INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE
    1.
    发明申请
    INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE 失效
    检查基板图案的检查装置

    公开(公告)号:US20100008564A1

    公开(公告)日:2010-01-14

    申请号:US12564567

    申请日:2009-09-22

    IPC分类号: G06K9/00

    CPC分类号: G06T7/001 G06T2207/30148

    摘要: A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.

    摘要翻译: 图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元,并且根据设置单元的设置检查不同单元比较间距的多个单元区域。 作为用于从图像存储器读出检查图像和参考图像的图像数据的信息,除了缺陷图像的位置信息之外,还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息 被设置。 该设备还具有用于在每个检查区域设置多个检查阈值的单元,并且通过多个检查阈值检查多个检查区域。

    Inspection apparatus for inspecting patterns of a substrate
    2.
    发明授权
    Inspection apparatus for inspecting patterns of a substrate 失效
    用于检查基板图案的检查装置

    公开(公告)号:US08036447B2

    公开(公告)日:2011-10-11

    申请号:US12564567

    申请日:2009-09-22

    IPC分类号: G06K9/00

    CPC分类号: G06T7/001 G06T2207/30148

    摘要: A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.

    摘要翻译: 图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元,并且根据设置单元的设置来检查不同单元比较间距的多个单元区域。 作为用于从图像存储器读出检查图像和参考图像的图像数据的信息,除了缺陷图像的位置信息之外,还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息 被设置。 该设备还具有用于在每个检查区域设置多个检查阈值的单元,并且通过多个检查阈值检查多个检查区域。

    Inspection apparatus for inspecting patterns of a substrate
    3.
    发明申请
    Inspection apparatus for inspecting patterns of a substrate 审中-公开
    用于检查基板图案的检查装置

    公开(公告)号:US20060171593A1

    公开(公告)日:2006-08-03

    申请号:US11344101

    申请日:2006-02-01

    IPC分类号: G06K9/62 G06K9/64 G06K9/68

    CPC分类号: G06T7/001 G06T2207/30148

    摘要: A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.

    摘要翻译: 图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元,并且根据设置单元的设置检查不同单元比较间距的多个单元区域。 作为用于从图像存储器读出检查图像和参考图像的图像数据的信息,除了缺陷图像的位置信息之外,还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息 被设置。 该设备还具有用于在每个检查区域设置多个检查阈值的单元,并且通过多个检查阈值检查多个检查区域。

    Image processing unit for wafer inspection tool
    4.
    发明授权
    Image processing unit for wafer inspection tool 有权
    晶圆检测工具图像处理单元

    公开(公告)号:US07889911B2

    公开(公告)日:2011-02-15

    申请号:US12170532

    申请日:2008-07-10

    IPC分类号: G06K9/00

    摘要: An image processing apparatus for wafer inspection tool that is able to perform continuously cell to cell comparison inspection, die to die comparison inspection, and cell-to-cell and die-to-die hybrid comparison inspection, employing a plurality of processors. This image processing apparatus for wafer inspection tool comprises a plurality of processors for performing parallel processing, means for cutting out image data including a forward end overlap and a rear end overlap at partition boundaries in order to cut serial data into a predetermined image size, means for distributing the cutout image data to the plurality of processors, and means for assembling results of processing performed by the plurality of processors. The forward end overlap is set greater than a pitch of the cell subject to cell to cell comparison inspection.

    摘要翻译: 一种用于晶片检查工具的图像处理装置,其能够执行连续的单元到单元比较检查,管芯到管芯比较检查,以及使用多个处理器的单元到单元和管芯到管芯之间的混合比较检查。 这种晶片检查工具的图像处理装置包括用于执行并行处理的多个处理器,用于在分区边界处切出包括前端重叠和后端重叠的图像数据的装置,以便将串行数据切割成预定图像尺寸 用于将剪切图像数据分配给多个处理器,以及用于组装由多个处理器执行的处理结果的装置。 前端重叠被设定为大于细胞对细胞比较检查的细胞的间距。

    Image processing unit for wafer inspection tool
    5.
    发明授权
    Image processing unit for wafer inspection tool 失效
    晶圆检测工具图像处理单元

    公开(公告)号:US07421110B2

    公开(公告)日:2008-09-02

    申请号:US10780752

    申请日:2004-02-19

    IPC分类号: G06K9/00

    摘要: An image processing apparatus for wafer inspection tool that is able to perform continuously cell to cell comparison inspection, die to die comparison inspection, and cell-to-cell and die-to-die hybrid comparison inspection, employing a plurality of processors. This image processing apparatus for wafer inspection tool comprises a plurality of processors for performing parallel processing, means for cutting out image data including a forward end overlap and a rear end overlap at partition boundaries in order to cut serial data into a predetermined image size, means for distributing the cutout image data to the plurality of processors, and means for assembling results of processing performed by the plurality of processors. The forward end overlap is set greater than a pitch of the cell subject to cell to cell comparison inspection.

    摘要翻译: 一种用于晶片检查工具的图像处理装置,其能够执行连续的单元到单元比较检查,管芯到管芯比较检查,以及使用多个处理器的单元到单元和管芯到管芯的混合比较检查。 这种晶片检查工具的图像处理装置包括用于执行并行处理的多个处理器,用于在分区边界处切出包括前端重叠和后端重叠的图像数据的装置,以便将串行数据切割成预定图像尺寸 用于将剪切图像数据分配给多个处理器,以及用于组装由多个处理器执行的处理结果的装置。 前端重叠被设定为大于细胞对细胞比较检查的细胞的间距。

    IMAGE PROCESSING UNIT FOR WAFER INSPECTION TOOL
    6.
    发明申请
    IMAGE PROCESSING UNIT FOR WAFER INSPECTION TOOL 有权
    用于检测工具的图像处理单元

    公开(公告)号:US20080285841A1

    公开(公告)日:2008-11-20

    申请号:US12170532

    申请日:2008-07-10

    IPC分类号: G06K9/46

    摘要: An image processing apparatus for wafer inspection tool that is able to perform continuously cell to cell comparison inspection, die to die comparison inspection, and cell-to-cell and die-to-die hybrid comparison inspection, employing a plurality of processors. This image processing apparatus for wafer inspection tool comprises a plurality of processors for performing parallel processing, means for cutting out image data including a forward end overlap and a rear end overlap at partition boundaries in order to cut serial data into a predetermined image size, means for distributing the cutout image data to the plurality of processors, and means for assembling results of processing performed by the plurality of processors. The forward end overlap is set greater than a pitch of the cell subject to cell to cell comparison inspection.

    摘要翻译: 一种用于晶片检查工具的图像处理装置,其能够执行连续的单元到单元比较检查,管芯到管芯比较检查,以及使用多个处理器的单元到单元和管芯到管芯之间的混合比较检查。 这种晶片检查工具的图像处理装置包括用于执行并行处理的多个处理器,用于在分区边界处切出包括前端重叠和后端重叠的图像数据的装置,以便将串行数据切割成预定图像尺寸 用于将剪切图像数据分配给多个处理器,以及用于组装由多个处理器执行的处理结果的装置。 前端重叠被设定为大于细胞对细胞比较检查的细胞的间距。