Abstract:
A 3 group-5 group compound ferromagnetic semiconductor, comprising one material nullAnull selected from the group of Ga, Al and In and one material nullBnull selected from the group consisting of N and P, wherein one material nullCnull selected from the group consisting of Mn, Mg, Co, Fe, Ni, Cr and V is doped as a material for substituting the material nullAnull, the compound semiconductor has a single phase as a whole. The ferromagnetic semiconductor can be fabricated by a plasma-enhance molecular beam epitaxy growing method and since it shows the ferromagnetic characteristics at a room temperature, it can be applied as various spin electron devices.