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    Process for producing a monoazodye by diazo-coupling of a p-nitroanaline derivative with a N,N-substituted analine derivative
    1.
    发明授权
    Process for producing a monoazodye by diazo-coupling of a p-nitroanaline derivative with a N,N-substituted analine derivative 失效
    通过对硝基苯胺衍生物与N，N-取代的分解衍生物的重氮偶合制备单偶极的方法

    公开(公告)号：US5532344A

    公开(公告)日：1996-07-02

    申请号：US38813

    申请日：1993-03-29

    申请人： Kiyoshi Himeno ,  Toshio Hihara ,  Yoshiharu Hamano ,  Shinji Kubo

    发明人： Kiyoshi Himeno ,  Toshio Hihara ,  Yoshiharu Hamano ,  Shinji Kubo

    IPC分类号： C09B29/08 ,  C09B41/00 ,  C09B67/10 ,  C09B29/085

    CPC分类号： C09B29/0813 ,  C09B29/0809 ,  C09B41/005 ,  C09B67/0015

    摘要： A process for producing a monoazodye of the following formula (III): ##STR1## wherein X.sup.1 is nitro or halogen, X.sup.2 is halogen, R.sup.1 is lower alkoxy, R.sup.2 is lower alkyl, each of R.sup.3 and R.sup.4, which are independent of each other, is alkyl, cyanoalkyl or alkylcarbonyloxyalkyl, and each of m and n, which are independent of each other, is 0 or 1, which comprises diazotizing an aniline derivative of the following formula (I): ##STR2## wherein X.sup.1 and X.sup.2 are as defined above, followed by coupling with an aniline derivative of the following formula (II): ##STR3## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, m and n are as defined above, wherein a reaction mixture obtained by the coupling reaction is heat-treated in the presence of a polyoxyethylene higher fatty acid ester type nonionic surfactant, followed by filtration to obtain said monoazo compound in the form of a cake.

    摘要翻译： 制备下式（III）的单偶氮的方法：其中X 1是硝基或卤素，X 2是卤素，R 1是低级烷氧基，R 2是低级烷基，R 3和R 4各自独立地是 彼此是烷基，氰基烷基或烷基羰基氧基烷基，m和n彼此独立的各自为0或1，其包括将下式（I）的苯胺衍生物重氮化： 其中X1和X2如上定义，然后与下式（II）的苯胺衍生物偶联：其中R 1，R 2，R 3，R 4，m和n如上所定义，其中反应 通过偶联反应获得的混合物在聚氧乙烯高级脂肪酸酯型非离子表面活性剂的存在下进行热处理，然后过滤以获得饼状形式的所述单偶氮化合物。

    Process for producing arylamine
    2.
    发明授权
    Process for producing arylamine 失效
    芳基胺的制备方法

    公开(公告)号：US07273953B2

    公开(公告)日：2007-09-25

    申请号：US10527064

    申请日：2003-09-09

    申请人： Shinji Kubo ,  Taichi Shintou ,  Hidenori Aoki

    发明人： Shinji Kubo ,  Taichi Shintou ,  Hidenori Aoki

    IPC分类号： C07C209/10

    CPC分类号： C07C209/10 ,  C07C211/54 ,  C07C211/62

    摘要： A process for producing an arylamine is provided which is characterized by reacting an aromatic halogen compound with an aromatic amine in the presence of an organic salt selected from specific pyridinium salts, imidazolium salts and quaternary onium salts, a copper catalyst, and a base. Thus, the reaction of even an aromatic halogen compound substituted by an electron-donating group proceeds efficiently, and an inexpensive chlorinated aromatic compound or brominated aromatic compound is usable, and an arylamine, in particular a triarylamine or diarylamine, having a high purity can be produced at low cost.

    摘要翻译： 提供一种制备芳胺的方法，其特征在于在选自特定吡啶鎓盐，咪唑鎓盐和季鎓盐，铜催化剂和碱的有机盐的存在下使芳族卤素化合物与芳族胺反应。 因此，即使由供电子基团取代的芳族卤素化合物的反应也能有效地进行，可以使用便宜的氯化芳香族化合物或溴化芳香族化合物，具有高纯度的芳基胺，特别是三芳基胺或二芳基胺可以是 以低成本生产。

    Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device
    3.
    发明授权
    Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device 有权
    半导体集成电路器件的制造方法和半导体集成电路器件的制造方法

