公开(公告)号：US08808446B2

公开(公告)日：2014-08-19

申请号：US11816642

申请日：2006-02-24

申请人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

发明人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

IPC分类号： C09D4/00 ,  G03F7/075 ,  C07F7/08 ,  H01L21/027 ,  G03F7/11 ,  H01L21/033

CPC分类号： G03F7/0752 ,  G03F7/0751 ,  G03F7/11 ,  H01L21/0274 ,  H01L21/0332 ,  Y10S430/106 ,  Y10S430/115 ,  Y10T428/31515 ,  Y10T428/31612 ,  Y10T428/31663

摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a  (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

摘要翻译： 提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘附性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐除去抗蚀剂期间用于显影的碱性液体和氧气灰化。 该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示 氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

公开(公告)号：US20100151384A1

公开(公告)日：2010-06-17

申请号：US12715406

申请日：2010-03-02

申请人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

发明人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

IPC分类号： G03F7/075 ,  C07F7/08

CPC分类号： G03F7/0752 ,  G03F7/0751 ,  G03F7/11 ,  H01L21/0274 ,  H01L21/0332 ,  Y10S430/106 ,  Y10S430/115 ,  Y10T428/31515 ,  Y10T428/31612 ,  Y10T428/31663

摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi (OR3)4-a  (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

摘要翻译： 提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。 该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示 氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

公开(公告)号：US20090050020A1

公开(公告)日：2009-02-26

申请号：US11816642

申请日：2006-02-24

申请人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

发明人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

IPC分类号： C09D4/00

CPC分类号： G03F7/0752 ,  G03F7/0751 ,  G03F7/11 ,  H01L21/0274 ,  H01L21/0332 ,  Y10S430/106 ,  Y10S430/115 ,  Y10T428/31515 ,  Y10T428/31612 ,  Y10T428/31663

摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a  (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

摘要翻译： 提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘附性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐除去抗蚀剂期间用于显影的碱性液体和氧气灰化。 组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，<？在线式描述=“在线式”末端=“铅”→> R1bR2cSi（OR3）4- a（A）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R1是具有至少一个不饱和键的一价有机基团，R2各自表示氢原子，卤素原子 或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为0〜2的整数， 条件是a = b + c。

公开(公告)号：US08968458B2

公开(公告)日：2015-03-03

申请号：US12715406

申请日：2010-03-02

申请人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

发明人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

IPC分类号： C07F7/08 ,  G03F7/075 ,  G03F7/11 ,  H01L21/027 ,  H01L21/033

CPC分类号： G03F7/0752 ,  G03F7/0751 ,  G03F7/11 ,  H01L21/0274 ,  H01L21/0332 ,  Y10S430/106 ,  Y10S430/115 ,  Y10T428/31515 ,  Y10T428/31612 ,  Y10T428/31663

摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a  (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

摘要翻译： 提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。 该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示 氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。