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    Polymers and chemically amplified positive resist compositions
    1.
    发明授权
    Polymers and chemically amplified positive resist compositions 失效
    聚合物和化学增幅阳性抗蚀剂组合物

    公开(公告)号：US06156477A

    公开(公告)日：2000-12-05

    申请号：US13270

    申请日：1998-01-26

    申请人： Kiyoshi Motomi ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Kiyoshi Motomi ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： C08F8/00 ,  G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  C08F8/14 ,  G03F7/0045 ,  C08F2800/20 ,  C08F2810/20 ,  Y10S430/106 ,  Y10S430/111

    摘要： A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is H, R.sup.4 is --COOR.sup.5, C.sub.1 -C.sub.5 alkyl or phenyl, or R.sup.3 and R.sup.4, taken together, may form --COOCO--, R.sup.5 is H or C.sub.1 -C.sub.8 alkyl, x and y are integers satisfying x+y.ltoreq.5, p and q are positive numbers satisfying p+q=1 and 0

    摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或羧基的一些氢原子被酸不稳定基团取代。 聚合物与由一些残留的酚羟基和/或羧基与烯基醚化合物或卤代烷基醚化合物反应得到的具有C-O-C键的交联基团交联。 酸不稳定基团和交联基团的用量平均为全部酚羟基和羧基的0摩尔％至80摩尔％以上。 聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，R3是H，R4是-COOR5，C1-C5烷基或苯基，或R3和R4一起可以形成-COOCO-，R5是H或C1-C8 烷基，x和y是满足x + y <5的整数，p和q是满足p + q = 1和0

    Partially hydrogenated polymers and chemically amplified positive resist compositions
    2.
    发明授权
    Partially hydrogenated polymers and chemically amplified positive resist compositions 失效
    部分氢化聚合物和化学增幅阳性抗蚀剂组合物

    公开(公告)号：US6033828A

    公开(公告)日：2000-03-07

    申请号：US12583

    申请日：1998-01-26

    申请人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： C08F8/04 ,  G03F7/004 ,  G03F7/039 ,  G03C1/492 ,  C08F12/08 ,  C08F12/24

    CPC分类号： G03F7/039 ,  C08F8/04 ,  G03F7/0045

    摘要： A polymer comprising recurring units of formula (1) is provided wherein some of the hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups are replaced by acid labile groups. The polymer is crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or alcoholic hydroxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and alcoholic hydroxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, letter x is 0 or a positive integer, y is a positive integer, x+y.ltoreq.5, letters p and q are positive numbers satisfying p+q=1 and 0

    摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或醇羟基的一些氢原子被酸不稳定基团取代。 聚合物在分子内和/或分子之间交联，具有由一些残留的酚羟基和/或醇羟基与链烯基醚化合物或卤代烷基醚化合物的反应产生的具有C-O-C键的交联基团。 酸不稳定基团和交联基团的用量平均为全部酚羟基和醇羟基的0摩尔％至80摩尔％以上。 聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，字母x是0或正整数，y是正整数，x + y <5，字母p和q是满足p + q = 1的正数， 0

    Chemically amplified positive resist composition
    5.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US6106993A

    公开(公告)日：2000-08-22

    申请号：US114067

    申请日：1998-07-13

    申请人： Satoshi Watanabe ,  Osamu Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Satoshi Watanabe ,  Osamu Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin, (C) a photoacid generator, and optionally, (D) a dissolution rate regulator. The base resin (B) is a hydroxystyrene copolymer having different acid labile groups and Mw of 3,000-300,000. The resist composition is highly sensitive to actinic radiation such as deep-UV, electron beam and X-ray, can be developed with aqueous base to form a pattern, and is thus suitable for use in a fine patterning technique.

