SUBSTRATE FOR SURFACED ENHANCED RAMAN SCATTERING, FABRICATION METHOD FOR THE SAME AND ANALYZING METHOD USING THE SAME
    2.
    发明申请
    SUBSTRATE FOR SURFACED ENHANCED RAMAN SCATTERING, FABRICATION METHOD FOR THE SAME AND ANALYZING METHOD USING THE SAME 审中-公开
    用于表面加强拉曼散射的基板及其制造方法和使用该分析方法的分析方法

    公开(公告)号:US20160146737A1

    公开(公告)日:2016-05-26

    申请号:US14947960

    申请日:2015-11-20

    IPC分类号: G01N21/65

    摘要: The present disclosure relates to a substrate for surface enhanced Raman scattering, a fabricating method for the same and an analyzing method using the same. The present disclosure may provide a substrate for surface enhanced Raman scattering having excellent surface enhanced Raman scattering effects by randomly stacking of Ag nanowires in a simple way by utilizing a substrate having a filtering function, and a method for efficiently analyzing a material to be analyzed using the same.

    摘要翻译: 本公开内容涉及用于表面增强拉曼散射的衬底,其用于其的制造方法和使用该衬底的分析方法。 本公开可以通过利用具有过滤功能的基板以简单的方式随机堆叠Ag纳米线而提供具有优异的表面增强拉曼散射效应的表面增强拉曼散射用基板,以及使用 一样。