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1.发明授权Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device 有权固态成像装置及其制造方法以及固态成像装置用基板公开(公告)号：US07737044B2
公开(公告)日：2010-06-15
申请号：US11599373
申请日：2006-11-15
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L27/14601 , H01L27/14627 , H01L27/14685
摘要： A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heat-flowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.
摘要翻译： 一种制造具有光电转换装置的固态成像装置的方法，所述方法包括：1）形成多个不同颜色的滤色器，2）在滤色器上形成透明树脂层，3）形成蚀刻 控制层，能够以与透明树脂层的蚀刻速率不同的蚀刻速率蚀刻蚀刻控制层，4）通过使用热可流动树脂在蚀刻控制层上形成透镜母版 材料，5）通过干蚀刻将透镜主体的图案转移到蚀刻控制层以形成中间微透镜，以及6）通过干蚀刻将中间微透镜的图案通过干蚀刻转印到透明树脂层上以形成转印透镜 。
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2.发明授权Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device 有权固态成像装置及其制造方法以及固态成像装置用基板公开(公告)号：US08004028B2
公开(公告)日：2011-08-23
申请号：US12385969
申请日：2009-04-24
IPC分类号： H01L31/062 , H01L31/113
CPC分类号： H01L27/14601 , H01L27/14627 , H01L27/14685
摘要： A solid state imaging device including photoelectric conversion devices which are arranged two-dimensionally; a color filter including a plurality of picture elements, each disposed corresponding to each of the photoelectric conversion devices; and a plurality of transfer lenses each disposed corresponding to each of the picture elements, formed of a thermoset acrylic resin, and formed directly on each of the picture elements, wherein a gap between neighboring transfer lenses is not more than 0.035 μm, and a contact length between neighboring transfer lenses is within the range of 3-80% of the pitch of the plurality of transfer lenses.
摘要翻译： 一种包括二维布置的光电转换装置的固态成像装置; 包括多个像素的滤色器，每个图像元素分别对应于每个光电转换器件; 以及多个转印透镜，每个透镜对应于由热固性丙烯酸树脂形成的每个图像元素，并且直接形成在每个像素上，其中相邻转印透镜之间的间隙不大于0.035μm，并且接触 相邻转印透镜之间的长度在多个转印透镜的间距的3-80％的范围内。
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3.发明申请Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device 有权固态成像装置及其制造方法以及固态成像装置用基板公开(公告)号：US20070058068A1
公开(公告)日：2007-03-15
申请号：US11599373
申请日：2006-11-15
CPC分类号： H01L27/14601 , H01L27/14627 , H01L27/14685
摘要： A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heat-flowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.
摘要翻译： 一种制造具有光电转换装置的固态成像装置的方法，所述方法包括：1）形成多个不同颜色的滤色器，2）在滤色器上形成透明树脂层，3）形成蚀刻 控制层，能够以与透明树脂层的蚀刻速率不同的蚀刻速率蚀刻蚀刻控制层，4）通过使用热可流动树脂在蚀刻控制层上形成透镜母版 材料，5）通过干蚀刻将透镜主体的图案转移到蚀刻控制层以形成中间微透镜，以及6）通过干蚀刻将中间微透镜的图案通过干蚀刻转印到透明树脂层上以形成转印透镜 。
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公开(公告)号：US08097485B2
公开(公告)日：2012-01-17
申请号：US11889070
申请日：2007-08-08
IPC分类号： H01L21/00
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14621 , H01L27/14627 , H01L27/14685 , H04N9/045
摘要： A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method including the steps of successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by means of dry etching, and the rest of the plurality of the color filter pattern is formed by means of photolithography.
摘要翻译： 一种制造固体摄像装置的方法，该固体摄像装置包括二维排列在半导体衬底中的光电转换元件，以及滤色器，其具有彼此不同颜色的多个滤色器图案，并配置在半导体衬底的表面上 基板根据光电转换元件。 该方法包括以下步骤：将彼此不同颜色的多个滤光层连续地进行图案化处理，以形成多个滤色器图案。 通过干法蚀刻形成要在多个滤色器图案中首先形成的至少一个滤色器图案，并且通过光刻法形成多个滤色器图案的其余部分。
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公开(公告)号：US07932122B2
公开(公告)日：2011-04-26
申请号：US12662368
申请日：2010-04-13
IPC分类号： H01L21/00
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14621 , H01L27/14627 , H01L27/14685 , H04N9/045
摘要： A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method includes successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by dry etching, and the rest of the plurality of the color filter pattern is formed by photolithography.
摘要翻译： 一种制造固体摄像装置的方法，该固体摄像装置包括二维排列在半导体衬底中的光电转换元件，以及滤色器，其具有彼此不同颜色的多个滤色器图案，并配置在半导体衬底的表面上 基板根据光电转换元件。 该方法包括将彼此不同颜色的多个滤光层连续地进行图案化处理以形成多个滤色器图案。 通过干蚀刻形成要在多个滤色器图案中形成的至少一个滤色器图案，并且通过光刻形成多个滤色器图案的其余部分。
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公开(公告)号：US20100261303A1
公开(公告)日：2010-10-14
申请号：US12662368
申请日：2010-04-13
IPC分类号： H01L31/18
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14621 , H01L27/14627 , H01L27/14685 , H04N9/045
摘要： A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method includes successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by dry etching, and the rest of the plurality of the color filter pattern is formed by photolithography.
