摘要:
Disclosed are a liquid crystal display device without a black matrix capable of eliminating light leakage while not decreasing opening degree and reducing production costs and, in addition, a method for fabricating the liquid crystal display device described above. The liquid crystal display device includes: a thin film transistor formed on a first substrate; a first passivation layer formed on the first substrate including the thin film transistor; a color filter layer formed on the first passivation layer; a second passivation layer formed on the first substrate including the color filter layer; a pixel electrode which passes through the second and the first passivation layers, is electrically connected to a part of the thin film transistor and has a lamination structure of transparent metal and opacity metal, wherein the transparent metal part has a width wider than that of the opacity metal part; and a second substrate corresponding to the first substrate.
摘要:
Disclosed are a liquid crystal display device without a black matrix capable of eliminating light leakage while not decreasing opening degree and reducing production costs and, in addition, a method for fabricating the liquid crystal display device described above. The liquid crystal display device includes: a thin film transistor formed on a first substrate; a first passivation layer formed on the first substrate including the thin film transistor; a color filter layer formed on the first passivation layer; a second passivation layer formed on the first substrate including the color filter layer; a pixel electrode which passes through the second and the first passivation layers, is electrically connected to a part of the thin film transistor and has a lamination structure of transparent metal and opacity metal, wherein the transparent metal part has a width wider than that of the opacity metal part; and a second substrate corresponding to the first substrate.
摘要:
A washing device is disclosed, which is capable of preventing damage of a substrate caused by drooping of the substrate. The washing device includes a plasma irradiating part supplied with a substrate from a substrate loading part to remove dirt from the substrate by irradiating plasma to the substrate; a dirt washing part supplied from the substrate from the plasma irradiating part to remove dirt remaining on the substrate; a finishing washing part supplied with the substrate from the dirt washing part to wash the substrate; a drying part supplied with the substrate from the finishing washing part to dry the substrate; and a substrate unloading part supplied with the substrate from the drying part to unload the substrate, wherein the plasma irradiating part includes a plasma irradiation unit that irradiates plasma to the substrate and a floating unit that maintains the substrate in a floating state.
摘要:
The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.
摘要:
The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.
摘要:
A mold unit manufacturing a plastic edged glass shelf includes a first mold including a first support frame forming groove; a second mold including a second support frame forming groove; a support frame forming portion formed by the first and second support frame forming grooves; a seating portion receiving a glass sheet; and support pins formed in the support frame forming portion forming the edge of the glass sheet.
摘要:
A washing device is disclosed, which is capable of preventing damage of a substrate caused by drooping of the substrate. The washing device includes a plasma irradiating part supplied with a substrate from a substrate loading part to remove dirt from the substrate by irradiating plasma to the substrate; a dirt washing part supplied from the substrate from the plasma irradiating part to remove dirt remaining on the substrate; a finishing washing part supplied with the substrate from the dirt washing part to wash the substrate; a drying part supplied with the substrate from the finishing washing part to dry the substrate; and a substrate unloading part supplied with the substrate from the drying part to unload the substrate, wherein the plasma irradiating part includes a plasma irradiation unit that irradiates plasma to the substrate and a floating unit that maintains the substrate in a floating state.
摘要:
A washing device capable of stably washing a substrate is disclosed. The washing device includes a substrate entry guiding unit which guides a substrate supplied from the outside to be entered in a correct direction, a dirt removing unit supplied with the substrate from the substrate entry guiding unit to remove dirt formed on the substrate, a dirt washing unit supplied with the substrate from the dirt removing unit to wash off residual dirt remaining on the substrate, and a position controlling unit controlling position of the substrate being discharged from the dirt washing unit.