Liquid crystal display device and method for manufacturing the same
    1.
    发明授权
    Liquid crystal display device and method for manufacturing the same 有权
    液晶显示装置及其制造方法

    公开(公告)号:US07995162B2

    公开(公告)日:2011-08-09

    申请号:US12318292

    申请日:2008-12-24

    IPC分类号: G02F1/1335 G02F1/1341

    摘要: Disclosed are a liquid crystal display device without a black matrix capable of eliminating light leakage while not decreasing opening degree and reducing production costs and, in addition, a method for fabricating the liquid crystal display device described above. The liquid crystal display device includes: a thin film transistor formed on a first substrate; a first passivation layer formed on the first substrate including the thin film transistor; a color filter layer formed on the first passivation layer; a second passivation layer formed on the first substrate including the color filter layer; a pixel electrode which passes through the second and the first passivation layers, is electrically connected to a part of the thin film transistor and has a lamination structure of transparent metal and opacity metal, wherein the transparent metal part has a width wider than that of the opacity metal part; and a second substrate corresponding to the first substrate.

    摘要翻译: 公开了一种不具有黑色矩阵的液晶显示装置,并且能够消除漏光,同时不降低开口度并降低生产成本,另外还提供了一种用于制造上述液晶显示装置的方法。 液晶显示装置包括:形成在第一基板上的薄膜晶体管; 在包括所述薄膜晶体管的所述第一基板上形成的第一钝化层; 形成在所述第一钝化层上的滤色器层; 形成在包括所述滤色器层的所述第一基板上的第二钝化层; 通过第二钝化层和第一钝化层的像素电极电连接到薄膜晶体管的一部分,并具有透明金属和不透明金属的层叠结构,其中透明金属部分的宽度大于 不透明度金属部分; 以及对应于第一基板的第二基板。

    Liquid crystal display device and method for manufacturing the same
    2.
    发明申请
    Liquid crystal display device and method for manufacturing the same 有权
    液晶显示装置及其制造方法

    公开(公告)号:US20100073612A1

    公开(公告)日:2010-03-25

    申请号:US12318292

    申请日:2008-12-24

    IPC分类号: G02F1/1335

    摘要: Disclosed are a liquid crystal display device without a black matrix capable of eliminating light leakage while not decreasing opening degree and reducing production costs and, in addition, a method for fabricating the liquid crystal display device described above. The liquid crystal display device includes: a thin film transistor formed on a first substrate; a first passivation layer formed on the first substrate including the thin film transistor; a color filter layer formed on the first passivation layer; a second passivation layer formed on the first substrate including the color filter layer; a pixel electrode which passes through the second and the first passivation layers, is electrically connected to a part of the thin film transistor and has a lamination structure of transparent metal and opacity metal, wherein the transparent metal part has a width wider than that of the opacity metal part; and a second substrate corresponding to the first substrate.

    摘要翻译: 公开了一种不具有黑色矩阵的液晶显示装置,并且能够消除漏光,同时不降低开口度并降低生产成本,另外还提供了一种用于制造上述液晶显示装置的方法。 液晶显示装置包括:形成在第一基板上的薄膜晶体管; 在包括所述薄膜晶体管的所述第一基板上形成的第一钝化层; 形成在所述第一钝化层上的滤色器层; 形成在包括所述滤色器层的所述第一基板上的第二钝化层; 通过第二钝化层和第一钝化层的像素电极电连接到薄膜晶体管的一部分,并具有透明金属和不透明金属的层叠结构,其中透明金属部分的宽度大于 不透明度金属部分; 以及对应于第一基板的第二基板。

    Washing device
    3.
    发明授权
    Washing device 有权
    洗衣机

    公开(公告)号:US09362146B2

    公开(公告)日:2016-06-07

    申请号:US12569272

    申请日:2009-09-29

    摘要: A washing device is disclosed, which is capable of preventing damage of a substrate caused by drooping of the substrate. The washing device includes a plasma irradiating part supplied with a substrate from a substrate loading part to remove dirt from the substrate by irradiating plasma to the substrate; a dirt washing part supplied from the substrate from the plasma irradiating part to remove dirt remaining on the substrate; a finishing washing part supplied with the substrate from the dirt washing part to wash the substrate; a drying part supplied with the substrate from the finishing washing part to dry the substrate; and a substrate unloading part supplied with the substrate from the drying part to unload the substrate, wherein the plasma irradiating part includes a plasma irradiation unit that irradiates plasma to the substrate and a floating unit that maintains the substrate in a floating state.

    摘要翻译: 公开了一种清洗装置,其能够防止由于基板的下垂而造成的基板损坏。 洗涤装置包括从衬底装载部分提供有衬底的等离子体照射部分,以通过将等离子体照射到衬底来从衬底去除污物; 从所述基板从所述等离子体照射部供给的污物洗涤部,以去除残留在所述基板上的污物; 从污物清洗部分提供衬底以洗涤衬底的整理洗涤部分; 干燥部,其从所述精加工清洗部供给所述基板以干燥所述基板; 以及从干燥部供给基板以卸载基板的基板卸载部,其中等离子体照射部包括将等离子体照射到基板的等离子体照射单元和将基板保持在浮置状态的浮动单元。

    Washing device and method for fabricating the same
    4.
    发明授权
    Washing device and method for fabricating the same 有权
    洗涤装置及其制造方法

    公开(公告)号:US09059222B2

    公开(公告)日:2015-06-16

    申请号:US12318289

    申请日:2008-12-24

    摘要: The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.

