公开(公告)号：US20030124454A1

公开(公告)日：2003-07-03

申请号：US10039164

申请日：2002-01-03

Applicant: Kodak Polychrome Graphics LLC

Inventor： Celin Savariar-Hauck ,  Hans-Joachim Timpe

IPC: G03F007/038

CPC classification number: B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/0382 ,  G03F7/203 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

Abstract: A process for making thermally imageable negative working compositions comprising the steps of: (1) providing a patterning composition layer on a substrate, said patterning composition comprising: (a) at least one acid generator which is sensitive to UV radiation; (b) at least one cross-linking resin or compound; (c) at least one binder resin comprising a polymer containing at least one reactive pendent group consisting of hydroxyl, carboxylic acid, sulfonamide, alkoxymethylamide and mixtures thereof; and (d) at least one infrared absorber; (2) subjecting the patterning composition layer to a two-stage radiation exposure; (a) one stage being a flood UV-exposure; and (b) the other stage being a imagewise infrared exposure stage; (3) treating the exposed patterning composition with heat energy; and (4) developing the heat treated, exposed patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition and leaving the imaged areas substantially unaffected.

Abstract translation: 一种制备可热成像负性组合物的方法，包括以下步骤：（1）在基底上提供图案化组合物层，所述图案化组合物包含：（a）至少一种对UV辐射敏感的酸产生剂; （b）至少一种交联树脂或化合物; （c）至少一种粘合剂树脂，其包含含有至少一个由羟基，羧酸，磺酰胺，烷氧基甲基酰胺及其混合物组成的反应性侧基的聚合物; 和（d）至少一个红外线吸收剂; （2）对图案化组合物层进行两级辐射曝光; （a）一个阶段是泛滥紫外线曝光; 和（b）另一个阶段是成像红外曝光阶段; （3）用热能处理曝光的图案化组合物; 和（4）用含水碱性显影剂显影经热处理的曝光的图案化组合物以除去图案化组合物的非成像区域，并使成像区域基本上不受影响。

公开(公告)号：US20020090566A1

公开(公告)日：2002-07-11

申请号：US09751183

申请日：2000-12-29

Applicant: Kodak Polychrome Graphics LLC.

Inventor： Hans-Joachim Timpe ,  Ursula Muller

IPC: G03F007/038

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/145

Abstract: A polyvinyl acetal copolymer compound comprises the units A, B, C and D, wherein A is present in an amount of 0.5 to 30 wt.-% and is of the formula 1 wherein R is hydrogen, C1-C6 alkyl, nullCHnullCHCOOH or 2 B is present in an amount of 5 to 35 wt.-% and is of the formula 3 C is present in an amount of 10 to 55 wt.-% and is of the formula 4 wherein R1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halogen atoms, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group ZnullNR2nullCOnullYnullCOOH, wherein Z is an aliphatic, aromatic or araliphatic spacer group, R2 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and unit C may have one or more occurrences in the copolymer with various moieties R1 independent of one another; and D is present in an amount of 10 to 40 wt.-% and is of the formula 5 wherein X is C1-C6 alkylene, a 5 or 6 membered saturated carbocyclic moiety optionally substituted with one or more substituents selected from the group consisting of C1-C4 alkyl, C1-C4 alkoxy or halogen, a 5 or 6 membered saturated heterocyclic moiety which comprises in the nucleus one or more heteroatoms selected from oxygen, nitrogen and sulfur, or a group of the formula I 6 wherein n is an integer from 0 to 4 and each R3 is independently selected from the group consisting of C1-C4 alkyl, halogen or C1-C4 alkoxy. A radiation-sensitive composition useful in a lithographic printing plate comprises (i) the above-described polyvinyl acetal copolymer; and (ii) a light-to-heat transformer compound.

Abstract translation: 聚乙烯醇缩醛共聚物化合物包括单元A，B，C和D，其中A以0.5至30重量％的量存在并具有下式：其中R是氢，C 1 -C 6烷基，-CH = CHCOOH 或B以5至35重量％的量存在，并且具有式C的存在量为10至55重量％，并且具有下式：其中R 1是具有至多4个碳的烷基 或任选被酸基取代的苯基或其中连接有酸基的苯基，其中苯基任选地包含1至2个选自卤素原子，氨基，甲氧基，乙氧基，甲基和乙基的其它取代基，或 是Z-NR2-CO-Y-COOH基团，其中Z是脂族，芳族或芳脂族间隔基，R2是氢或脂族，芳族或芳脂族部分，Y是饱和或不饱和的链或环形间隔基 基团和单元C可以在共聚物中具有一个或多个出现的各种部分R1彼此独立; 并且D以10至40重量％的量存在并且具有下式：其中X为C 1 -C 6亚烷基，任选被一个或多个选自以下的取代基取代的5或6元饱和碳环部分：C1 C 4烷基，C 1 -C 4烷氧基或卤素，5或6元饱和杂环部分，其在核中包含一个或多个选自氧，氮和硫的杂原子，或式I的基团，其中n是0的整数 至4，并且每个R 3独立地选自C 1 -C 4烷基，卤素或C 1 -C 4烷氧基。 可用于平版印刷版的辐射敏感组合物包含（i）上述聚乙烯醇缩醛共聚物; 和（ii）光 - 热变压器化合物。