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    Database management system risk assessment
    1.
    发明授权
    Database management system risk assessment 有权
    数据库管理系统风险评估

    公开(公告)号：US08676746B2

    公开(公告)日：2014-03-18

    申请号：US11968653

    申请日：2008-01-03

    申请人： Kevin Tsai ,  Bob Ham ,  Yun Wu ,  Dwayne Lanclos ,  Venkata Raj Pochiraju

    发明人： Kevin Tsai ,  Bob Ham ,  Yun Wu ,  Dwayne Lanclos ,  Venkata Raj Pochiraju

    IPC分类号： G06F7/00 ,  G06F17/00

    CPC分类号： G06F11/0709 ,  G06F11/0727 ,  G06F11/079 ,  G06F17/30289

    摘要： A method of evaluating an implementation of a DBMS is provided. The method comprises collecting data associated with the implementation of the DBMS and accessing a database comprising problems and their associated solutions, wherein the solutions are configured to remedy at least one of the problems. The method further comprises comparing the data associated with the implementation of the DBMS with the problems and identifying at least one problem associated with the DBMS. Finally, a DBMS risk assessment report is generated that identifies the problem associated with the DBMS and a solution configured to remedy the problem.

    摘要翻译： 提供了一种评估DBMS实现的方法。 该方法包括收集与DBMS的实现相关联的数据并访问包括问题的数据库及其相关联的解决方案，其中解决方案被配置为补救至少一个问题。 该方法还包括将与DBMS的实现相关联的数据与问题进行比较，并且识别与DBMS相关联的至少一个问题。 最后，生成一个DBMS风险评估报告，用于识别与DBMS相关的问题以及配置为解决问题的解决方案。

    DATABASE MANAGEMENT SYSTEM RISK ASSESSMENT
    2.
    发明申请
    DATABASE MANAGEMENT SYSTEM RISK ASSESSMENT 有权
    数据库管理系统风险评估

    公开(公告)号：US20090248753A1

    公开(公告)日：2009-10-01

    申请号：US11968653

    申请日：2008-01-03

    申请人： Kevin Tsai ,  Bob Ham ,  Yun Wu ,  Dwayne Lanclos ,  Venkata Raj Pochiraju

    发明人： Kevin Tsai ,  Bob Ham ,  Yun Wu ,  Dwayne Lanclos ,  Venkata Raj Pochiraju

    IPC分类号： G06F12/00 ,  G06F17/30 ,  G06F12/16

    CPC分类号： G06F11/0709 ,  G06F11/0727 ,  G06F11/079 ,  G06F17/30289

    摘要： A method of evaluating an implementation of a DBMS is provided. The method comprises collecting data associated with the implementation of the DBMS and accessing a database comprising problems and their associated solutions, wherein the solutions are configured to remedy at least one of the problems. The method further comprises comparing the data associated with the implementation of the DBMS with the problems and identifying at least one problem associated with the DBMS. Finally, a DBMS risk assessment report is generated that identifies the problem associated with the DBMS and a solution configured to remedy the problem.

    摘要翻译： 提供了一种评估DBMS实现方法。 该方法包括收集与DBMS的实现相关联的数据并访问包括问题的数据库及其相关联的解决方案，其中解决方案被配置为补救至少一个问题。 该方法还包括将与DBMS的实现相关联的数据与问题进行比较，并且识别与DBMS相关联的至少一个问题。 最后，生成一个DBMS风险评估报告，用于识别与DBMS相关的问题以及配置为解决问题的解决方案。

    Mitigation of well proximity effect in integrated circuits
    3.
    发明授权
    Mitigation of well proximity effect in integrated circuits 有权
    减轻集成电路中的良好邻近效应

    公开(公告)号：US08350365B1

    公开(公告)日：2013-01-08

    申请号：US13005680

    申请日：2011-01-13

    申请人： Yun Wu ,  Hong-Tsz Pan ,  Qi Lin ,  Bang-Thu Nguyen

    发明人： Yun Wu ,  Hong-Tsz Pan ,  Qi Lin ,  Bang-Thu Nguyen

    IPC分类号： H01L21/4763

    CPC分类号： H01L21/266 ,  H01L21/26513

    摘要： A hard implantation mask layer is formed on a semiconductor wafer. An etch mask layer is formed on the hard implantation mask layer and patterned. The hard implantation mask layer is etched to form a well implantation pattern and ions are implanted into the semiconductor wafer to form wells in the semiconductor wafer, in areas where the semiconductor wafer is not covered by the well implantation mask.

    摘要翻译： 在半导体晶片上形成硬注入掩模层。 在硬注入掩模层上形成蚀刻掩模层并进行图案化。 蚀刻硬注入掩模层以形成良好注入图案，并且在半导体晶片未被阱注入掩模覆盖的区域中，将离子注入到半导体晶片中以在半导体晶片中形成阱。