    公开(公告)号：US06841399B2

    公开(公告)日：2005-01-11

    申请号：US10349026

    申请日：2003-01-23

    申请人： Norio Hasegawa ,  Katsuya Hayano ,  Shinji Kubo ,  Yasuhiro Koizumi ,  Hironobu Takaya ,  Morihisa Hoga

    发明人： Norio Hasegawa ,  Katsuya Hayano ,  Shinji Kubo ,  Yasuhiro Koizumi ,  Hironobu Takaya ,  Morihisa Hoga

    IPC分类号： G03F1/50 ,  G03F1/56 ,  G03F1/62 ,  G03F1/72 ,  G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  H01L21/00

    CPC分类号： G03F1/84 ,  G03F1/56 ,  Y10S438/949

    摘要： The manufacturing time of a mask is shortened. In a defect inspection of a mask having a light-shielding portion composed of a resist film, the presence or absence of defects, such as burr and film loss of a resist pattern on the mask, and foreign matters, etc. is inspected by reading optical information on either or both of reflection light and transmission light with respect to inspection light irradiated to the mask by the use of a foreign-matter inspection system. More specifically, in the inspection of the mask, it is possible to perform the defect inspection without performing a comparison inspection that requires a great amount of measuring time and advanced techniques. Therefore, the inspecting process of the mask can be simplified, and also the inspecting time of the mask can be shortened.

    摘要翻译： 掩模的制造时间缩短。 在具有由抗蚀剂膜构成的遮光部的掩模的缺陷检查中，通过读取检查有无缺陷，例如掩模上的抗蚀剂图案的毛刺和膜损失以及异物等 相对于通过使用异物检查系统照射到面罩的检查光，反射光和透射光中的任一个或两者的光学信息。 更具体地，在掩模的检查中，可以进行缺陷检查，而不进行需要大量测量时间和先进技术的比较检查。 因此，可以简化掩模的检查过程，并且可以缩短掩模的检查时间。

    Tool holder for adapting a tool for its measurement and measuring arrangement and method for its calibration
    5.
    发明授权
    Tool holder for adapting a tool for its measurement and measuring arrangement and method for its calibration 有权
    用于调整工具用于其测量和测量布置的刀架以及其校准方法

    公开(公告)号：US08256126B2

    公开(公告)日：2012-09-04

    申请号：US12899943

    申请日：2010-10-07

    申请人： Shuichi Esaka ,  Shinji Kubo ,  Katsutoshi Fukagawa

    发明人： Shuichi Esaka ,  Shinji Kubo ,  Katsutoshi Fukagawa

    IPC分类号： G01B5/00

    CPC分类号： B23Q17/2457

    摘要： The present invention relates to a tool holder for adapting a tool to be measured in a measuring arrangement. Such tool holder can, for example, include a spindle or an adapter of a tool presetter to be inserted in such spindle. Furthermore, this invention refers to a measuring arrangement for measuring of tools as well as a method for calibration of such measuring arrangement to a zero-point of the tool.

    摘要翻译： 本发明涉及一种用于在测量装置中调整要测量的工具的工具架。 这样的工具夹具可以例如包括一个主轴或工具预调器的适配器，以插入到该主轴中。 此外，本发明涉及用于测量工具的测量装置以及用于将这种测量装置校准到工具的零点的方法。

    CERAMICS HEAT EXCHANGER
    6.
    发明申请
    CERAMICS HEAT EXCHANGER 有权
    陶瓷热交换器

    公开(公告)号：US20090056924A1

    公开(公告)日：2009-03-05

    申请号：US11914240

    申请日：2006-05-12

    申请人： Takanari Inatomi ,  Yasuhiro Sakai ,  Shigeki Maruyama ,  Shoko Suyama ,  Ryutaro Hino ,  Atsuhiko Terada ,  Kaoru Onuki ,  Shinji Kubo ,  Seiji Kasahara

    发明人： Takanari Inatomi ,  Yasuhiro Sakai ,  Shigeki Maruyama ,  Shoko Suyama ,  Ryutaro Hino ,  Atsuhiko Terada ,  Kaoru Onuki ,  Shinji Kubo ,  Seiji Kasahara

    IPC分类号： F28F3/08

    CPC分类号： F28F21/04 ,  F28F7/02 ,  F28F2230/00 ,  F28F2265/26 ,  F28F2275/205 ,  G21D1/02 ,  Y02E30/40

    摘要： A ceramic heat exchanger includes a heat exchange section that heat-exchanges between two fluids A and B flowing opposite directions to each other. The heat exchange section includes ceramic blocks stacked one on top of another with a seal therebetween. The ceramic blocks have a plurality of parallel lines of flow channels, each line defined by the flow channels through which the same fluid flows, any two adjacent lines being defined by the flow channels through which the different fluids A and B flow respectively. Both ends in the stacking direction of the stack are bound to join and integrate the ceramic blocks with tightening means including end plates and a tie rod. A thermal expansion absorber is disposed on an external surface of the end plates for absorbing thermal expansion in the axial direction of the tie rod.

