公开(公告)号：US20220221792A1

公开(公告)日：2022-07-14

申请号：US17707720

申请日：2022-03-29

Applicant: Kioxia Corporation

Inventor： Ryosuke YAMAMOTO ,  Seiji MORITA ,  Norikatsu SASAO ,  Koji ASAKAWA ,  Tomoaki SAWABE ,  Shinobu SUGIMURA

IPC: G03F7/09 ,  C08F220/08 ,  C08F212/08 ,  C08F120/08 ,  G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  C08F120/28 ,  G03F7/40 ,  H01L21/033 ,  H01L21/311 ,  C08F220/28

Abstract: A pattern forming material according to an embodiment is a pattern forming material comprising a polymer composed of a plurality of monomer units bonded to each other. Each of the monomer units includes an ester structure having a first carbonyl group and at least one second carbonyl group bonded to the ester structure. A second carbonyl group farthest from a main chain of the polymer constituting the pattern forming material among second carbonyl groups is in a linear chain state.