    摘要翻译: 本发明涉及一种清洗装置及其制造方法,该清洗装置及其制造方法具有良好的耐化学性,并可防止在基板上形成划痕。 洗涤装置包括用于使基板从洗涤装置的外部向右方向进入的基板进入引导件,用于从基板入口引导单元接收基板并从基板除去异物的异物去除单元, 用于从异物去除单元接收衬底的异物洗涤单元和从衬底洗涤的异物保持异物;以及位置控制单元,用于控制移出异物洗涤单元的衬底的位置,其中衬底进入引导件, 异物去除单元,异物清洗单元和位置控制单元由金属多孔材料形成。

    Washing device and method for fabricating the same
    5.
    发明申请
    Washing device and method for fabricating the same 有权
    洗涤装置及其制造方法

    公开(公告)号:US20100071728A1

    公开(公告)日:2010-03-25

    申请号:US12318289

    申请日:2008-12-24

    IPC分类号: B08B3/04 B22F3/02

    摘要: The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.

    摘要翻译: 本发明涉及一种清洗装置及其制造方法,该清洗装置及其制造方法具有良好的耐化学性,并可防止在基板上形成划痕。 洗涤装置包括用于使基板从洗涤装置的外部向右方向进入的基板进入引导件,用于从基板入口引导单元接收基板并从基板除去异物的异物去除单元, 用于从异物去除单元接收衬底的异物洗涤单元和从衬底洗涤的异物保持异物;以及位置控制单元,用于控制移出异物洗涤单元的衬底的位置,其中衬底进入引导件, 异物去除单元,异物清洗单元和位置控制单元由金属多孔材料形成。

    WASHING DEVICE
    7.
    发明申请
    WASHING DEVICE 有权
    洗衣设备

    公开(公告)号:US20100122716A1

    公开(公告)日:2010-05-20

    申请号:US12569272

    申请日:2009-09-29

    IPC分类号: B08B3/00

    摘要: A washing device is disclosed, which is capable of preventing damage of a substrate caused by drooping of the substrate. The washing device includes a plasma irradiating part supplied with a substrate from a substrate loading part to remove dirt from the substrate by irradiating plasma to the substrate; a dirt washing part supplied from the substrate from the plasma irradiating part to remove dirt remaining on the substrate; a finishing washing part supplied with the substrate from the dirt washing part to wash the substrate; a drying part supplied with the substrate from the finishing washing part to dry the substrate; and a substrate unloading part supplied with the substrate from the drying part to unload the substrate, wherein the plasma irradiating part includes a plasma irradiation unit that irradiates plasma to the substrate and a floating unit that maintains the substrate in a floating state.

    摘要翻译: 公开了一种清洗装置,其能够防止由于基板的下垂而造成的基板的损坏。 洗涤装置包括从衬底装载部分提供有衬底的等离子体照射部分,以通过将等离子体照射到衬底来从衬底去除污物; 从所述基板从所述等离子体照射部供给的污物洗涤部,以去除残留在所述基板上的污物; 从污物清洗部分提供衬底以洗涤衬底的整理洗涤部分; 干燥部,其从所述精加工清洗部供给所述基板以干燥所述基板; 以及从干燥部供给基板以卸载基板的基板卸载部,其中等离子体照射部包括将等离子体照射到基板的等离子体照射单元和将基板保持在浮置状态的浮动单元。

    Washing device
    8.
    发明申请
    Washing device 审中-公开
    洗衣机

    公开(公告)号:US20100050364A1

    公开(公告)日:2010-03-04

    申请号:US12314962

    申请日:2008-12-19

    IPC分类号: B08B5/02

    CPC分类号: B08B5/02 B08B5/023

    摘要: A washing device capable of stably washing a substrate is disclosed. The washing device includes a substrate entry guiding unit which guides a substrate supplied from the outside to be entered in a correct direction, a dirt removing unit supplied with the substrate from the substrate entry guiding unit to remove dirt formed on the substrate, a dirt washing unit supplied with the substrate from the dirt removing unit to wash off residual dirt remaining on the substrate, and a position controlling unit controlling position of the substrate being discharged from the dirt washing unit.

    摘要翻译: 公开了能够稳定地洗涤基板的洗涤装置。 洗涤装置包括:基板入口引导单元,其引导从正确方向从外部供应的基板;从基板输入引导单元提供有基板的污物去除单元,以去除基板上形成的污垢;污物洗涤 从污物去除单元提供的基板的单元,以清除残留在基板上的残留污物;以及位置控制单元,控制从污物清洗单元排出的基板的位置。