公开(公告)号：US20230081143A1

公开(公告)日：2023-03-16

申请号：US17547046

申请日：2021-12-09

Applicant: KIOXIA Corporation

Inventor： Takashi SATO

IPC: G03F9/00

Abstract: According to one embodiment, a measurement method includes generating mark position information, determining at least one of a first arrangement pattern or a second arrangement pattern, and calculating displacement between a first member and a second member. The mark position information is generated after the second member is formed on the first member, and indicates a relative positional relationship between a first alignment mark formed on the first member and including bright portions and dark portions, and a second alignment mark formed on the second member and including the bright portions and the dark portions. The first arrangement pattern indicates an arrangement pattern of bright portions and dark portions of the first alignment mark. The second arrangement pattern indicates an arrangement pattern of the bright portions and the dark portions of the second alignment mark. The first arrangement pattern is determined on the basis of captured data of a reference mark formed in a region different from the region where the first alignment mark is formed and the region where the second alignment mark is formed. The displacement is calculated on the basis of the mark position information and at least one of the first arrangement pattern or the second arrangement pattern.

公开(公告)号：US20220308440A1

公开(公告)日：2022-09-29

申请号：US17472387

申请日：2021-09-10

Applicant: Kioxia Corporation

Inventor： Takashi SATO ,  Takeshi SUTO ,  Satoshi MITSUGI

IPC: G03F1/42 ,  H01L23/544 ,  G01B11/27

Abstract: A template of one embodiment includes an alignment mark. The alignment mark includes a first main pattern and a first auxiliary pattern. In the first main pattern, a first part and a second part are disposed according to a predetermined repeating pattern. The first auxiliary pattern is configured as a pattern opposite to the repeating pattern in a region outside an end of the first main pattern.

公开(公告)号：US20220307826A1

公开(公告)日：2022-09-29

申请号：US17471026

申请日：2021-09-09

Applicant: Kioxia Corporation

Inventor： Takashi SATO ,  Satoshi Mitsugi

IPC: G01B11/27 ,  H01L23/544 ,  G03F1/42

Abstract: According to one embodiment, a template includes an alignment mark. The alignment mark includes first marks arranged at a first pitch in a first direction and second marks arranged at a second pitch in the first direction. At least one of the first marks includes a first region and a third region. At least one of the second marks includes a second region and the third region. The first region has first patterns arranged in a line-and-space form in the first direction. The second region has second patterns arranged in a line-and-space form in a second direction orthogonal to the first direction.

公开(公告)号：US20240203894A1

公开(公告)日：2024-06-20

申请号：US18460820

申请日：2023-09-05

Applicant: Kioxia Corporation

Inventor： Kazuhiro TAKAHATA ,  Takashi SATO

IPC: H01L23/544 ,  G03F7/00 ,  G03F9/00 ,  H01L21/66

CPC classification number: H01L23/544 ,  G03F7/0002 ,  G03F9/7076 ,  H01L22/12 ,  H01L2223/54426

Abstract: According to one embodiment, an alignment mark includes a first mark arranged in a first film having optical transparency of a first substrate on which a device is manufactured; a second mark that is arranged in a second substrate having a first pattern to be transferred to the first substrate side, and is used for alignment with the first mark; and a second pattern that is arranged in at least any of the first and second substrates at a position overlapping a peripheral region of the first mark when viewed from the second substrate side, the first substrate and the second substrate being arranged at positions where the first and second marks vertically overlap each other, in which the second pattern has a random dimensional distribution.