Photosensitive composition, partition walls, color filter and organic EL device
    1.
    发明授权
    Photosensitive composition, partition walls, color filter and organic EL device 有权
    光敏组合物,隔墙,滤色片和有机EL器件

    公开(公告)号:US08168354B2

    公开(公告)日:2012-05-01

    申请号:US12971032

    申请日:2010-12-17

    IPC分类号: G03F7/038

    摘要: It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls.The photosensitive composition is a photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the formula: —CFXRf  (1) or a group represented by the formula: and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×104 and at most 7×104 and a weight average molecular weight of at least 5×104 and at most 25×104.

    摘要翻译: 本发明的目的是提供一种光敏组合物,其能够形成具有良好疏墨性的上表面的隔壁和具有良好的油墨亲和性的开放区域,在该区域内油墨容易扩散。 此外,本发明的目的是提供通过使感光组合物固化而形成的隔壁,以及具有隔壁的滤色器和有机EL器件。 感光性组合物是包含具有侧链的聚合物(A)的光敏性组合物,所述侧链含有由式-CFXRf(1)表示的基团或由下式表示的基团:含有烯属双键的侧链, 黑色着色剂(B),光聚合引发剂(C)和含有酸性基团和烯属双键的感光性树脂(D),其中,所述聚合物(A)的数均分子量为2×10 4以上, 至多7×10 4,重均分子量至少为5×10 4,最多为25×10 4。

    Negative photosensitive resin composition
    2.
    发明授权
    Negative photosensitive resin composition 有权
    负型感光性树脂组合物

    公开(公告)号:US07494764B2

    公开(公告)日:2009-02-24

    申请号:US11121203

    申请日:2005-05-04

    摘要: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.

    摘要翻译: 一种负型感光性树脂组合物,其含有具有酸性基团并且每分子具有至少三个烯属双键的碱溶性感光性树脂(A),由具有C20以下的聚合单元(b1)的聚合物构成的拒墨剂(B) 烷基中的至少一个氢原子被氟原子取代(条件是烷基可以含有醚性氧)和具有烯属双键的聚合单元(b2)和光聚合引发剂(C),其中 斥墨剂(B)中的氟含量为5〜25质量%,斥墨剂(B)的比例为0.01〜20质量%,相对于负型感光性树脂组合物的总固体成分。 本发明的负型感光性树脂组合物对基材的附着性优异,拒墨性和耐久性优异,碱溶性和显影性优异。

    Photosensitive composition, partition walls and black matrix
    3.
    发明授权
    Photosensitive composition, partition walls and black matrix 失效
    光敏组合物,隔墙和黑色矩阵

    公开(公告)号:US08153340B2

    公开(公告)日:2012-04-10

    申请号:US12627099

    申请日:2009-11-30

    IPC分类号: G03F7/004 G02B5/20

    摘要: To provide a photosensitive composition with which it is possible to form partition walls (black matrix) having excellent light shielding properties and liquid repellency.A photosensitive composition, which comprises a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is an O-acyloxime compound, and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %.

    摘要翻译: 为了提供可以形成具有优异的遮光性和拒水性的分隔壁(黑矩阵)的光敏组合物。 一种光敏组合物,其包含在一分子中具有含有含氟原子基团或含硅原子的基团的侧链和含有烯属双键的侧链的聚合物(A),黑色着色剂(B), 作为O-酰氧基肟化合物的光聚合引发剂(C)和在一个分子中含有酸性基团和烯属双键的感光性树脂(D),其中黑色着色剂(B)的总固体成分的比例 组成为15〜60质量%。

    PROCESS FOR PRODUCING SUBSTRATE HAVING PARTITION WALLS AND PIXELS FORMED THEREON
    4.
    发明申请
    PROCESS FOR PRODUCING SUBSTRATE HAVING PARTITION WALLS AND PIXELS FORMED THEREON 审中-公开
    用于生产具有分割壁和其形成的像素的基底的方法

