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公开(公告)号：US20090045339A1
公开(公告)日：2009-02-19
申请号：US11920132
申请日：2006-05-11
CPC分类号： G01N23/04 , H01J37/023 , H01J37/067 , H01J37/20 , H01J37/26 , H01J2237/024 , H01J2237/1514 , H01J2237/20207 , H01J2237/20214 , H01J2237/262 , H01J2237/317
摘要： Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
摘要翻译： 具有旋转机构的带电粒子束设备可以在垂直于带电的光学系统的光轴的平面中以高精度方便地校正入射到具有旋转机构的设备的旋转操作的观察/加工位置的偏移 粒子束或稍微倾斜的平面。 根据带电粒子束设备中的样本保持器，隔膜或双棱镜等旋转机构的角度信息确定入射到平面中的X-Y偏移，然后执行驱动或控制以消除X-Y偏移。
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公开(公告)号：US07872755B2
公开(公告)日：2011-01-18
申请号：US11883568
申请日：2006-01-27
IPC分类号： G01B9/02
CPC分类号： H01J37/295 , G01N23/00 , G02B19/0014 , G02B19/0047 , G03H5/00 , H01J37/04 , H01J2237/1514 , H01J2237/228 , H01J2237/2614
摘要： A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle Φ between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein.
摘要翻译： 双二棱镜电子干涉仪是一种显着提高常规一级电子干涉仪自由度的光学系统。 然而，双棱镜干涉仪与由单丝电极组成的电子全息图的一维形状，干涉区域的方向和干涉条纹的方位角的单电子双棱镜的光学系统相同 。 换句话说，干扰区域的长度方向根据灯丝电极的方向确定，并且干涉条纹的方位角仅与干涉区域的纵向方向一致并且平行。 根据本发明的干涉仪具有上级和下级电子双极，并且在上级和下级电子双极之间的灯丝电极之间以方位角Φ操作以任意地控制干涉区域和方位角; 的干涉条纹。
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公开(公告)号：US07750298B2
公开(公告)日：2010-07-06
申请号：US11884680
申请日：2006-01-27
IPC分类号： G21G5/00
CPC分类号： H01J37/04 , G01N23/00 , G02B19/0014 , G02B19/0047 , G03H5/00 , H01J37/295 , H01J2237/1514 , H01J2237/228 , H01J2237/2614
摘要： An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle Φ among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth θ of the interference fringes.
摘要翻译： 公开了一种具有上级，中级和低级电子双极性的干涉仪。 所公开的干涉仪在三电子双棱镜的细丝电极之间以方位角Φ操作以任意地控制干涉区域和方位角; 其中形成的干涉条纹消除了菲涅尔条纹生成，并允许干涉条纹间距s和方位角的独立控制; 的干涉条纹。
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公开(公告)号：US07538323B2
公开(公告)日：2009-05-26
申请号：US10585359
申请日：2005-01-07
IPC分类号： G01B15/00
CPC分类号： H01J37/295 , H01J2237/1514 , H01J2237/2614
摘要： The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism.In the present invention, two electron biprisms 9u, 9b are used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.
摘要翻译： 本发明提供一种能够彼此独立地控制边缘间隔s和干涉宽度W的技术，这是使用电子双棱镜的干涉仪的重要参数。 在本发明中，沿着光轴两级分别使用两个电子双极子9u，9b，通过控制施加到每个电子双极性电极的电压，彼此独立地控制边缘间隔s和干涉宽度W 。 也可以抑制菲涅尔衍射。
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公开(公告)号：US07655905B2
公开(公告)日：2010-02-02
申请号：US11920132
申请日：2006-05-11
CPC分类号： G01N23/04 , H01J37/023 , H01J37/067 , H01J37/20 , H01J37/26 , H01J2237/024 , H01J2237/1514 , H01J2237/20207 , H01J2237/20214 , H01J2237/262 , H01J2237/317
摘要： Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
摘要翻译： 具有旋转机构的带电粒子束设备可以在垂直于带电的光学系统的光轴的平面中以高精度方便地校正入射到具有旋转机构的设备的旋转操作的观察/加工位置的偏移 粒子束或稍微倾斜的平面。 根据带电粒子束设备中的样本保持器，隔膜或双棱镜等旋转机构的角度信息确定入射到平面中的X-Y偏移，然后执行驱动或控制以消除X-Y偏移。
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公开(公告)号：US20090273789A1
公开(公告)日：2009-11-05
申请号：US11883568
申请日：2006-01-27
CPC分类号： H01J37/295 , G01N23/00 , G02B19/0014 , G02B19/0047 , G03H5/00 , H01J37/04 , H01J2237/1514 , H01J2237/228 , H01J2237/2614
摘要： A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle Φ between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein.
