公开(公告)号：US11728188B2

公开(公告)日：2023-08-15

申请号：US16941661

申请日：2020-07-29

申请人： Kioxia Corporation

发明人： Yuji Hashimoto ,  Shinsuke Muraki ,  Hiroaki Yamada

IPC分类号： H01L21/67 ,  B08B3/08 ,  B08B13/00 ,  B08B3/10

CPC分类号： H01L21/67126 ,  B08B3/08 ,  B08B3/106 ,  B08B13/00 ,  H01L21/6708 ,  H01L21/67051 ,  H01L21/67242 ,  H01L21/67248 ,  B08B2203/007 ,  H01L21/67017 ,  H01L21/67086 ,  H01L21/67253

摘要： According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.

公开(公告)号：US11682568B2

公开(公告)日：2023-06-20

申请号：US17198728

申请日：2021-03-11

申请人： Kioxia Corporation

发明人： Satoshi Nakaoka ,  Yuji Hashimoto ,  Hiroshi Fujita

IPC分类号： H01L21/67 ,  H01L21/311 ,  H01L21/673

CPC分类号： H01L21/67086 ,  H01L21/31111 ,  H01L21/673

摘要： A substrate treatment apparatus according to an embodiment includes: a tank configured to store a liquid chemical with which a plurality of substrates are treated; a piping having an ejection port that ejects the liquid chemical or bubbles into the tank; a plurality of rods that support the plurality of substrates in the tank; and a converter that is provided in the plurality of rods or the tank and that converts vibration applied to each substrate by the liquid chemical or the bubbles ejected from the piping into rotation in one direction around a center of the substrate as a rotational axis.