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1.再颁专利公开(公告)号：USRE42566E1
公开(公告)日：2011-07-26
申请号：US10439658
申请日：2003-05-15
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
IPC分类号： B08B3/12
CPC分类号： H01L21/6708 , B08B3/022 , B08B3/041 , B08B3/123 , B08B2203/0288 , H01L21/67051
摘要： The wet treatment liquid feed nozzle of the invention comprises an introducing path 10 having an introducing port 7, a discharging path 12 having a discharging port 15, a crossing section 14 formed by causing the introducing path 10 and the discharging path 12 to cross at the other ends thereof, a nozzle assembly 50 having an opening section 6 opening to an object to be treated 1, provided at the crossing section 14, and pressure control means 13, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated 1 and the atmospheric pressure provided at least on the discharging path 12 side so that the wet treatment liquid having been in contact with the object to be treated 1 via the opening section 6 does not flow to outside the discharging path 12.
摘要翻译： 本发明的湿处理液体供给喷嘴包括具有引入口7的引入路径10，具有排出口15的排出路径12，通过使引入路径10和排出路径12在 设置在交叉部分14处的具有开口部分6的开口部分6的喷嘴组件50，以及压力控制装置13，用于控制接触到的湿处理液体的压力之间的差异 待处理物体1和至少设置在排出路径12侧的大气压力，使得经由开口部6与待处理物体1接触的湿处理液体不流到排出路径12的外部 。
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2.再颁专利公开(公告)号：USRE42420E1
公开(公告)日：2011-06-07
申请号：US11043890
申请日：2005-01-26
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
CPC分类号： H01L21/6708 , B08B3/022 , B08B3/041 , B08B3/123 , B08B2203/0288 , H01L21/67051
摘要： The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.
摘要翻译： 本发明的湿式处理液体进料喷嘴包括一个具有一个引入口的引入通道，一个具有排出口的排出通道，一个通过使引入通道和排放通道在其另一端处交叉而形成的交叉部分，一个喷嘴组件 具有开口部分，设置在交叉部分处的待处理对象;以及压力控制装置，用于控制与待处理物体接触的湿处理液体的压力与至少提供的大气压力之间的差异 在放电路径侧，使得经由开口部分与待处理物体接触的湿处理液体不会流到排出路径的外部。
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3.发明授权公开(公告)号：US06517635B2
公开(公告)日：2003-02-11
申请号：US09803588
申请日：2001-03-09
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takayuki Imaoka , Masayuki Toda
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takayuki Imaoka , Masayuki Toda
IPC分类号： B08B304
CPC分类号： H01L21/6708 , B08B3/022 , B08B3/041 , B08B3/123 , B08B2203/0288 , H01L21/67051
摘要： The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.
摘要翻译： 本发明的湿式处理液体进料喷嘴包括一个具有一个引入口的引入通道，一个具有排出口的排出通道，一个通过使引入通道和排放通道在其另一端处交叉而形成的交叉部分，一个喷嘴组件 具有开口部分，设置在交叉部分处的待处理对象;以及压力控制装置，用于控制与待处理物体接触的湿处理液体的压力与至少提供的大气压力之间的差异 在放电路径侧，使得经由开口部分与待处理物体接触的湿处理液体不会流到排出路径的外部。
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4.发明授权公开(公告)号：US06230722B1
公开(公告)日：2001-05-15
申请号：US09083348
申请日：1998-05-22
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takayuki Imaoka , Masayuki Toda
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takayuki Imaoka , Masayuki Toda
IPC分类号： B08B312
CPC分类号： H01L21/6708 , B08B3/022 , B08B3/041 , B08B3/123 , B08B2203/0288 , H01L21/67051
摘要： The wet treatment liquid feed nozzle of the invention comprises an introducing path 10 having an introducing port 7, a discharging path 12 having a discharging port 15, a crossing section 14 formed by causing the introducing path 10 and the discharging path 12 to cross at the other ends thereof, a nozzle assembly 50 having an opening section 6 opening to an object to be treated 1, provided at the crossing section 14, and pressure control means 13, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated 1 and the atmospheric pressure provided at least on the discharging path 12 side so that the wet treatment liquid having been in contact with the object to be treated 1 via the opening section 6 does not flow to outside the discharging path 12.
摘要翻译： 本发明的湿处理液体供给喷嘴包括具有引入口7的引入路径10，具有排出口15的排出路径12，通过使引入路径10和排出路径12在 设置在交叉部分14处的具有开口部分6的开口部分6的喷嘴组件50，以及压力控制装置13，用于控制接触到的湿处理液体的压力之间的差异 待处理物体1和至少设置在排出路径12侧的大气压力，使得经由开口部分6与待处理物体1接触的湿处理液体不会流到排出路径12的外部 。
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公开(公告)号：US5783790A
公开(公告)日：1998-07-21
申请号：US759013
申请日：1996-12-02
IPC分类号： G02F1/1333 , B08B3/04 , B08B3/12 , C02F1/461 , H01L21/304 , C07C1/00 , B08B6/00
CPC分类号： B08B3/12 , C02F1/4618
摘要： A surfactant is added to anodic or cathodic water obtained by electrolyzing deionized water or high-purity water. Then, an object of treatment is treated with the anodic or cathodic water containing the surfactant. The object of treatment may be treated, in this way, while irradiating it with an ultrasonic wave having a frequency between 30 kHz and 3 MHz. Furthermore, the anodic or cathodic water is continuously jetted or dropped onto the object of treatment from a nozzle, while irradiating an ultrasonic wave at least at a part in the feed pipe of the anodic or cathodic water.