摘要翻译： 一种制造固体摄像装置的方法，该固体摄像装置包括二维排列在半导体衬底中的光电转换元件，以及滤色器，其具有彼此不同颜色的多个滤色器图案，并配置在半导体衬底的表面上 基板根据光电转换元件。 该方法包括将彼此不同颜色的多个滤光层连续地进行图案化处理以形成多个滤色器图案。 通过干蚀刻形成要在多个滤色器图案中形成的至少一个滤色器图案，并且通过光刻形成多个滤色器图案的其余部分。
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7.发明申请Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device 有权固态成像装置及其制造方法以及固态成像装置用基板公开(公告)号：US20090206435A1
公开(公告)日：2009-08-20
申请号：US12385969
申请日：2009-04-24
IPC分类号： H01L31/0232
CPC分类号： H01L27/14601 , H01L27/14627 , H01L27/14685
摘要： A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heatflowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.
摘要翻译： 一种制造具有光电转换装置的固态成像装置的方法，所述方法包括：1）形成多个不同颜色的滤色器，2）在滤色器上形成透明树脂层，3）形成蚀刻 控制层，能够以与透明树脂层的蚀刻速率不同的蚀刻速率蚀刻蚀刻控制层，4）通过使用可流动的树脂材料在蚀刻控制层上形成透镜主体， 5）通过干蚀刻将透镜主体的图案转印到蚀刻控制层上以形成中间微透镜，以及6）通过干法蚀刻将中间微透镜的图案转印到透明树脂层上以形成转印透镜。
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公开(公告)号：US20070298164A1
公开(公告)日：2007-12-27
申请号：US11889070
申请日：2007-08-08
IPC分类号： B05D5/06
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14621 , H01L27/14627 , H01L27/14685 , H04N9/045
摘要： A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method including the steps of successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by means of dry etching, and the rest of the plurality of the color filter pattern is formed by means of photolithography.
摘要翻译： 一种制造固体摄像装置的方法，该固体摄像装置包括二维排列在半导体衬底中的光电转换元件，以及滤色器，其具有彼此不同颜色的多个滤色器图案，并配置在半导体衬底的表面上 基板根据光电转换元件。 该方法包括以下步骤：将彼此不同颜色的多个滤光层连续地进行图案化处理，以形成多个滤色器图案。 通过干法蚀刻形成要在多个滤色器图案中首先形成的至少一个滤色器图案，并且通过光刻法形成多个滤色器图案的其余部分。
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公开(公告)号：US07084472B2
公开(公告)日：2006-08-01
申请号：US10813179
申请日：2004-03-31
IPC分类号： H01L31/0232 , H01L31/0203
CPC分类号： G02B3/0056 , G02B3/0012 , G02B3/0018 , G02B5/201 , H01L27/14621 , H01L27/14627 , H01L27/14685
摘要： A solid-state imaging device includes a plurality of two-dimensionally arranged photo diodes and a plurality of microlenses having substantially hemispherical shapes which cover the respective photo diodes. The microlens has a multilayer structure including at least a transparent resin upper layer which forms at least a portion of the substantially hemispherical shape, and a colored lower layer provided on a portion of the transparent resin upper layer which is located above the photo diode, with an interface between the colored lower layer and the transparent resin upper layer having a shape conforming to a surface of the photo diode.
摘要翻译： 固态成像装置包括多个二维布置的光电二极管和多个具有覆盖各个光电二极管的大致半球形形状的微透镜。 微透镜具有多层结构，该多层结构至少包括形成至少一部分大致半球形状的透明树脂上层，以及设置在位于光电二极管上方的透明树脂上层的一部分上的着色下层， 着色下层和透明树脂上层之间的界面具有符合光电二极管表面的形状。
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公开(公告)号：US20090040345A1
公开(公告)日：2009-02-12
申请号：US12285367
申请日：2008-10-02
CPC分类号： H01L27/14621 , G02B5/201 , H01L27/14627 , H01L27/14632 , H01L27/14685
摘要： A color imaging device includes a semiconductor substrate including a plurality of photoelectric transducers, and a color filter including a plurality of coloring layers provided to associate with the photoelectric transducers of the semiconductor substrate. Each of the coloring layers of the color filter including a side surface that is erected with respect to a surface of the semiconductor substrate, and an inclined surface that is continuous from an end of the side surface located in the opposite side of the semiconductor substrate toward an end portion of the coloring layer located in the opposite side of the semiconductor substrate. The coloring layers are arranged with their side surfaces being in contact with each other without a gap therebetween, and the end portion of the coloring layer has a curved surface shape protruding toward the opposite side of the corresponding photoelectric transducer.
摘要翻译： 彩色成像装置包括包括多个光电换能器的半导体衬底，以及包括多个着色层的滤色器，所述着色层设置成与半导体衬底的光电变换器相关联。 滤色器的每个着色层包括相对于半导体衬底的表面竖立的侧表面，以及从位于半导体衬底的相对侧的侧表面的端部连续的倾斜表面朝向 着色层的位于半导体衬底的相对侧的端部。 着色层被布置成其侧表面彼此接触而没有间隙，着色层的端部具有朝向相应的光电转换器的相对侧突出的弯曲表面形状。
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