摘要:
In a laser apparatus, a central wavelength of vacuum ultraviolet laser beams whose bandwidth is narrowed can be maintained at a target wavelength in high precision. This laser apparatus includes a laser oscillator for generating a vacuum ultraviolet laser beam whose bandwidth is narrowed and a reference beam having a spectral distribution of a vacuum ultraviolet band to output both the vacuum ultraviolet laser beam and the reference beam; a wavelength meter for measuring a central wavelength of the vacuum ultraviolet laser beam whose bandwidth is narrowed by using at least one emission light contained in the reference beam as a reference; and a controller for controlling the laser oscillator based upon the central wavelength of the vacuum ultraviolet laser beam whose bandwidth is narrowed, which is measured by the wavelength meter, so as to thereby adjust the central wavelength of the vacuum ultraviolet laser beam whose bandwidth is narrowed to a target wavelength. As a result, this laser apparatus can output the vacuum ultraviolet laser beams whose bandwidth is narrowed and whose central wavelength is maintained at the target wavelength in high precision.
摘要:
A laser apparatus has a function to easily select a component having a wavelength near to an oscillated wavelength of a laser beam from among components of a reference beam having a spectral distribution, which is already known, as a reference in measurement of the oscillated wavelength of the laser beam. The laser apparatus has a laser oscillator for outputting a laser beam, a reference light source for outputting a reference beam having a spectral distribution which is already known, two spectrum separation units having different resolving power, a detecting device for detecting a part of the laser beam and a part of the reference beam separated by the two spectrum separation units, and a control unit for measuring an oscillated wavelength of the detected laser beam by using as a reference a component selected from among components of the detected reference beam and having a wavelength near to the oscillated wavelength of the detected laser beam. According to the laser apparatus, the component having the wavelength near to the oscillated wavelength of the laser beam can be easily selected from among the components of the reference beam as a reference in measurement of the wavelength of the laser beam.
摘要:
A confocal optical apparatus comprising a light source, a first aperture portion for passing light emitted from the light source and obtaining a point source, an objective lens for causing the light that has passed through the first aperture portion to converge on a measurement object, a second aperture portion located on a plane conjugate with the convergence surface on the measurement object, and light detectors for detecting light that has passed through the second aperture portion, wherein placing the first and second aperture portions in the same position and using them as the same aperture portion, as well as positioning the detection surfaces of the light detectors substantially on the same surfaces as the conjointly used identical aperture portions make it possible to reduce the size and weight of the apparatus, to perform three-dimensional shape measurements rapidly and accurately, and to facilitate the alignment of each portion.
摘要:
A three-dimensional image display device which comprises a holographic plate having a plurality of holograms divided in correspondence with rotational angles, the holographic plate being exposed so that when light is irradiated, each of the holograms forms a point image at a different position in a depth direction of the holographic plate; a drive unit for rotating the holographic plate; a light irradiating unit including a plurality of light sources arranged substantially in a straight line so that the light sources are kept at substantially equal distances from the holographic plate, for irradiating the holographic plate with light from the light sources; and a controller for controlling the drive unit and lighting operations of the plurality of light sources of the light irradiating unit in accordance with a signal indicative of a three-dimensional image to be displayed so as to control lighting of a plurality of point images formed in a three-dimensional space, whereby a three-dimensional image can be obtained with a simple configuration.
摘要:
A non-contact wafer temperature measuring apparatus by which a wafer temperature can be measured with accuracy in situ even in a low temperature process. The wafer temperature measuring apparatus for measuring a wafer temperature based on reflected light of light applied to a wafer as a target of temperature measurement includes: a light source unit for generating light containing a P-polarized component having a wavelength not larger than 400 nm and applying the light to the wafer; a light receiving unit for receiving the light reflected by the wafer and detecting at least intensity of the P-polarized component having the wavelength not larger than 400 nm; and a signal processing unit for calculating a temperature of the target of temperature measurement at least based on the intensity of the P-polarized component having the wavelength not larger than 400 nm detected by the light receiving unit.