公开(公告)号：US20230298888A1

公开(公告)日：2023-09-21

申请号：US17900250

申请日：2022-08-31

Applicant: KIOXIA CORPORATION

Inventor： Satoshi MITSUGI

IPC: H01L21/027 ,  H01L21/311 ,  G03F1/42 ,  G03F7/00

CPC classification number: H01L21/0271 ,  H01L21/31144 ,  G03F1/42 ,  G03F7/0002 ,  G03F7/038

Abstract: According to one embodiment, a pattern forming method includes forming a first resin pattern on a substrate with a first resin. The first resin pattern includes a first transfer pattern and a first mark. A second resin is dispensed to cover the first mark of the first resin pattern. A first pattern is formed including the first transfer pattern and the second resin covering the first mark. The first pattern is then transferred to a first process film on the substrate.

公开(公告)号：US20240316915A1

公开(公告)日：2024-09-26

申请号：US18598201

申请日：2024-03-07

Applicant: Kioxia Corporation

Inventor： Sachiko KOBAYASHI ,  Kazuhiro TAKAHATA ,  Satoshi MITSUGI

IPC: B41C1/10 ,  G03F7/00 ,  G06F30/392

CPC classification number: B41C1/10 ,  G03F7/0002 ,  G06F30/392

Abstract: A pattern design method according to an embodiment is a method to design a pattern of a template used for an imprint process. The imprint process serves to form a predetermined pattern by pressing a shot surface of the template against a surface of a processed layer. The method includes setting an outer edge coverage range corresponding to an outer edge region located a predetermined distance inside an edge of the shot surface of the template. The outer edge coverage range is set to be different from an inner coverage range corresponding to an inner region inside the outer edge region. The method includes designing a pattern in the outer edge region to have a coverage falling within the outer edge coverage range. The method includes designing a pattern in the inner region to have a coverage falling within the inner coverage range.

公开(公告)号：US20220308440A1

公开(公告)日：2022-09-29

申请号：US17472387

申请日：2021-09-10

Applicant: Kioxia Corporation

Inventor： Takashi SATO ,  Takeshi SUTO ,  Satoshi MITSUGI

IPC: G03F1/42 ,  H01L23/544 ,  G01B11/27

Abstract: A template of one embodiment includes an alignment mark. The alignment mark includes a first main pattern and a first auxiliary pattern. In the first main pattern, a first part and a second part are disposed according to a predetermined repeating pattern. The first auxiliary pattern is configured as a pattern opposite to the repeating pattern in a region outside an end of the first main pattern.

公开(公告)号：US20250069215A1

公开(公告)日：2025-02-27

申请号：US18810757

申请日：2024-08-21

Applicant: Kioxia Corporation

Inventor： Satoshi MITSUGI

IPC: G06T7/00 ,  G06T5/10 ,  G06T5/20 ,  G06T5/50 ,  G06T5/70 ,  G06V10/74

Abstract: According to one embodiment, an evaluation method including: applying a first transform processing on a first two-dimensional data and a second two-dimensional data to generate a first spectrum and a second spectrum respectively, the first two-dimensional data indicating a defect distribution of a first substrate on which a pattern is formed by imprinting an original mold onto a photoresist on the first substrate, the second two-dimensional data indicating a predicted defect distribution of a second substrate; filtering the generated first spectrum and the generated second spectrum; applying a second transform processing to the processed first spectrum and the processed second spectrum to restore the first two-dimensional data and the second two-dimensional data, respectively; applying thresholding on the restored first two-dimensional data and the restored second two-dimensional data, respectively; and calculating a matching degree by applying a comparison function to the thresholded first two-dimensional data and the thresholded second two-dimensional data.