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公开(公告)号:US5164363A
公开(公告)日:1992-11-17
申请号:US701587
申请日:1991-05-15
申请人: Kazuhiro Eguchi , Takatosi Nakanisi , Rie Satoh
发明人: Kazuhiro Eguchi , Takatosi Nakanisi , Rie Satoh
IPC分类号: C23C16/40 , C23C16/44 , C23C16/455 , H01L39/24
CPC分类号: C23C16/45523 , C23C16/408 , C23C16/45561 , H01L39/2441 , Y10S505/73 , Y10S505/734
摘要: A substrate to be deposited with a superconducting oxide thin film thereon is set a reaction furnace. An organic metal source gas and oxygen-containing gas are alternately introduced into the reactor to pyrolyze, thereby depositing the superconducting oxide thin film containing metal elements of the organic metal at which time an inert gas is used as a carrier gas for the carrier gas.