Pattern forming method and manufacturing method of semiconductor device
    1.
    发明授权
    Pattern forming method and manufacturing method of semiconductor device 失效
    半导体器件的图案形成方法和制造方法

    公开(公告)号:US07638267B2

    公开(公告)日:2009-12-29

    申请号:US11515933

    申请日:2006-09-06

    IPC分类号: G03F7/00

    摘要: According to an aspect of the invention, there is provided a pattern forming method including forming a lower layer organic film on a substrate, forming an upper layer resist film containing an inorganic element on the lower layer organic film, exposing a pattern on the upper layer resist film and performing development processing to form an opening in the upper layer resist film, supplying a coating forming agent to the upper layer resist film having the opening formed therein to embed and form a coating film in the opening of the upper layer resist film, thermally contracting the coating film to narrow the opening of the upper layer resist film, removing the coating film by dry etching processing and subsequently selectively removing the lower layer organic film with the upper layer resist film being used as a mask, thereby collectively processing the coating film and the lower layer organic film.

    摘要翻译: 根据本发明的一个方面,提供一种图案形成方法,包括在基板上形成下层有机膜,在下层有机膜上形成含有无机元素的上层抗蚀剂膜,在上层上露出图案 抗蚀剂膜并进行显影处理以在上层抗蚀剂膜中形成开口,向其中形成有开口的上层抗蚀剂膜供应涂料形成剂以在上层抗蚀剂膜的开口中嵌入形成涂膜, 热收缩涂膜以缩小上层抗蚀剂膜的开口,通过干蚀刻处理去除涂膜,随后选择性地除去下层有机膜,上层抗蚀剂膜用作掩模,从而共同处理涂层 薄膜和下层有机薄膜。

    Pattern forming method and manufacturing method of semiconductor device
    2.
    发明申请
    Pattern forming method and manufacturing method of semiconductor device 失效
    半导体器件的图案形成方法和制造方法

    公开(公告)号:US20070105054A1

    公开(公告)日:2007-05-10

    申请号:US11515933

    申请日:2006-09-06

    IPC分类号: G03F7/26

    摘要: According to an aspect of the invention, there is provided a pattern forming method including forming a lower layer organic film on a substrate, forming an upper layer resist film containing an inorganic element on the lower layer organic film, exposing a pattern on the upper layer resist film and performing development processing to form an opening in the upper layer resist film, supplying a coating forming agent to the upper layer resist film having the opening formed therein to embed and form a coating film in the opening of the upper layer resist film, thermally contracting the coating film to narrow the opening of the upper layer resist film, removing the coating film by dry etching processing and subsequently selectively removing the lower layer organic film with the upper layer resist film being used as a mask, thereby collectively processing the coating film and the lower layer organic film.

    摘要翻译: 根据本发明的一个方面,提供一种图案形成方法,包括在基板上形成下层有机膜,在下层有机膜上形成含有无机元素的上层抗蚀剂膜,在上层上露出图案 抗蚀剂膜并进行显影处理以在上层抗蚀剂膜中形成开口,向其中形成有开口的上层抗蚀剂膜供应涂料形成剂以在上层抗蚀剂膜的开口中嵌入形成涂膜, 热收缩涂膜以缩小上层抗蚀剂膜的开口,通过干蚀刻处理去除涂膜,随后选择性地除去下层有机膜,上层抗蚀剂膜用作掩模,从而共同处理涂层 薄膜和下层有机薄膜。

    Method for fabrication of interconnect structure with improved alignment for semiconductor devices
    4.
    发明授权
    Method for fabrication of interconnect structure with improved alignment for semiconductor devices 失效
    用于制造具有改进的半导体器件对准的互连结构的方法

    公开(公告)号:US08614144B2

    公开(公告)日:2013-12-24

    申请号:US13157744

    申请日:2011-06-10

    申请人: Hirokazu Kato

    发明人: Hirokazu Kato

    IPC分类号: H01L21/31 H01L21/469

    摘要: Methods and structure are provided for creating and utilizing hard masks to facilitate creation of a grating effect to control an anisotropic etching process for the creation of an opening, and subsequent formation of a interconnect structure (e.g., a via) in a multilayered semiconductor device. A first hard mask can be patterned to control etching in a first dimension, and a second hard mask can be patterned to control etching in a second dimension, wherein the second hard mask is patterned orthogonally opposed to the first hard mask. A resist can be patterned by inverting the pattern of a metal line patterning. Interconnects can be formed with critical dimension(s) and also self-aligned.

