scan speed can be maximized, in consideration of required time for input of the writing signal to the DMD and light amount applied on the substrate.
摘要翻译： 图案写入装置包括用于空间调制来自光源的光并将调制光束分别引导到二维照射区域的DMD的DMD。 通过在扫描多个照射区域的同时控制DMD来写入图案。 多个照射区域形成沿列方向布置的多个照射块，其中每个照射区域沿行方向布置。 在DMD中，将写入信号依次输入到与多个照射块对应的多个镜像块中使用的镜像块。 在写入图案时，考虑到输入到DMD的写入信号和施加在基板上的光量所需的时间，操作部分确定可以最大化扫描速度的镜像块的数量。
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