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公开(公告)号：US07268856B2
公开(公告)日：2007-09-11
申请号：US11442959
申请日：2006-05-31
CPC分类号： G03F7/70291 , G02B26/0833 , G03F7/70508 , G03F7/70558
摘要： A pattern writing apparatus comprises a DMD for spatially modulating light from a light source and directing modulated light beams to a plurality of irradiation regions, respectively, which are arranged on a substrate two-dimensionally. A pattern is written by controlling the DMD while scanning the plurality of irradiation regions. The plurality of irradiation regions form a plurality of irradiation blocks arranged in a column direction, in each of which irradiation regions are arranged in a row direction. In DMD, writing signal is sequentially inputted to mirror blocks to be used out of a plurality of mirror blocks corresponding to the plurality of irradiation blocks, respectively. When writing a pattern, an operation part determines the number of mirror blocks to be used where scan speed can be maximized, in consideration of required time for input of the writing signal to the DMD and light amount applied on the substrate.
摘要翻译： 图案写入装置包括用于空间调制来自光源的光并将调制光束分别引导到二维照射区域的DMD的DMD。 通过在扫描多个照射区域的同时控制DMD来写入图案。 多个照射区域形成沿列方向布置的多个照射块，其中每个照射区域沿行方向布置。 在DMD中，将写入信号依次输入到与多个照射块对应的多个镜像块中使用的镜像块。 在写入图案时，考虑到输入到DMD的写入信号和施加在基板上的光量所需的时间，操作部分确定可以最大化扫描速度的镜像块的数量。
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公开(公告)号：US07612865B2
公开(公告)日：2009-11-03
申请号：US11896357
申请日：2007-08-31
CPC分类号： G03F7/70791 , G03F7/70291
摘要： Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a sub scan direction in turn while repeating the main scanning, to write a pattern on the photosensitive material. When a preceding irradiation region group and a following irradiation region group pass over an overlapping area, a part of micromirrors corresponding to the overlapping area, out of the micromirror group, are made inactivated. As a result, a cumulative passage time in which the preceding irradiation region group and the following irradiation region group pass each position of the overlapping area is shorter than a passage time where the preceding irradiation region group passes each position of a non-overlapping area.
摘要翻译： 通过对感光材料上的照射区域组进行主扫描，对从感光材料的微反射镜组发射的光进行照射而对感光材料上的条带区域进行光照射，并将光施加到多个条带区域 副扫描方向依次反复进行主扫描，以将图案写在感光材料上。 当先前的照射区域组和随后的照射区域组超过重叠区域时，使与微反射镜组中的重叠区域相对应的微镜的一部分被失活。 结果，前述照射区域组和随后的照射区域组通过重叠区域的每个位置的累积通过时间比前一个照射区域组通过非重叠区域的每个位置的通过时间短。
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公开(公告)号：US20080062398A1
公开(公告)日：2008-03-13
申请号：US11896357
申请日：2007-08-31
CPC分类号： G03F7/70791 , G03F7/70291
摘要： Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a sub scan direction in turn while repeating the main scanning, to write a pattern on the photosensitive material. When a preceding irradiation region group and a following irradiation region group pass over an overlapping area, a part of micromirrors corresponding to the overlapping area, out of the micromirror group, are made inactivated. As a result, a cumulative passage time in which the preceding irradiation region group and the following irradiation region group pass each position of the overlapping area is shorter than a passage time where the preceding irradiation region group passes each position of a non-overlapping area.
摘要翻译： 通过对感光材料上的照射区域组进行主扫描，对从感光材料的微反射镜组发射的光进行照射而对感光材料上的条带区域进行光照射，并将光施加到多个条带区域 副扫描方向依次反复进行主扫描，以将图案写在感光材料上。 当先前的照射区域组和随后的照射区域组超过重叠区域时，使与微反射镜组中的重叠区域相对应的微镜的一部分被失活。 结果，前述照射区域组和随后的照射区域组通过重叠区域的每个位置的累积通过时间比前一个照射区域组通过非重叠区域的每个位置的通过时间短。
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公开(公告)号：US20060269217A1
公开(公告)日：2006-11-30
申请号：US11442959
申请日：2006-05-31
IPC分类号： G02B6/00
CPC分类号： G03F7/70291 , G02B26/0833 , G03F7/70508 , G03F7/70558
摘要： A pattern writing apparatus comprises a DMD for spatially modulating light from a light source and directing modulated light beams to a plurality of irradiation regions, respectively, which are arranged on a substrate two-dimensionally. A pattern is written by controlling the DMD while scanning the plurality of irradiation regions. The plurality of irradiation regions form a plurality of irradiation blocks arranged in a column direction, in each of which irradiation regions are arranged in a row direction. In DMD, writing signal is sequentially inputted to mirror blocks to be used out of a plurality of mirror blocks corresponding to the plurality of irradiation blocks, respectively. When writing a pattern, an operation part determines the number of mirror blocks to be used where scan speed can be maximized, in consideration of required time for input of the writing signal to the DMD and light amount applied on the substrate.