摘要翻译： 将表面活性剂加入通过电解去离子水或高纯度水而获得的阳极或阴极水中。 然后，用含有表面活性剂的阳极或阴极水处理处理对象。 以这种方式，可以用频率在30kHz和3MHz之间的超声波照射处理对象。 此外，阳极或阴极水在从阳极或阴极水的供给管中至少部分照射超声波的同时，从喷嘴连续喷射或滴落到处理对象物上。
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公开(公告)号：US06509305B1
公开(公告)日：2003-01-21
申请号：US09570575
申请日：2000-05-12
IPC分类号： C11D1100
CPC分类号： B01F3/04985
摘要： Deionized water from a deionized water source (21) for electrolysis is supplied by a pressurizing pump (20) to an electrolyzer (2) to obtain a hydrogen gas and ozone gas by means of electrolysis. The pressures of these gasses are maintained at not less than the atmospheric pressure. These gasses at a pressure of the atmospheric pressure or more are dissolved in high-purity water in gas dissolving units (6,7) to obtain ozone water and hydrogen water respectively. These ozone water and hydrogen water are introduced into mixer (8,9) to adjust pH respectively. In this way, highly-concentrated, gas dissolved cleaning solution is prepared in a short period of time.
摘要翻译： 来自用于电解的去离子水源（21）的去离子水通过加压泵（20）供给电解槽（2），通过电解获得氢气和臭氧气体。 这些气体的压力保持在不低于大气压力。 在大气压或更高的压力下将这些气体溶解在气体溶解单元（6,7）中的高纯度水中，分别得到臭氧水和氢气水。 将这些臭氧水和氢水引入混合器（8,9）中以分别调节pH。 以这种方式，在短时间内制备高浓度，气体溶解的清洁溶液。
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7.发明授权Apparatus and method for producing ionic water and system and method for producing electrolytic ionic water 失效用于生产离子水的设备和方法及其制备方法和电解离子水的制备方法
公开(公告)号：US5888357A
公开(公告)日：1999-03-30
申请号：US756741
申请日：1996-11-26
CPC分类号： C02F1/36 , C02F1/4618 , C02F2201/46115 , C02F2201/4619
摘要： The present invention provides an apparatus and a method for producing ionic water which are capable of producing ionic water containing a low concentration of electrolyte with high reproducibility. The present invention also provides an apparatus and a method for producing electrolytic ionic water capable of producing electrolytic ionic water having stable characteristics. The ionic water producing apparatus has at least a gas-liquid mixing device for mixing raw water and a gas, and an ultrasonic exciting device for applying ultrasonic waves to the gas-liquid mixture obtained by the gas-liquid mixing device to generate ions.
摘要翻译： 本发明提供了能够以高再现性产生含有低浓度电解质的离子水的离子水的制造装置和方法。 本发明还提供一种能够生产具有稳定特性的电解离子水的电解离子水的设备和方法。 离子水生成装置至少具有用于混合原料水和气体的气液混合装置，以及用于对由气液混合装置获得的气液混合物施加超声波以产生离子的超声波激发装置。
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公开(公告)号：US06086057A
公开(公告)日：2000-07-11
申请号：US103573
申请日：1998-06-24
CPC分类号： B01F3/04985
摘要： A cleaning solution preparation device includes a deionized water supply source, a gas supply source, a gas-dissolving unit, and a gas supply pressure controller. The gas supply source supplies any of an oxidative gas, a reductive gas, an inert gas, a mixed gas of an oxidative gas and an inert gas, or a mixed gas of a reductive gas and an inert gas. The gas-dissolving unit dissolves the gas supplied from the gas supply source in deionized water supplied from the deionized water supply source to supply a gas-dissolved cleaning solution to objects to be cleaned. The gas supply pressure controller controls the pressure of the supplied gas at a value exceeding the atmospheric pressure when dissolving the gas in the deionized water.
摘要翻译： 清洗液制备装置包括去离子水供应源，气体供应源，气体溶解单元和气体供应压力控制器。 气体供给源供给氧化性气体，还原性气体，惰性气体，氧化性气体和惰性气体的混合气体，还原气体和惰性气体的混合气体。 气体溶解单元将从去离子水供给源供给的去离子水中的从气体供给源供给的气体溶解，将气体溶解的清洗液供给到待清洗对象物。 当将气体溶解在去离子水中时，气体供给压力控制器将供给气体的压力控制在超过大气压的值。
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9.发明授权公开(公告)号：US06274040B1
公开(公告)日：2001-08-14
申请号：US08811800
申请日：1997-03-06
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
IPC分类号： C02F148
CPC分类号： C02F1/48 , C02F2103/04 , Y10S210/90
摘要： There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.
摘要翻译： 提供了一种从高电阻率液体中去除静电电荷的方法和装置。 在与高电阻率液体接触的导电元件的表面上形成绝缘膜，其中绝缘膜具有使隧道电流可以流过绝缘膜的厚度，从而防止高度纯化的高电阻率液体 污染，以及变酸。 因此，用高电阻率液体处理的物体没有静电电荷而没有任何污染。
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公开(公告)号：US5480563A
公开(公告)日：1996-01-02
申请号：US219154
申请日：1994-03-29
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
CPC分类号： C02F1/48 , C02F2103/04 , Y10S210/90
摘要： There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.
摘要翻译： 提供了一种从高电阻率液体中去除静电电荷的方法和装置。 在与高电阻率液体接触的导电元件的表面上形成绝缘膜，其中绝缘膜具有使隧道电流可以流过绝缘膜的厚度，从而防止高度纯化的高电阻率液体 污染，以及变酸。 因此，用高电阻率液体处理的物体没有静电电荷而没有任何污染。
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