摘要:
A method is for calculating a height of a chuck top. A height of the top surface of the chuck top which corresponds to an arbitrary position specified on the XY coordinate plane by a computer is calculated in each of the four quadrants based on a coordinate transformation formulas. The method includes setting, by using the computer, a conical model in which two adjacent points other than the center point of the chuck top which correspond to the specified coordinates in a predetermined quadrant of the XY coordinate plane are obtained on a circumference having the center point of the chuck top as the origin and specifying an arbitrary point in the predetermined quadrant by using the computer and calculating a height of the arbitrary point of the chuck top based on the conical model, the coordinate transformation formulas and the specified coordinates.
摘要:
A method for correcting inclination of a wafer chuck includes obtaining in advance a correction amount for each of the semiconductor chips which corrects the inclination of the wafer chuck in the case of applying a contact load to at least each one of the semiconductor chips and storing each of the correction amounts in a data storage unit; calculating a total correction amount for correcting the inclination of the wafer chuck by calculating the correction amount of each of the semiconductor chips bringing into contact with the probes when the semiconductor wafer comes into electrical contact with the probes and adding the calculated correction amounts; and correcting the inclination of the wafer chuck based on the total correction amount.
摘要:
Disclosed is a method to set contact parameters, which can simulate the entire contact process of devices of a semiconductor wafer with probes while visually checking the contact parameters. The method includes preparing a coordinate graph including a time axis and a height axis, and setting contact parameters of the semiconductor wafer by specifying a plurality of points on the coordinate graph by a plurality of upward/downward movement positions of the semiconductor wafer during electrical contact of the electrode pads of the semiconductor wafer with the plurality of probes or separation of the electrode pads of the semiconductor wafer from the plurality of probes, and time required for the semiconductor wafer to move until reaching the upward/downward movement positions, respectively, and displaying a broken-line graph through connecting the specified points with straight-lines.
摘要:
A probe card registration method is for registering a probe card for use in inspecting electrical characteristics of a target object in a probe apparatus for performing the inspecting. The probe card registration method includes detecting a height of a load sensor provided at a mounting table for mounting thereon the target object by using a first imaging unit disposed above the mounting table; contacting the load sensor with a probe by moving the load sensor by the mounting table; and stopping the movement of the load sensor when the load sensor starts to make contact with the probe. The method further includes calculating a height of a needle of the probe based on a height of the load sensor and a stop height thereof.
摘要:
A probing method measures electrical characteristics of an object to be inspected by bringing a probe needle to make a contact with an electrode pad of the object, the probe needle formed to be vertically pointing the object. The method includes the steps of: mounting the object on a mounting table; aligning the object and the probe needle; thereafter, contacting the probe needle with the electrode pad by moving the mounting table upwards, and then moving the mounting table vertically upwards while moving same horizontally to rend an oxide film formed on a surface of the electrode pad, so that a tip of the probe needle is stuck into the electrode pad and the probe needle and the electrode pad to conduct with each other.