公开(公告)号：US5879576A

公开(公告)日：1999-03-09

申请号：US852291

申请日：1997-05-07

申请人： Kenya Wada ,  Kazuhiko Gonmori ,  Hisayoshi Ichikawa ,  Nobuo Morita ,  Hiroshi Fukuda

发明人： Kenya Wada ,  Kazuhiko Gonmori ,  Hisayoshi Ichikawa ,  Nobuo Morita ,  Hiroshi Fukuda

IPC分类号： B05C11/08 ,  G03F7/30 ,  H01L21/00 ,  H01L21/687 ,  B44C1/22

CPC分类号： H01L21/6715 ,  B05C11/08 ,  G03F7/3021 ,  H01L21/67023 ,  H01L21/67051 ,  H01L21/68721 ,  H01L21/6875 ,  H01L21/68778

摘要： Method and apparatus for processing substrates through a number of wet treatments. A substrate is set on a substrate rotating means for rotation in a horizontal face-up position, within a housing which is open on its top side. By a treating liquid feed means having a treating liquid feed nozzle member, at least one kind of treating liquid is supplied onto upper surfaces of the substrate being rotated by the substrate rotating means. The treating liquid feed nozzle member is supported on a movable arm for displacement to and from an operative position vertically confronting the substrate and a receded standby position away from the substrate on the substrate rotating means. Located face to face with lower surfaces of the substrate is a nozzle means which supplies a fluid to the lower side of the substrate.

摘要翻译： 通过多次湿处理处理基材的方法和装置。 基板被设置在基板旋转装置上，用于在水平面向上的位置，在其顶侧开口的壳体内旋转。 通过具有处理液体供给喷嘴构件的处理液体进料装置，至少一种处理液体被供给到通过基板旋转装置旋转的基板的上表面上。 处理液体供给喷嘴构件被支撑在可移动臂上，用于位于与基板垂直相对的操作位置和离开基板旋转装置上的基板的后退待机位置。 与基板的下表面面对面地设置有向基板的下侧供给流体的喷嘴装置。