SERVICE PROVIDING SYSTEM, INFORMATION PROCESSING SYSTEM, CONTROL METHOD, AND MEDIUM

    公开(公告)号:US20220100824A1

    公开(公告)日:2022-03-31

    申请号:US17488312

    申请日:2021-09-29

    IPC分类号: G06F21/12 G06F21/60 G06F21/31

    摘要: A service providing system includes an information processing system including an information processing apparatus including a memory and a processor; and a terminal device configured to receive execution of an application. The information processing system and the terminal device communicate with each other. The processor of the information processing apparatus is configured to execute storing information on the application of which a user has a license, and controlling a function of a first application depending on whether the user who requested execution of the first application via the terminal device, has a license of a second application.

    Method of Suppressing Beam Position Drift, Method of Suppressing Beam Dimension Drift, and Charged-Particle Beam Lithography System
    3.
    发明申请
    Method of Suppressing Beam Position Drift, Method of Suppressing Beam Dimension Drift, and Charged-Particle Beam Lithography System 有权
    抑制光束位移的方法,抑制光束尺寸漂移和带电粒子光刻系统

    公开(公告)号:US20090230316A1

    公开(公告)日:2009-09-17

    申请号:US12369306

    申请日:2009-02-11

    申请人: Kazuya GOTO

    发明人: Kazuya GOTO

    IPC分类号: H01J3/26

    摘要: A lithography method and system have means for determining a convergence value dc from a relation of beam current to beam position drift (or beam dimension drift) produced in the past; means for finding a beam current i(t) as a function of the convergence value dc of beam position drift (or beam dimension drift), a measured value dm of beam position drift (or beam dimension drift), a gain constant g, and a convergence value c of beam position drift(or beam dimension drift) per unit beam current and using an equation given by i(t)={(1+g)·dcg·dm(t)}/c; means for making a check regarding dm and dc as to whether dm approaches dc and, thus, a relationship given by |dm−dc| 0.

    摘要翻译: 光刻方法和系统具有用于确定从过去产生的束电流与光束位置漂移(或光束尺寸漂移)的关系的收敛值dc的装置; 用于根据波束位置漂移(或波束尺寸漂移)的收敛值dc,波束位置漂移(或波束尺寸漂移)的测量值dm,增益常数g以及增益常数g,找到波束电流i(t)的装置 使用由i(t)= {(1 + g).dcg.dm(t)} / c给出的等式给出的波束位置漂移(或波束尺寸漂移)的收敛值c。 关于dm和dc的检查关于dm接近dc的因素的手段,因此,由| dm-dc | <εilon给出的关系成立,其中ε是提供决策准则的正数,在增益常数g 束电流i(t)满足由g> 0给出的关系。