    摘要翻译： 陶瓷热交换器包括热交换部，其在彼此相反的方向流动的两个流体A和B之间进行热交换。 热交换部分包括彼此堆叠的陶瓷块，其间具有密封。 陶瓷块具有多个平行的流动通道线，每条线由相同流体流过的流动通道限定，任何两条相邻的线路由不同流体A和B流过的流动通道限定。 在堆叠的堆叠方向上的两端必须将陶瓷块与包括端板和拉杆的紧固装置结合并整合。 热膨胀吸收器设置在端板的外表面上，用于吸收拉杆的轴向热膨胀。

    Fabrication method of semiconductor integrated circuit device and mask fabrication method
    7.
    发明授权
    Fabrication method of semiconductor integrated circuit device and mask fabrication method 有权
    半导体集成电路器件的制造方法和掩模制造方法

    公开(公告)号：US07252910B2

    公开(公告)日：2007-08-07

    申请号：US10762548

    申请日：2004-01-23

    申请人： Norio Hasegawa ,  Katsuya Hayano ,  Shinji Kubo ,  Yasuhiro Koizumi ,  Yasushi Kawai

    发明人： Norio Hasegawa ,  Katsuya Hayano ,  Shinji Kubo ,  Yasuhiro Koizumi ,  Yasushi Kawai

    IPC分类号： G03F1/00

    CPC分类号： G03F1/72 ,  G03F1/64

    摘要： A mask fabrication time is shortened. By patterning an electron-sensitive resist film coated on a main surface of a mask substrate, a pellicle is mounted on the main surface of the mask substrate immediately after a resist pattern made from an electron beam sensitive resist film and having light-shielding characteristics with respect to exposure light is formed. Subsequently, by irradiating a laser beam to defect made from the electron beam sensitive resist film with the pellicle being mounted on the mask substrate, the defect is removed. Since the defect can be removed without removing the pellicle, the mask fabrication time can be shortened.

    摘要翻译： 掩模制造时间缩短。 通过对涂布在掩模基板的主表面上的电子敏感膜形成图案，将防护薄膜组件立即安装在掩模基板的主表面上，紧接在由电子束敏感抗蚀剂膜制成的抗蚀剂图案之后，具有遮光特性 形成曝光光。 随后，通过将光束照射到由防护薄膜组件安装在掩模基板上的由电子束敏感抗蚀剂膜制成的缺陷上，从而去除缺陷。 由于可以在不去除防护薄膜的情况下去除缺陷，因此可以缩短掩模制造时间。

    Crosslinked polyester resin from trihydric alcohol
    9.
    发明授权
    Crosslinked polyester resin from trihydric alcohol 失效
    来自三氯乙烯的交联聚酯树脂

    公开(公告)号：US5057596A

    公开(公告)日：1991-10-15

    申请号：US553415

    申请日：1990-07-17

    申请人： Shinji Kubo ,  Noriyuki Tajiri ,  Masayuki Takyu ,  Ryo Funato ,  Hirokazu Ito

    发明人： Shinji Kubo ,  Noriyuki Tajiri ,  Masayuki Takyu ,  Ryo Funato ,  Hirokazu Ito

    IPC分类号： C08G63/12 ,  C08G63/20 ,  G03G9/087

    CPC分类号： G03G9/08793 ,  C08G63/20 ,  G03G9/08755

    摘要： Disclosed is a crosslinked polyester resin comprised of, based on the total acid units, (a) 1 to 30 mole % of units of a trihydric or higher alcohol or units of a trivalent or higher carboxylic acid, (b) 1 to 60 mole % of units of an alicyclic diol in which at least one alcohol component is a secondary alcohol, (c) 40 to 100 mole % of units of an aromatic dicarboxylic acid and (d) 40 to 99 mole % of units of a non-alicyclic diol, wherein the acid value is 0.5 to 25 mg-KOH/g, the glass transition temperature is 50.degree. to 80.degree. C., the softening temperature is not higher than 145.degree. C., the fixing-possible temperature covers a range of at least 30.degree. C., and the difference between the softening temperature and the glass transition temperature is not larger than 75.degree. C. The crosslinked polyester is used for toner for electrostatic recording.