公开(公告)号：US07187143B2

公开(公告)日：2007-03-06

申请号：US10781756

申请日：2004-02-20

申请人： Keiji Okada ,  Yoshitomo Hidaka ,  Michiro Sugitani ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

发明人： Keiji Okada ,  Yoshitomo Hidaka ,  Michiro Sugitani ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

IPC分类号： H02P1/00

CPC分类号： H01L21/67709 ,  Y10T74/15

摘要： A mover device and an ion implanter apparatus having a processing base that reciprocates at a high speed without undesirable noise and vibration are provided. The mover device includes: a fixed base; a movable base that is linearly movable with respect to the fixed base; a processing base that is linearly movable with respect to the movable base; a main linear motor that generates a moving force to move the processing base with respect to the movable base, thereby moving the processing base with respect to the fixed base; and a velocity control unit that controls the moving velocity of the processing base with respect to the fixed base. In this mover device, the movable base is moved by virtue of a reaction force caused by the moving force to move the processing base.

摘要翻译： 提供了具有处理基座的移动装置和离子注入机装置，该处理基座高速往复运动而没有不期望的噪声和振动。 动子装置包括：固定基座; 可移动基座，其相对于固定基座线性移动; 处理基座，其相对于所述可动基座线性移动; 主线性电动机，其产生相对于可移动基座移动处理基座的移动力，从而相对于固定基座移动处理基座; 以及速度控制单元，其控制所述处理基座相对于所述固定基座的移动速度。 在这种移动装置中，可移动基座由于由移动力引起的反作用力而移动，以移动处理基座。

公开(公告)号：US20050188924A1

公开(公告)日：2005-09-01

申请号：US11044632

申请日：2005-01-28

申请人： Keiji Okada ,  Michiro Sugitani ,  Yoshitomo Hidaka ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

发明人： Keiji Okada ,  Michiro Sugitani ,  Yoshitomo Hidaka ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

IPC分类号： G03F7/20 ,  G05D3/12 ,  H01L21/02 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68 ,  C23C16/00

CPC分类号： H01L21/67706 ,  H01L21/67709 ,  Y10S414/135

摘要： A method of controlling a mover device that includes: a fixed base; a movable base that is moveable in a linear direction with respect to the fixed base; a processing base that is movable in a linear direction with respect to the movable base, the linear direction being in parallel with the linear moving direction of the movable base; and a moving force generating unit that is provided between the processing base and the movable base, and forms a main moving unit in cooperation with the processing base and the movable base, includes the steps of: generating a moving force from the moving force generating unit to move the processing base with respect to the movable base, thereby moving the processing base with respect to the fixed base as a result of the movement of the processing base with respect to the movable base; moving the movable base on the fixed base in the opposite direction to the moving direction of the processing base by virtue of a reaction force caused by the moving force generated from the moving force generating unit to move the processing base, so that the movable base moves in the opposite direction to the moving direction of the processing base on the fixed base; and controlling the moving velocity of the processing base with respect to the fixed base.

摘要翻译： 一种控制动子装置的方法，包括：固定基座; 可移动基座，其相对于所述固定基座在直线方向上移动; 处理基座，其相对于可动基座在直线方向上移动，所述线性方向与所述可动基座的线性移动方向平行; 以及设置在所述处理基座和所述可动基座之间并与所述处理基座和所述可动基座协作形成主移动单元的移动力产生单元，包括以下步骤：从所述移动力产生单元产生移动力 相对于可移动基座移动处理基座，从而由于处理基座相对于可移动基座的移动而相对于固定基座移动处理基座; 通过由从移动力产生单元产生的移动力产生的反作用力使处于移动方向的方向与处理基座的移动方向相反的方向移动到固定基座上，以移动处理基座，使得可移动基座移动 在与固定基座上的处理基座的移动方向相反的方向上; 并且控制处理基座相对于固定基座的移动速度。

公开(公告)号：US07597531B2

公开(公告)日：2009-10-06

申请号：US11044632

申请日：2005-01-28

申请人： Keiji Okada ,  Michiro Sugitani ,  Yoshitomo Hidaka ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

发明人： Keiji Okada ,  Michiro Sugitani ,  Yoshitomo Hidaka ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

IPC分类号： B65H1/00 ,  C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H02K41/00

CPC分类号： H01L21/67706 ,  H01L21/67709 ,  Y10S414/135

摘要： Embodiments of the invention are directed to a method of controlling a mover device The method includes generating a moving force from a moving force generating unit to move a processing base with respect to a movable base, thereby moving the processing base with respect to a fixed base as a result of the movement of the processing base with respect to the movable base; moving the movable base on the fixed base in the opposite direction to the moving direction of the processing base by virtue of a reaction force caused by the moving force generated from the moving force generating unit to move the processing base, so that the movable base moves in the opposite direction to the moving direction of the processing base on the fixed base. The method further includes controlling the moving velocity of the processing base with respect to the fixed base.

摘要翻译： 本发明的实施例涉及一种控制移动器装置的方法。该方法包括从移动力产生单元产生移动力以相对于可移动基座移动处理基座，从而相对于固定基座移动处理基座 作为处理基座相对于可移动基座移动的结果; 通过由从移动力产生单元产生的移动力产生的反作用力使处于移动方向的方向与处理基座的移动方向相反的方向移动到固定基座上，以移动处理基座，使得可移动基座移动 在与固定基座上的处理基座的移动方向相反的方向上。 该方法还包括控制处理基座相对于固定基座的移动速度。

公开(公告)号：US06547504B2

公开(公告)日：2003-04-15

申请号：US09847317

申请日：2001-05-03

申请人： Masamitsu Shinozuka

发明人： Masamitsu Shinozuka

IPC分类号： B65H100

CPC分类号： H01L21/67778

摘要： A wafer carrying system includes an intermediate cassette device having a plurality of wafer support holders, a robot arm device to carry wafers, an aligner unit to align the wafers, and a wafer feed and storage cassette. The wafers held by the robot arm device are transferred to the aligner unit are aligned in the intermediate cassette device, and are then directly delivered from the aligner unit to the wafer support holders of the intermediate cassette device.