摘要翻译： 图案写入装置包括用于空间调制来自光源的光并将调制光束分别引导到二维照射区域的DMD的DMD。 通过在扫描多个照射区域的同时控制DMD来写入图案。 多个照射区域形成沿列方向布置的多个照射块，其中每个照射区域沿行方向布置。 在DMD中，将写入信号依次输入到与多个照射块对应的多个镜像块中使用的镜像块。 在写入图案时，考虑到输入到DMD的写入信号和施加在基板上的光量所需的时间，操作部分确定可以最大化扫描速度的镜像块的数量。
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公开(公告)号：US07190435B2
公开(公告)日：2007-03-13
申请号：US10814429
申请日：2004-04-01
申请人： Hiroyuki Shirota
发明人： Hiroyuki Shirota
IPC分类号： G03B27/54
CPC分类号： G03B27/54
摘要： A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. In the pattern writing apparatus, for pattern writing, an irradiation region group on a substrate, which corresponds to the micromirror group of the DMD, is scanned in a main scanning direction that is angled relative to the direction of arrangement of the irradiation region group. The irradiation region group is also intermittently moved in the sub-scanning direction by a distance shorter than the width of the irradiation region group in the sub-scanning direction, for pattern writing of the entire substrate.
摘要翻译： 用于将图案写在感光材料上的图案写入装置包括设置有具有调制反射光的微镜组的DMD的头，保持基板的台，以及用于相对于彼此移动头部和台架的机构。 在图案写入装置中，对于图案写入，对应于DMD的微镜组的基板上的照射区域组在相对于照射区域组的排列方向成角度的主扫描方向进行扫描。 对于整个基板的图案写入，照射区域组也沿副扫描方向间歇地移动比副扫描方向上的照射区域组的宽度短的距离。
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6.发明授权
公开(公告)号：US5012089A
公开(公告)日：1991-04-30
申请号：US426304
申请日：1989-10-24
CPC分类号： H04N1/047 , H04N1/1135 , H04N1/12 , H04N2201/04729 , H04N2201/04731 , H04N2201/04789 , H04N2201/04791
摘要： In an image recorder, a recording photobeam and a reference photobeam are periodically deflected by a polygon mirror in a main scanning direction. The recording photobeam is supplied to a photosensitive film while the reference beam is supplied to a transparent grating scale on which a transparent area and an opaque area are formed. The combination boundary of the transparent area and the opaque area has a portion parallel to the main scanning direction. The reference beam transmitted through the transparent area is detected, and the photobeams are deflected in a subscanning direction by an acoustic-optical deflector in response to the detected optical amount of the reference photobeam.
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公开(公告)号：US20050002002A1
公开(公告)日：2005-01-06
申请号：US10898197
申请日：2004-07-26
申请人： Hiroyuki Shirota , Akira Kuwabara
发明人： Hiroyuki Shirota , Akira Kuwabara
IPC分类号： G03F7/20 , H01L21/027 , G03B27/00 , G03F7/00
CPC分类号： G03F7/70558 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70466
摘要： A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which spatially modulates reflected light. Light from the micromirrors of the DMD are directed to irradiation regions (61) on the substrate, respectively. The irradiation regions (61) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions (61) is tilted relative to the main scanning direction, and a center-to-center distance (L1) along the sub-scanning direction between two adjacent irradiation regions (61) arranged in the main scanning direction is made equal to a pitch (P1) of writing cells (620) on the substrate with respect to the sub-scanning direction. ON/OFF control of light irradiation of each irradiation region is performed each time the irradiation regions 61 move a distance equal to twice a pitch (P2).
