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公开(公告)号：US5117111A
公开(公告)日：1992-05-26
申请号：US717500
申请日：1991-06-19
IPC分类号： G01B15/00 , H01J37/04 , H01J37/153 , H01J37/28
CPC分类号： H01J37/28
摘要： An electron beam measuring apparatus for measuring size of pattern on surface of a specimen comprising, an electron gun, an electron lens for focusing the electron beam from the electron gun on the specimen surface, a deflector for deflecting the electron beam, a spot control means for forming a flat edge portion in the electron beam spot, a rotation coil for rotating the electron beam so that the flat portion of the electron beam spot becomes to be perpendicular to the scanning direction of the electron beam, a detecting means for detecting secondary electrons reflected from the specimen surface, and a computer for calculating the size of the pattern based on the secondary electrons from the detecting means. As the flat portion of the electron beam spot is perpendicular to the scanning direction, the size of pattern is measured with high accuracy.
摘要翻译： 一种电子束测量装置，用于测量试样表面上的图案尺寸，包括：电子枪，用于将来自电子枪的电子束聚焦在试样表面上的电子透镜，用于偏转电子束的偏转器，点控制装置 用于在电子束点形成平坦的边缘部分，用于旋转电子束的旋转线圈使得电子束点的平坦部分垂直于电子束的扫描方向，用于检测二次电子的检测装置 从样本表面反射的计算机，以及用于基于来自检测装置的二次电子计算图案的尺寸的计算机。 随着电子束斑点的平坦部分垂直于扫描方向，以高精度测量图案的尺寸。
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公开(公告)号：US4520421A
公开(公告)日：1985-05-28
申请号：US521610
申请日：1983-08-09
IPC分类号： H01J37/317 , H01L21/265 , H01L21/683 , H02N13/00 , H01T20/00
CPC分类号： H01L21/6831 , H02N13/00 , Y10S269/903 , Y10T279/23
摘要： A specimen support comprises a pair of specimen attracting portions each having an electrode on the lower side thereof through an electrically insulating member. The pair of specimen attracting portions is arranged in opposed relation to one side of the specimen to be attracted thereto and is made of semiconductive dielectric material. A voltage is applied between the pair of specimen attracting portions thereby to attract the specimen to the portions electrostatically.
摘要翻译： 试样支架包括一对试样吸附部分，每个试样吸附部分通过电绝缘部件在其下侧具有电极。 一对检体吸引部与被检体的一侧相对配置，由半导体介电材料构成。 在一对检体吸引部之间施加电压，从而将试样吸引到静电部。
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公开(公告)号：US4121100A
公开(公告)日：1978-10-17
申请号：US788538
申请日：1977-04-18
CPC分类号： H01J37/04
摘要： An electron beam from an electron gun is made to focus on a first position by a focussing lens system. The focussed beam is then magnified and projected on a screen through a magnification lens system having an objective lens, an intermediate lens and a projection lens.The excitation is so variable that the electron beam may be focussed also on a second position behind the projection lens.A specimen is positioned at the first position for normal electron microscope analysis, while, for a scanning electron microscope analysis, another specimen is put at the second position.
摘要翻译： 通过聚焦透镜系统使来自电子枪的电子束聚焦在第一位置上。 然后通过具有物镜，中间透镜和投影透镜的放大透镜系统将聚焦光束放大并投影在屏幕上。
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公开(公告)号：US4524277A
公开(公告)日：1985-06-18
申请号：US455941
申请日：1982-12-16
IPC分类号： H01J37/04 , H01J37/15 , H01J37/28 , H01J37/304 , H01J37/305 , H01L21/027 , G01K1/08 , H01J3/00
CPC分类号： H01J37/15 , H01J37/304
摘要： A charged particle beam apparatus in which a beam of charged particles emitted from a beam source is focussed on a target in a predetermined size and shape through a plurality of aperture members. Each of the aperture members is combined with a respective deflecting unit which effects a two-dimensional scan with the charged particle beam in response to a scan signal supplied thereto. The center axis of the aperture formed in the aperture member is arithmetically determined on the basis of time-based variation in the quantity of the charged particles trapped by the aperture member during the scan operation. Further, deviation of the arithmetically determined center axis of the aperture from a reference axis is determined. The aperture member is slided on a plane extending perpendicularly to the center axis of the aperture to cancel out the deviation.
摘要翻译： 一种带电粒子束装置，其中从束源发射的带电粒子束通过多个孔径构件以预定尺寸和形状聚焦在靶上。 每个孔径构件与相应的偏转单元组合，其响应于提供给其的扫描信号，利用带电粒子束进行二维扫描。 基于在扫描操作期间由孔构件捕获的带电粒子的量的时间变化，算术地确定在孔构件中形成的孔的中心轴线。 此外，确定孔径的算术确定的中心轴线与参考轴线的偏差。 孔径构件在垂直于孔的中心轴延伸的平面上滑动以抵消偏差。
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