摘要:
A method of fabricating a MOS transistor, and a MOS transistor fabricated by the method. The method can include forming a gate pattern on a semiconductor substrate. The gate pattern can be formed by sequentially stacking a gate electrode and a capping layer pattern. The capping layer pattern is formed to have a lower capping layer pattern and an upper capping layer pattern. The lower capping layer pattern is formed to a smaller width than the upper capping layer pattern.
摘要:
A logic device may include a first functional block, the first functional block including, a first storage block, a second storage block, and a first function controller. In a first operation time period, the first function controller may be configured to receive a first configuration selection signal and a first configuration command signal that instructs a first function be configured, select the first storage block as a configured storage block in the first operation time period based on the first configuration selection signal, and configure the first function in the first storage block based on the first configuration command signal.
摘要:
A method of forming a high dielectric film using atomic layer deposition (ALD), and a method of manufacturing a capacitor having the high dielectric film, include supplying a precursor containing a metal element to a semiconductor substrate and purging a reactor; supplying an oxidizer and purging the reactor; and supplying a reaction source containing nitrogen and purging the reactor.