    公开(公告)号:US20100075237A1

    公开(公告)日:2010-03-25

    申请号:US12627727

    申请日:2009-11-30

    IPC分类号: G03F7/20

    摘要: To provide a process for producing a substrate having partition walls and pixels formed thereon, by which it is possible to obtain partition walls excellent in the liquid repellency and pixels having an ink layer excellent in the uniformity in the thickness.A process for producing a substrate having partition walls and pixels formed thereon, which comprises forming partition walls on a substrate by a step (11) of coating the substrate with a photosensitive composition comprising a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a step (12) of drying a coating film of the photosensitive composition, an exposure step (13), a development step (14) and a post-exposure step (15); and forming a film by a step (21) of injecting an ink within dots which are regions partitioned by the partition walls and a step (22) of drying a coating film of the ink, the film satisfying (h1−h2)/h1

    摘要翻译: 为了提供一种制造具有形成在其上的隔壁和像素的基板的方法,通过该方法可以获得具有优异的疏液性的隔壁和具有优异的厚度均匀性优异的油墨层的像素。 一种用于制造具有形成在其上的隔壁和像素的基板的方法,其包括通过用包含具有含有氟原子的侧链的聚合物(A)的光敏组合物的步骤(11)在基板上形成分隔壁 含有硅原子的基团和在一个分子中含有烯属双键的侧链,干燥感光性组合物的被覆膜的工序(12),曝光工序(13),显影工序(14) )和曝光后步骤(15); 以及通过在由所述分隔壁分隔的区域的点内注入墨水的步骤(21)和使所述墨水的涂膜干燥的工序(22)来形成薄膜,所述薄膜满足(h1-h2)/ h1 < 0.3,其中h1是一个点中油墨层的最大厚度,h 2是最小厚度,从而获得像素。

    PROCESSES FOR FORMING PARTITION WALLS, COLOR FILTER AND ORGANIC EL
    5.
    发明申请
    PROCESSES FOR FORMING PARTITION WALLS, COLOR FILTER AND ORGANIC EL 审中-公开
    形成分隔壁,彩色滤光片和有机EL的方法

    公开(公告)号:US20080233493A1

    公开(公告)日:2008-09-25

    申请号:US12127993

    申请日:2008-05-28

    IPC分类号: G03F7/20

    摘要: To provide a process for forming partition walls excellent in the uniformity in thickness of the ink layer even when light exposure is low in the exposure step.A process for forming partition walls, which comprises a step of coating a substrate with a negative photosensitive composition containing a fluorinated polymer (A) having a side chain containing a fluoroalkyl group (which may have an etheric oxygen atom) and a side chain containing an ethylenic double bond, a drying step, an exposure step and a development step in this order, followed by a post-exposure step.

    摘要翻译: 为了提供即使在曝光步骤中曝光低的情况下也能形成油墨层厚度均匀性优异的间隔壁的工序。 一种形成隔壁的方法,其包括用含有含有氟代烷基(可具有醚性氧原子的)侧链的含氟聚合物(A)的负型感光性组合物和含有 乙烯双键,干燥步骤,曝光步骤和显影步骤,然后是曝光后步骤。

    PHOTOSENSITIVE COMPOSITION, PARTITION WALLS AND BLACK MATRIX
    6.
    发明申请
    PHOTOSENSITIVE COMPOSITION, PARTITION WALLS AND BLACK MATRIX 失效
    光敏组合物,分光光度计和黑色矩阵

    公开(公告)号:US20100072889A1

    公开(公告)日:2010-03-25

    申请号:US12627099

    申请日:2009-11-30

    IPC分类号: H05B33/14 C08F2/46 G02B5/23

    摘要: To provide a photosensitive composition with which it is possible to form partition walls (black matrix) having excellent light shielding properties and liquid repellency.A photosensitive composition, which comprises a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is an O-acyloxime compound, and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %.

