公开(公告)号：US12078922B2

公开(公告)日：2024-09-03

申请号：US17472387

申请日：2021-09-10

Applicant: Kioxia Corporation

Inventor： Takashi Sato ,  Takeshi Suto ,  Satoshi Mitsugi

IPC: G03F1/42 ,  G01B11/27 ,  G03F7/00 ,  G03F9/00 ,  H01L23/544

CPC classification number: G03F1/42 ,  G01B11/27 ,  G03F7/0002 ,  G03F9/7042 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54466

Abstract: A template of one embodiment includes an alignment mark. The alignment mark includes a first main pattern and a first auxiliary pattern. In the first main pattern, a first part and a second part are disposed according to a predetermined repeating pattern. The first auxiliary pattern is configured as a pattern opposite to the repeating pattern in a region outside an end of the first main pattern.

公开(公告)号：US11815348B2

公开(公告)日：2023-11-14

申请号：US17471026

申请日：2021-09-09

Applicant: Kioxia Corporation

Inventor： Takashi Sato ,  Satoshi Mitsugi

IPC: G01B11/27 ,  G03F1/42 ,  H01L23/544

CPC classification number: G01B11/272 ,  G03F1/42 ,  H01L23/544 ,  H01L2223/54426

Abstract: According to one embodiment, a template includes an alignment mark. The alignment mark includes first marks arranged at a first pitch in a first direction and second marks arranged at a second pitch in the first direction. At least one of the first marks includes a first region and a third region. At least one of the second marks includes a second region and the third region. The first region has first patterns arranged in a line-and-space form in the first direction. The second region has second patterns arranged in a line-and-space form in a second direction orthogonal to the first direction.

公开(公告)号：US20220307826A1

公开(公告)日：2022-09-29

申请号：US17471026

申请日：2021-09-09

Applicant: Kioxia Corporation

Inventor： Takashi SATO ,  Satoshi Mitsugi

IPC: G01B11/27 ,  H01L23/544 ,  G03F1/42

Abstract: According to one embodiment, a template includes an alignment mark. The alignment mark includes first marks arranged at a first pitch in a first direction and second marks arranged at a second pitch in the first direction. At least one of the first marks includes a first region and a third region. At least one of the second marks includes a second region and the third region. The first region has first patterns arranged in a line-and-space form in the first direction. The second region has second patterns arranged in a line-and-space form in a second direction orthogonal to the first direction.