    摘要翻译： 化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）基础树脂，（C）光致酸产生剂，和任选的（D）溶出速率调节剂。 基础树脂（B）是具有不同酸不稳定基团和Mw为3,000-300,000的羟基苯乙烯共聚物。 抗蚀剂组合物对光化辐射如深UV，电子束和X射线高度敏感，可以用碱水溶液显影以形成图案，因此适用于精细图案化技术。

    Polymers chemically amplified positive resist compositions, and patterning method
    8.
    发明授权
    Polymers chemically amplified positive resist compositions, and patterning method 失效
    聚合物化学放大正性抗蚀剂组合物和图案化方法

    公开(公告)号：US6027854A

    公开(公告)日：2000-02-22

    申请号：US31560

    申请日：1998-02-27

    申请人： Tsunehiro Nishi ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Tsunehiro Nishi ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining alcoholic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group, alcoholic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is a divalent C.sub.1 -C.sub.18 hydrocarbon group which may have a hetero atom, R.sup.4 and R.sup.5 are H or monovalent C.sub.1 -C.sub.18 hydrocarbon groups which may have a hetero atom, x and y are integers satisfying x+y.ltoreq.5, x', y' and z' are integers satisfying x'+y'+z'.ltoreq.5, p, q and r are numbers satisfying 0.ltoreq.p.ltoreq.0.4, 0.ltoreq.q.ltoreq.0.4, 0.01.ltoreq.p+q.ltoreq.0.8, and p+q+r=1. A chemically amplified positive resist composition comprising the polymer as a base resin has high sensitivity, high resolution, a wide latitude of exposure, and process adaptability and forms resist patterns having plasma etching resistance and heat resistance.

    摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或醇羟基和/或羧基的一些氢原子被酸不稳定基团取代。 聚合物与由一些残留的醇羟基和/或羧基与链烯基醚化合物或卤代烷基醚化合物的反应产生的具有C-O-C键的交联基团交联。 酸不稳定基团和交联基团的结合量平均为全部酚羟基，醇羟基和羧基的0摩尔％至80摩尔％以上。 聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，R3是可以具有杂原子的二价C1-C18烃基，R4和R5是H或可以具有杂原子的一价C1-C18烃基，x和 y是满足x + y <5的整数，x'，y'和z'是满足x'+ y'+ z'= 5的整数，p，q和r是满足0

    Chemically amplified positive resist composition
    9.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US5849461A

    公开(公告)日：1998-12-15

    申请号：US684395

    申请日：1996-07-19

    申请人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    发明人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/038

    CPC分类号： G03F7/039 ,  G03F7/0045

    摘要： In a chemically amplified positive resist composition comprising an organic solvent, an acid labile group-protected resin and a photoacid generator, a compound having a weight average molecular weight of 100-1,000 and at least two phenolic hydroxyl groups in a molecule wherein the hydrogen atom of the phenolic hydroxyl group is partially replaced by an acid labile group in an overall average proportion of 10-80% is blended as a dissolution controller. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.

    摘要翻译： 在包含有机溶剂，酸不稳定基团保护的树脂和光致酸产生剂的化学放大型正性抗蚀剂组合物中，分子中具有重均分子量为100-1,000的化合物和至少两个酚羟基，其中氢原子 的酚羟基被酸不稳定基团部分替代，总平均比例为10-80％混合作为溶解控制剂。 抗蚀剂组合物对光化辐射高度敏感，具有改进的灵敏度和分辨率，并且适用于精细图案化技术和商业上可接受的。

    Chemically amplified positive resist composition
    10.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US5750309A

    公开(公告)日：1998-05-12

    申请号：US684481

    申请日：1996-07-19

    申请人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    发明人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： In a chemical amplification positive resist composition comprising an organic solvent, a resin and a photoacid generator, at least two polymers having different molecular weights selected from polyhydroxystyrenes having some hydroxyl groups protected with acid labile groups are used. Among the polymers, a high molecular weight polymer has a molecular weight dispersity (Mw1/Mn1) of up to 1.5, and a low molecular weight polymer has a dispersity (Mw2/Mn2) of up to 5.0. The weight average molecular weight ratio Mw1/Mw2 is between 1.5/1 and 10.0/1. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.

    摘要翻译： 在包含有机溶剂，树脂和光致酸发生剂的化学放大正性抗蚀剂组合物中，使用至少两种具有不同分子量的聚合物，其选自具有用酸不稳定基保护的一些羟基的多羟基苯乙烯。 在聚合物中，高分子量聚合物的分子量分散性（Mw1 / Mn1）高达1.5，低分子量聚合物的分散性（Mw2 / Mn2）高达5.0。 重均分子量Mw1 / Mw2在1.5 / 1和10.0 / 1之间。 抗蚀剂组合物对光化辐射高度敏感，具有改进的灵敏度和分辨率，并且适用于精细图案化技术和商业上可接受的。