    摘要翻译: 为了提供可以形成具有优异的遮光性和拒水性的分隔壁(黑矩阵)的光敏组合物。 一种光敏组合物,其包含在一分子中具有含有含氟原子基团或含硅原子的基团的侧链的聚合物(A)和含有烯属双键的侧链,黑色着色剂(B), 作为O-酰氧基肟化合物的光聚合引发剂(C)和在一个分子中含有酸性基团和烯属双键的感光性树脂(D),其中黑色着色剂(B)的总固体成分的比例 组成为15〜60质量%。

    Photosensitive resin composition and coating film cured product thereof
    7.
    发明申请
    Photosensitive resin composition and coating film cured product thereof 失效
    感光性树脂组合物及其涂膜固化物

    公开(公告)号:US20060003256A1

    公开(公告)日:2006-01-05

    申请号:US11219869

    申请日:2005-09-07

    IPC分类号: G03C1/492

    摘要: A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule. Further, a photosensitive resin composition comprising a resin (A2) having fluorine atom-containing groups and ethylenic double bonds, a resin (A3) having silicon atom-containing groups and ethylenic double bonds, a radical initiator (B), and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule.

    摘要翻译: 包含具有含氟原子的基团的树脂(A1),含硅原子的基团和烯属双键的感光性树脂组合物,具有至少三个烯键式双键的自由基引发剂(B)和碱溶性感光性树脂(D) 每分子。 此外,包含具有含氟原子的基团的树脂(A2)和烯属双键的感光性树脂组合物,具有含硅原子的基团和烯键式双键的树脂(A3),自由基引发剂(B) 每分子具有至少三个烯属双键的可溶性光敏树脂(D)。

    Negative photosensitive resin composition
    8.
    发明授权
    Negative photosensitive resin composition 有权
    负型感光性树脂组合物

    公开(公告)号:US07267929B2

    公开(公告)日:2007-09-11

    申请号:US11515729

    申请日:2006-09-06

    摘要: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.

    摘要翻译: 一种负型感光性树脂组合物,其含有具有酸性基团且每分子具有至少3个烯属双键的碱溶性感光性树脂(A),由具有C 其中至少一个氢原子被氟原子取代(优选烷基可以含有醚性氧)和具有烯属双键的聚合单元(b2)的低级烷基,以及 光聚合引发剂(C),其中斥油墨剂(B)中的氟含量为5〜25质量%,斥墨剂(B)的比例为0.01〜20质量% 的负型感光性树脂组合物。 本发明的负型感光性树脂组合物对基材的附着性优异,拒墨性和耐久性优异,碱溶性和显影性优异。

    Photosensitive resin composition and coating film cured product thereof
    9.
    发明授权
    Photosensitive resin composition and coating film cured product thereof 失效
    感光性树脂组合物及其涂膜固化物

    公开(公告)号:US07232648B2

    公开(公告)日:2007-06-19

    申请号:US11219869

    申请日:2005-09-07

    IPC分类号: G03C1/73 G03F7/032 G03F7/028

    摘要: A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule. Further, a photosensitive resin composition comprising a resin (A2) having fluorine atom-containing groups and ethylenic double bonds, a resin (A3) having silicon atom-containing groups and ethylenic double bonds, a radical initiator (B), and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule.

    摘要翻译: 包含具有含氟原子的基团的树脂(A1),含硅原子的基团和烯属双键的感光性树脂组合物,具有至少三个烯键式双键的自由基引发剂(B)和碱溶性感光性树脂(D) 每分子。 此外,包含具有含氟原子的基团的树脂(A2)和烯属双键的感光性树脂组合物,具有含硅原子的基团和烯键式双键的树脂(A3),自由基引发剂(B) 每分子具有至少三个烯属双键的可溶性光敏树脂(D)。

    Negative photosensitive resin composition
    10.
    发明申请
    Negative photosensitive resin composition 有权
    负型感光性树脂组合物

    公开(公告)号:US20050191580A1

    公开(公告)日:2005-09-01

    申请号:US11121203

    申请日:2005-05-04

    摘要: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.

    摘要翻译: 一种负型感光性树脂组合物,其含有具有酸性基团且每分子具有至少3个烯属双键的碱溶性感光性树脂(A),由具有C 其中至少一个氢原子被氟原子取代(优选烷基可以含有醚性氧)和具有烯属双键的聚合单元(b2)的低级烷基,以及 光聚合引发剂(C),其中斥油墨剂(B)中的氟含量为5〜25质量%,斥墨剂(B)的比例为0.01〜20质量% 的负型感光性树脂组合物。 本发明的负型感光性树脂组合物对基材的附着性优异,拒墨性和耐久性优异,碱溶性和显影性优异。