公开(公告)号：US20100106443A1

公开(公告)日：2010-04-29

申请号：US12683455

申请日：2010-01-07

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US07672799B2

公开(公告)日：2010-03-02

申请号：US11846829

申请日：2007-08-29

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US07953567B2

公开(公告)日：2011-05-31

申请号：US12683455

申请日：2010-01-07

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US20090161943A1

公开(公告)日：2009-06-25

申请号：US12338528

申请日：2008-12-18

申请人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

发明人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

IPC分类号： G01N21/88 ,  G06T11/20 ,  G06K9/00

CPC分类号： G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8861 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/00

摘要： The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.

摘要翻译： 本发明旨在从缺陷候选中找到虚假缺陷，并获得最小次数的审查时间可以消除错误缺陷的阈值。 缺陷候选者被审查和选择为缺陷或假缺陷。 通过从地图中删除具有等于或小于虚假缺陷的特征量的缺陷候选物，或者以另一个符号显示，可以视觉地确定假缺陷。 由于具有等于或小于所选择的错误缺陷的特征量的缺陷候选者从地图中删除或以另一个符号显示，所以不会检查不必设置阈值的缺陷候选。 与常规技术相比，可以大大减少待审查的缺陷候选物的数量。 此外，通过重复上述工作，自动计算阈值，并且显示具有阈值的检查结果图，使得不需要重新检查。

公开(公告)号：US08351683B2

公开(公告)日：2013-01-08

申请号：US12338528

申请日：2008-12-18

申请人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

发明人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

IPC分类号： G01N21/88 ,  G06T11/20

CPC分类号： G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8861 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/00

摘要： The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.

摘要翻译： 本发明旨在从缺陷候选中找到虚假缺陷，并获得最小次数的审查时间可以消除错误缺陷的阈值。 缺陷候选者被审查和选择为缺陷或假缺陷。 通过从地图中删除具有等于或小于虚假缺陷的特征量的缺陷候选物，或者以另一个符号显示，可以视觉地确定假缺陷。 由于具有等于或小于所选择的错误缺陷的特征量的缺陷候选者从地图中删除或以另一个符号显示，所以不会检查不必设置阈值的缺陷候选。 与常规技术相比，可以大大减少待审查的缺陷候选物的数量。 此外，通过重复上述工作，自动计算阈值，并且显示具有阈值的检查结果图，使得不需要重新检查。

公开(公告)号：US08233145B2

公开(公告)日：2012-07-31

申请号：US12781682

申请日：2010-05-17

申请人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

发明人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

公开(公告)号：US20100225903A1

公开(公告)日：2010-09-09

申请号：US12781682

申请日：2010-05-17

申请人： Hidetoshi NISHIYAMA ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

发明人： Hidetoshi NISHIYAMA ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

公开(公告)号：US20130148113A1

公开(公告)日：2013-06-13

申请号：US13579965

申请日：2010-12-20

申请人： Mizuki Oku ,  Minori Noguchi ,  Hiroshi Kawaguchi ,  Kazuo Takahashi ,  Kei Shimura

发明人： Mizuki Oku ,  Minori Noguchi ,  Hiroshi Kawaguchi ,  Kazuo Takahashi ,  Kei Shimura

IPC分类号： G01N21/88

CPC分类号： G01N21/88 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/062 ,  G01N2201/08

摘要： The light scattered from the sample surface and foreign matter is imaged on an image intensifier and detected by a lens-coupled multi-pixel sensor such as a TDI sensor or a CCD sensor. The light scattered by surface roughness is spatially eliminated to detect the light scattered from foreign matter with increased sensitivity. A mechanism for shifting the image intensifier is incorporated to prevent a signal intensity decrease, which may be caused by a decrease in the sensitivity of the image intensifier.

摘要翻译： 从样品表面散射的光和异物在图像增强器上成像，并由诸如TDI传感器或CCD传感器的透镜耦合多像素传感器检测。 通过表面粗糙度散射的光在空间上消除，以增加敏感度来检测从异物散射的光。 并入用于移动图像增强器的机构以防止由于图像增强器的灵敏度的降低而引起的信号强度降低。

公开(公告)号：US07746453B2

公开(公告)日：2010-06-29

申请号：US12113781

申请日：2008-05-01

申请人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

发明人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

公开(公告)号：US08467048B2

公开(公告)日：2013-06-18

申请号：US13535955

申请日：2012-06-28

申请人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

发明人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。