    摘要翻译: 提供了用于创建和利用硬掩模的方法和结构,以便于创建光栅效应以控制用于产生开口的各向异性蚀刻工艺,以及随后在多层半导体器件中形成互连结构(例如通孔)。 可以对第一硬掩模进行图案化以控制第一维度的蚀刻,并且可以对第二硬掩模进行图案化以控制第二维度中的蚀刻,其中第二硬掩模被图案与第一硬掩模垂直相对。 通过反转金属线图案的图案可以对抗蚀剂进行图案化。 互连可以形成临界尺寸,也可以自对准。

    Information processing apparatus and method for calculating the position and orientation of an image sensing device
    5.
    发明授权
    Information processing apparatus and method for calculating the position and orientation of an image sensing device 有权
    用于计算图像感测装置的位置和取向的信息处理装置和方法

    公开(公告)号:US08391589B2

    公开(公告)日:2013-03-05

    申请号:US12013123

    申请日:2008-01-11

    IPC分类号: G06K9/00

    摘要: Three pieces of candidate position information are calculated based on a plurality of pieces of sensing position information, and three pieces of candidate orientation information are calculated based on a plurality of pieces of sensing orientation information. Sets each of which combines one candidate position information and one candidate orientation information are prepared for all combinations. For each set, the candidate position information and candidate orientation information which configure that set are corrected. An evaluation value is calculated for each corrected set, and one of the sets is selected based on the calculated evaluation values. The candidate position information and candidate orientation information which configure the selected set are respectively recorded in a memory as sensing position information and sensing orientation information.

    摘要翻译: 基于多条感测位置信息计算三条候选位置信息,并且基于多条感测取向信息来计算三条候选方向信息。 对于所有组合,为每个组合一个候选位置信息和一个候选方向信息。 对于每个集合,配置该组的候选位置信息和候选方向信息被校正。 针对每个校正组计算评估值,并且基于所计算的评估值来选择一组。 配置所选择的集合的候选位置信息和候选方向信息分别作为感测位置信息和感测取向信息记录在存储器中。

    PRODUCTION METHOD OF TITANIUM OXIDE SOL
    6.
    发明申请
    PRODUCTION METHOD OF TITANIUM OXIDE SOL 有权
    氧化钛溶胶的生产方法

    公开(公告)号:US20110274767A1

    公开(公告)日:2011-11-10

    申请号:US13128496

    申请日:2009-10-27

    摘要: There is provided a method for efficiently producing an anatase-type titanium oxide sol in an extremely advantageous dispersion state. The method comprises mixing a titanium alkoxide, an organic acid, and a quaternary ammonium hydroxide with water in a molar ratio of the organic acid of 0.4 to 4.0 relative to 1 mol of a titanium atom of the titanium alkoxide and in a molar ratio of the quaternary ammonium hydroxide of 0.8 to 1.9 relative to 1 mol of the organic acid to prepare an aqueous mixed solution having a concentration in terms of TiO2 of 0.5 to 10% by mass; heating the aqueous mixed solution to 50 to 100° C. to remove an alcohol; and subjecting the resulting titanium-containing aqueous solution to a hydrothermal treatment at 110 to 170° C.

    摘要翻译: 提供了一种在非常有利的分散状态下有效地生产锐钛矿型氧化钛溶胶的方法。 该方法包括使钛醇盐,有机酸和季铵氢氧化物与水相比,相对于1摩尔钛醇钛的钛原子,有机酸的摩尔比为0.4-4.0摩尔比, 相对于1摩尔有机酸为0.8〜1.9的季铵氢氧化物,以制备TiO 2浓度为0.5〜10质量%的水性混合溶液; 将含水混合溶液加热至50至100℃以除去醇; 并将所得含钛水溶液在110〜170℃进行水热处理。

    Tracking a surface in a 3-dimensional scene using natural visual features of the surface
    7.
    发明授权
    Tracking a surface in a 3-dimensional scene using natural visual features of the surface 有权
    使用表面的自然视觉特征来跟踪三维场景中的曲面

    公开(公告)号:US07987079B2

    公开(公告)日:2011-07-26

    申请号:US12046389

    申请日:2008-03-11

    IPC分类号: G06F9/455

    摘要: A facility for determining the 3-dimensional location and orientation of a subject surface in a distinguished perspective image of the subject surface is described. The subject surface has innate visual features, a subset of which are selected. The facility uses the location of the selected visual features in a perspective image of the subject surface that precedes the distinguished perspective image in time to identify search zones in the distinguished perspective image. The facility searches the identified search zones for the selected visual features to determine the 2-dimensional locations at which the selected visual features occur. Based on the determined 2-dimensional locations, the facility determines the 3-dimensional location and orientation of the subject surface in the distinguished perspective image.