摘要翻译： 双二棱镜电子干涉仪是一种显着提高常规一级电子干涉仪自由度的光学系统。 然而，双棱镜干涉仪与由单丝电极组成的电子全息图的一维形状，干涉区域的方向和干涉条纹的方位角的单电子双棱镜的光学系统相同 。 换句话说，干扰区域的长度方向根据灯丝电极的方向确定，并且干涉条纹的方位角仅与干涉区域的纵向方向一致并且平行。 根据本发明的干涉仪具有上级和下级电子双极性，并且在上级和下级电子双极之间的细丝电极之间的方位角Φi操作，以任意地控制干扰区域和方位角θ 其中形成的干涉条纹。
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公开(公告)号：US20080258058A1
公开(公告)日：2008-10-23
申请号：US11884680
申请日：2006-01-27
CPC分类号： H01J37/04 , G01N23/00 , G02B19/0014 , G02B19/0047 , G03H5/00 , H01J37/295 , H01J2237/1514 , H01J2237/228 , H01J2237/2614
摘要： A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double-biprism electron interferometer, however, is the same as the optical system of the single electron biprism interferometer in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.An interferometer according to the present invention has upper-stage, intermediate-stage, and lower-stage electron biprisms, operates with an azimuth angle Φ among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth θ of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth θ of the interference fringes.
摘要翻译： 双二棱镜电子干涉仪是一种显着提高常规一级电子干涉仪自由度的光学系统。 然而，双二棱镜电子干涉仪与单电子双棱镜干涉仪的光学系统相同，就由灯丝电极形成的电子全息图的一维形状，干涉区域的方向和方位角 干涉条纹。 换句话说，干扰区域的长度方向根据灯丝电极的方向确定，并且干涉条纹的方位角仅与干涉区域的纵向方向一致并且平行。 根据本发明的干涉仪具有上级，中级和低级电子双极，与三个电子双极体的细丝电极之间的方位角Phi一起操作以任意地控制干涉区域和干涉的方位角θ 形成在其中的边缘消除了菲涅尔条纹生成，并且允许独立控制干涉条纹间距s和干涉条纹的方位角θ。
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公开(公告)号：US20080302965A1
公开(公告)日：2008-12-11
申请号：US11547054
申请日：2005-03-07
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
IPC分类号： G01N23/00
CPC分类号： H01J37/295 , H01J37/26 , H01J2237/1514 , H01J2237/2614
摘要： In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.
摘要翻译： 在使用电子双棱镜的电子束干涉系统中，其能够独立地控制每个干涉条纹间距s和干涉宽度W，这两者都是干涉仪和干涉仪获取的干涉图的重要参数，光学 采用两级电子双棱镜干涉仪中使用的系统。 光学系统在光轴方向上使用两阶段的电子双棱镜，以相对于标本图像相对于相对放大率以及相对于电子双棱镜的细丝电极的图像具有灵活性。 另外，作为组合了两个物镜（51,52）的两级配置，独立地控制每个物镜的焦距使得可以相对于标本图像和相对于图像设置相对放大率 的电子双棱镜的灯丝电极的任意值。
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公开(公告)号：US07816648B2
公开(公告)日：2010-10-19
申请号：US11547054
申请日：2005-03-07
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
IPC分类号： G01B15/00
CPC分类号： H01J37/295 , H01J37/26 , H01J2237/1514 , H01J2237/2614
摘要： In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.
摘要翻译： 在使用电子双棱镜的电子束干涉系统中，其能够独立地控制每个干涉条纹间距s和干涉宽度W，这两者都是干涉仪和干涉仪获取的干涉图的重要参数，光学 采用两级电子双棱镜干涉仪中使用的系统。 光学系统在光轴方向上使用两阶段的电子双棱镜，以相对于标本图像相对于相对放大率以及相对于电子双棱镜的细丝电极的图像具有灵活性。 另外，作为组合了两个物镜（51,52）的两级配置，独立地控制每个物镜的焦距使得可以相对于标本图像和相对于图像设置相对放大率 的电子双棱镜的灯丝电极的任意值。
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公开(公告)号：US20070272861A1
公开(公告)日：2007-11-29
申请号：US10585359
申请日：2005-01-07
申请人： Ken Harada , Tatsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
发明人： Ken Harada , Tatsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
CPC分类号： H01J37/295 , H01J2237/1514 , H01J2237/2614
摘要： The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprisms 9u, 9b are used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.
摘要翻译： 本发明提供一种能够彼此独立地控制边缘间隔s和干涉宽度W的技术，这是使用电子双棱镜的干涉仪的重要参数。 在本发明中，两个电子双棱镜9u，9b沿着光轴两级使用，并且边缘间隔s和干涉宽度W通过控制施加到每个的电极的电压彼此独立地控制 电子双极。 也可以抑制菲涅尔衍射。
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