摘要翻译： 用于在感光材料上写入图案的图案写入装置包括具有DMD的头部，该DMD具有空间调制反射光的微镜组。 来自DMD的微镜的光分别被引导到基板上的照射区域（61）。 照射区域（61）通过衬底相对于头部的运动而移动到衬底上。 DMD设置在头部内，使得照射区域（61）的布置方向相对于主扫描方向倾斜，并且沿着副扫描方向在两个相邻照射之间的中心到中心距离（L1） 使沿主扫描方向排列的区域（61）相对于副扫描方向等于基板上的写入单元（620）的间距（P1）。 每次照射区域61移动相当于间距（P2）的两倍的距离时，进行各照射区域的光照射的ON / OFF控制。
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公开(公告)号：US06903798B2
公开(公告)日：2005-06-07
申请号：US10898197
申请日：2004-07-26
申请人： Hiroyuki Shirota , Akira Kuwabara
发明人： Hiroyuki Shirota , Akira Kuwabara
CPC分类号： G03F7/70558 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70466
摘要： A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which spatially modulates reflected light. Light from the micromirrors of the DMD are directed to irradiation regions (61) on the substrate, respectively. The irradiation regions (61) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions (61) is tilted relative to the main scanning direction, and a center-to-center distance (L1) along the sub-scanning direction between two adjacent irradiation regions (61) arranged in the main scanning direction is made equal to a pitch (P1) of writing cells (620) on the substrate with respect to the sub-scanning direction. ON/OFF control of light irradiation of each irradiation region is performed each time the irradiation regions 61 move a distance equal to twice a pitch (P2).
摘要翻译： 用于在感光材料上写入图案的图案写入装置包括具有DMD的头部，该DMD具有空间调制反射光的微镜组。 来自DMD的微镜的光分别被引导到基板上的照射区域（61）。 照射区域（61）通过衬底相对于头部的运动而移动到衬底上。 DMD设置在头部内，使得照射区域（61）的布置方向相对于主扫描方向倾斜，并且沿着副扫描方向的中心到中心距离（L 1）在两个相邻 使沿主扫描方向排列的照射区域（61）相对于副扫描方向等于基板上的写入单元（620）的间距（P 1）。 每次照射区域61移动等于距离的两倍（P 2）的距离时，进行每个照射区域的光照射的ON / OFF控制。
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公开(公告)号：US5018807A
公开(公告)日：1991-05-28
申请号：US452236
申请日：1989-12-18
申请人： Hiroyuki Shirota
发明人： Hiroyuki Shirota
CPC分类号： G02B13/22 , G02B13/0005 , G02B26/123 , G02B9/60
摘要： The present invention is directed to a lens system for an optical beam scanner which scans a plurality of optical beams. The lens system comprises: a first lens group having an entrance pupil, which includes first and third lenses in the form of meniscus having a positive power, respectively, a fourth lens having a positive power, and a second lens having a negative power; and a second lens group including a fifth lens having a positive power. The first to fifth lenses are successively disposed in order from the entrance pupil side. Accordingly, the lens system has a telecentric and an f-sin.theta. characteristic.
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公开(公告)号：US06859223B2
公开(公告)日：2005-02-22
申请号：US10430302
申请日：2003-05-07
申请人： Hiroyuki Shirota , Akira Kuwabara
发明人： Hiroyuki Shirota , Akira Kuwabara
CPC分类号： B41J2/465
摘要： An image recording apparatus (1) has a stage unit (2) for holding a substrate (9), an irradiation unit (4) having a plurality of irradiation parts (40) and a mechanism for relatively moving the stage unit (2) and the irradiation unit (4). An irradiation part (40) is provided with a DMD having a group of micromirrors for modulating a reflected light beam and a micro moving mechanism for moving the DMD relatively to the irradiation unit (4) in the X direction, thereby microscopically moving an irradiation position of the irradiation part (40) in the X direction. The irradiation part (40) is further provided with a zoom lens, thereby magnifying and reducing an image of the DMD on the substrate (9). By controlling a plurality of irradiation parts (40) parallelly and independently, the image recording apparatus (1) can write a fine pattern at high speed.
摘要翻译： 图像记录装置（1）具有用于保持基板（9）的台单元（2），具有多个照射部（40）的照射单元（4）和用于使台单元（2）相对移动的机构， 照射单元（4）。 照射部分（40）设置有具有用于调制反射光束的一组微镜的DMD和用于相对于照射单元（4）在X方向上移动DMD的微移动机构，从而显微地移动照射位置 的照射部（40）。 照射部分（40）还设置有变焦透镜，从而放大和缩小基板（9）上的DMD的图像。 通过平行且独立地控制多个照射部分（40），图像记录装置（1）可以高速地写入精细图案。
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