    摘要翻译: 描述用于确定被摄体表面的区别透视图像中的被摄体表面的三维位置和取向的设备。 主体表面具有先天的视觉特征,其中一部分被选择。 该设施使用所选择的视觉特征的位置在时间上在辨别的透视图像之前的主题表面的透视图像中,以识别区分的透视图像中的搜索区域。 设备搜索所识别的搜索区域以获得所选择的视觉特征以确定所选视觉特征出现的二维位置。 基于确定的二维位置,设备确定在尊贵的透视图像中的被摄体表面的三维位置和取向。

    BRAKE/DRIVE FORCE CONTROLLING APPARATUS FOR VEHICLE
    8.
    发明申请
    BRAKE/DRIVE FORCE CONTROLLING APPARATUS FOR VEHICLE 有权
    制动/驱动力控制装置

    公开(公告)号:US20100168953A1

    公开(公告)日:2010-07-01

    申请号:US12676235

    申请日:2008-09-03

    摘要: A brake/drive force controlling apparatus for a vehicle includes an engine for applying drive forces to driving wheels of the vehicles, a control diff for distributing the drive forces to the left and right driving wheels independently, and an electronic control system brake device for applying brake forces to the left and right driving wheels independently. An ECU is configured so as to be able to control the engine, the control diff, and the electronic control system brake device according to an operating state of the vehicle. When the electronic control system brake device is operated, this ECU stops the operation of the control diff, thereby avoiding a sudden input of load on the drive force distribution mechanism, regardless of the running state of the vehicle. This makes the apparatus simpler and more lightweight.

    摘要翻译: 用于车辆的制动/驱动力控制装置包括用于向车辆的驱动轮施加驱动力的发动机,用于将驱动力独立地分配到左右驱动轮的控制差异,以及用于施加 制动力独立于左右驱动轮。 ECU被配置为能够根据车辆的运行状态来控制发动机,控制差和电子控制系统制动装置。 当电子控制系统制动装置被操作时,该ECU停止控制差速器的操作,从而避免了驱动力分配机构的负载的突然输入,而不管车辆的行驶状态如何。 这使得设备更简单,更轻巧。

    ACIDIC ZIRCONIA SOL AND PRODUCTION METHOD OF THE SAME
    9.
    发明申请
    ACIDIC ZIRCONIA SOL AND PRODUCTION METHOD OF THE SAME 失效
    酸性ZIRCONIA SOL及其生产方法

    公开(公告)号:US20100120925A1

    公开(公告)日:2010-05-13

    申请号:US12687566

    申请日:2010-01-14

    IPC分类号: B01F3/12

    摘要: There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same. The acidic zirconia sol includes zirconia particles (a) having a particle diameter ranging from 20 to 300 nm in a content of 90 to 50% by mass, based on the mass of all zirconia particles, and zirconia particles (b) having a particle diameter of less than 20 nm in a content of 10 to 50% by mass, based on the mass of all zirconia particles.

    摘要翻译: 提供了具有颗粒性质和结合性质的相容性的酸性氧化锆溶胶及其制备方法。 所述酸性氧化锆溶胶包含氧化锆粒子(a),其粒径为20〜300nm,相对于全部氧化锆粒子的质量为90〜50质量%,具有粒径的氧化锆粒子(b) 相对于所有氧化锆粒子的质量,含量为10〜50质量%的范围小于20nm。

    Production method of alkaline zirconia sol
    10.
    发明授权
    Production method of alkaline zirconia sol 失效
    碱性氧化锆溶胶的生产方法

    公开(公告)号:US07629389B2

    公开(公告)日:2009-12-08

    申请号:US11922771

    申请日:2006-06-21

    IPC分类号: B01J37/03 B01J37/06

    摘要: A production method of an alkaline zirconia sol including: a process (I) in which an alkaline zirconia sol (A) is mixed with a basic zirconium carbonate salt (B1), the alkaline zirconia sol (A) being obtained by: a sub-process (i) in which a zirconium salt (B2) is heated at 60 to 110° C. in an aqueous medium containing a carbonate salt of quaternary ammonium; and a sub-process (ii) in which a hydrothermal treatment is performed at 110 to 250° C. following the sub-process (i).

    摘要翻译: 一种碱性氧化锆溶胶的制造方法,其特征在于,包括:将碱性氧化锆溶胶(A)与碱性碳酸锆盐(B1)混合的方法(I),碱土金属氧化锆溶胶(A) 方法(i)其中在含有季铵盐的碳酸盐的水性介质中将锆盐(B2)在60至110℃下加热; 以及在子过程(i)之后在110至250℃下进行水热处理的子方法(ii)。